Abstract: An optical proximity corrected mask design is generated from a given a target mask design by processing the target mask design through a feature trained neural network, configured to perform an optical proximity correction of geometric features, to obtain a representation of a first corrected mask design. The target mask design is processed in parallel through a rule processor, configured to perform placement of sub-resolution geometric features relative to geometric features in the target mask design, to obtain a representation of a second corrected mask design. A layout reassembler operates to generate a corrected mask design through an overlaid composition of said first and second corrected mask designs.