Abstract: A lithographic apparatus includes a vessel that encloses a component with a test surface to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam. The vessel includes a first optical port configured to transfer the optical probing beam towards the test surface, and a second optical port configured to receive a reflected optical probing beam. The optical probe includes a light source configured to provide the optical probing beam, a polarization conditioner configured to provide a predefined polarization state to the probing beam, and a spectral analyzer. The polarization conditioner is preset to provide a minimal transmission for a minimal transmission wavelength, and the spectral analyzer is arranged to detect a wavelength shift of the minimal transmission wavelength in response to a polarization change due to the presence of contamination.

Abstract: A lithographic apparatus configured to project a patterned radiation beam onto a substrate. The apparatus includes a support configured to hold a patterned object, and a measurement system configured to detect orientations and/or densities of user area structures that are present on a user area of the patterned object.

Abstract: A lithographic apparatus includes a vessel that encloses a component with a test surface to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam. The vessel includes a first optical port configured to transfer the optical probing beam towards the test surface, and a second optical port configured to receive a reflected optical probing beam. The optical probe includes a light source configured to provide the optical probing beam, a polarization conditioner configured to provide a predefined polarization state to the probing beam, and a spectral analyzer. The polarization conditioner is preset to provide a minimal transmission for a minimal transmission wavelength, and the spectral analyzer is arranged to detect a wavelength shift of the minimal transmission wavelength in response to a polarization change due to the presence of contamination.

Abstract: A lithographic apparatus configured to project a patterned radiation beam onto a substrate. The apparatus includes a support configured to hold a patterned object, and a measurement system configured to detect orientations and/or densities of user area structures that are present on a user area of the patterned object.

Abstract: An apparatus includes a first support structure configured to support an element that has an alignment marker provided with at least one height difference. The apparatus also includes an alignment sensor comprising a light source that is configured to provide a light beam that illuminates the alignment marker; and at least one detector configured to detect the at least one height difference of the alignment marker by analyzing the light beam reflected by the alignment marker. Such an apparatus may be used to align of the element with respect to the first support structure.

Abstract: The invention is directed to enabling substrate identification by comparing the measured distance between two features on an unidentified substrate with one or more stored distances. The one or more stored distances are the distances intended during the design of one or more substrates. The unidentified substrate is identified by a stored distance that corresponds to the measured distance. The two features are selected from a plurality of features that may be placed on a back side or a front side of a substrate. An optical system is provided for reading the features from the back side or a front side of the substrate.

Abstract: A lithographic apparatus comprises an illumination system, a support constructed to support a patterning device, and a projection system. In pixel grid imaging, a large number of small optical spots are imaged onto the substrate surface using a micro-lens array (MLA). The z position of the MLA is adjustable in order to focus the spots on the substrate surface and/or to compensate for differences in height of the substrate surface. The focusing adjustment is based on an output of an ultrasonic distance sensor provided in the vicinity of the substrate surface.

Abstract: A lithographic illumination apparatus and method includes receiving a plurality of source radiation beams from a plurality of corresponding radiation sources, deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation, imparting the projection beam of radiation with a cross-section pattern, and projecting the patterned projection beam of radiation onto a target portion of a substrate.

Abstract: A lithographic apparatus includes a measurement system including at least one optical component and at least one electrical component. The electrical component is configured to dissipate heat. The optical component is mounted on a first frame of the apparatus, and the electrical component is mounted on a second frame of the apparatus that is thermally and mechanically decoupled from the first frame. An optical coupling is provided between the first frame and the second frame.

Abstract: A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a projection system, a substrate table, and a sensor system. The illumination system supplies a beam of radiation. The array of individually controllable elements patterns the beam. The projection system projects the patterned beam onto a target plane, the patterned beam comprising an array of radiation spots. The substrate table supports a substrate, such that a target surface of the substrate is substantially coincident with the target plane. The sensor system comprises an array of detector elements arranged to receive at least one of the spots. The sensor system measures an energy of the or each received spot and provides an output signal indicative of the energy of the or each received spot.

Abstract: An embodiment of the invention may be applied to measure the positions of features in a alignment region on a mask with a sensor. The positions of the features in the alignment region are known from the design. A feature of which the position is measured, is identified by comparing the relative positions between measured features with relative positions known from the design. The known position of the identified feature is subtracted from a measured position of the identified feature to give the position of the mask.

Abstract: A lithographic apparatus transfers a pattern from a patterning device onto a substrate and includes a projection system to project a patterned radiation beam onto the substrate; a controllable actuator to adjust a distance between the projection system and the substrate; and a particle detector system to detect a particle on a surface of the substrate. The particle detector system has illumination optics directing the radiation to a detection area of the surface of the substrate, detection optics receiving radiation from the detection area of the surface of the substrate, and a detector coupled to the detection optics to produce a measurement signal. The apparatus further has a processing system to determine the height of a particle from the measurement signal, generate a height excess signal if the height exceeds a threshold value, and control the actuator in response to the height excess signal.

Abstract: The invention relates to a level sensor for use in a lithographic apparatus that determines a surface height of a substrate. The level sensor includes an emitter and a receiver, wherein the emitter is arranged to emit a signal directed to a predetermined position on the surface of the substrate, such that the signal is at least partially reflected by the substrate to render a reflected signal. The receiver is arranged to receive at least part of the reflected signal, and the level sensor is arranged to determine the surface height of the substrate with respect to the level sensor based on the emitted and received signal. The signal includes a pressure wave.

Abstract: A lithographic projection apparatus according to an embodiment of the invention includes a measurement system configured to determine a position of a target portion of a substrate, using at least one among an optical sensing operation and an optical detecting operation. The position is determined via an optical path that includes at least one catoptrical system arranged to have an imaging function of at least one dioptrical element.

Abstract: Use of a refraction grating to divide a beam of radiation into a plurality of sub-beams that are each directed onto an array of individually controllable elements, modulated thereby and projected onto a substrate as an array of spots.

Abstract: A method according to one embodiment of the invention may be performed using a calibration plate having at least one alignment marker and at least one height profile. First, the calibration plate is positioned using an alignment sensor. Then the height profile is measured by a height sensor. Then the calibration plate is rotated by substantially 180 degrees and the two operations are repeated. This procedure results in two measured height profiles, which are compared in order to find a best fit. The amount of shift performed to find the best fit is used to determine a distance between the alignment marker and the X,Y position of the measurement point of the height sensor.

Abstract: A lithographic projection apparatus according to an embodiment of the invention includes a measurement system configured to determine a position of a target portion of a substrate, using at least one among an optical sensing operation and an optical detecting operation. The position is determined via an optical path that includes at least one catoptrical system arranged to have an imaging function of at least one dioptrical element.