Patents by Inventor Anand J. Bariya

Anand J. Bariya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma polymer antireflective coating
    Patent number: 5443941
    Abstract: An antireflective coating used in the photolithography process is applied and removed in a plasma reactor. The halocarbon plasma polymer such as fluorocarbon plasma polymer of the present invention provides an improved antireflective coating.
    Type: Grant
    Filed: March 1, 1993
    Date of Patent: August 22, 1995
    Assignee: National Semiconductor Corporation
    Inventors: Anand J. Bariya, Satyendra S. Sethi, Kevin C. Brown