Patents by Inventor Anatloy Fabrikant

Anatloy Fabrikant has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7511830
    Abstract: Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eigenvalues of models that are precalculated may be stored and reused later for other structures having certain common characteristics to save time. The scatterometric data that is used to find the value of the one or more parameter can be limited to those at wavelengths that are less sensitive to the underlying film characteristics. A model for a three-dimensional grating may be constructed by slicing a representative structure into a stack of slabs and creating an array of rectangular blocks to approximate each slab. One dimensional boundary problems may be solved for each block which are then matched to find a two-dimensional solution for the slab.
    Type: Grant
    Filed: November 27, 2007
    Date of Patent: March 31, 2009
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Anatloy Fabrikant, Guoheng Zhao, Daniel C. Wack, Mehrdad Nikoonahad