Abstract: A wafer inspection system includes a laser sustained plasma (LSP) light source that generates light with sufficient radiance to enable bright field inspection. Reliability of the LSP light source is improved by introducing an amount of water into the bulb containing the gas mixture that generates the plasma. Radiation generated by the plasma includes substantial radiance in a wavelength range below approximately 190 nanometers that causes damage to the materials used to construct the bulb. The water vapor acts as an absorber of radiation generated by the plasma in the wavelength range that causes damage. In some examples, a predetermined amount of water is introduced into the bulb to provide sufficient absorption. In some other examples, the temperature of a portion of the bulb containing an amount of condensed water is regulate to produce the desired partial pressure of water in the bulb.

Abstract: A laser sustained plasma light source includes a plasma bulb containing a working gas flow driven by an electric current sustained within the plasma bulb. Charged particles are introduced into the working gas of the plasma bulb. An arrangement of electrodes maintained at different voltage levels drive the charged particles through the working gas. The movement of the charged particles within the working gas causes the working gas to flow in the direction of movement of the charged particles by entrainment. The resulting working gas flow increases convection around the plasma and increases laser to plasma interaction. The working gas flow within the plasma bulb can be stabilized and controlled by control of the voltages present on the each of the electrodes. A more stable flow of working gas through the plasma contributes to a more stable plasma shape and position within the plasma bulb.

Abstract: A laser-sustained light source having a first laser source for providing a first beam portion having a first characteristic, a second laser source for providing a second beam portion having a second characteristic, where the first characteristic is different from the first characteristic, first optics that are reflective to the first characteristic and transmissive of the second characteristic, for reflecting the first beam portion along a first path into a reflection optics and through a cell to sustain a plasma, second optics that are reflective to the second characteristic and transmissive of the first characteristic, for reflecting the second beam portion along a second path into the reflection optics and through the cell to sustain the plasma, the first path exiting to the second optics, where the first beam is transmitted through the second optics and into a beam dump, and the second path exiting to the first optics, where the second beam is transmitted through the first optics and into the beam dump.

Abstract: A system for compensating abberative effects caused by a bulb of a plasma cell includes an illumination source configured to generate illumination; a plasma cell, the plasma cell including a bulb for containing a volume of gas; an ellipse configured to focus illumination from the illumination source into the volume of gas in order to generate a plasma within the volume of gas; and one or more adaptive optical elements configured to compensate for aberrations produced by one or more optical elements, the one or more adaptive optics elements positioned along an illumination pathway between the illumination source and the plasma cell.

Abstract: A method for sustaining a plasma includes providing a volume of a gas; generating illumination of a first selected wavelength; and forming a first plasma species in a first region of the gas and a second plasma species in a second region of the gas by focusing the illumination of the first wavelength into the volume of gas, the first region having a first average temperature and a first size, the second region having a second average temperature and a second size, the illumination of the first selected wavelength transmitted by the second plasma species, the illumination of the first selected wavelength absorbed by the first plasma species by tuning the first selected wavelength of the illumination to an absorption line of the first plasma species, the absorption line being associated with an ionic absorption transition or an excited neutral transition of the first plasma species.

Abstract: A laser-sustained plasma light source with a bulb for enclosing a relatively cool gas environment, and an electrode disposed at least partially within the gas environment. A power supply applies a potential to the electrode, where the power supply is sufficient to create a corona discharge at the electrode within the gas environment, and the power supply is not sufficient to produce an arc discharge within the gas environment. The corona discharge thereby produces a relatively heated gas environment. A pump laser source focuses a laser beam within the gas environment, where the laser beam is sufficient to ignite a plasma in the relatively heated gas environment, but is not sufficient to ignite a plasma in the relatively cool gas environment.

Abstract: A method of sustaining a plasma, by focusing a first wavelength of electromagnetic radiation into a gas within a volume, where the first wavelength is substantially absorbed by a first species of the gas and delivers energy into a first region of a plasma having a first size and a first temperature. A second wavelength of electromagnetic radiation is focused into the first region of the plasma, where the second wavelength is different than the first wavelength and is substantially absorbed by a second species of the gas and delivers energy into a second region of the plasma region within the first region of the plasma having a second size that is smaller than the first size and a second temperature that is greater than the first temperature.

Abstract: A pulse stretcher includes a plurality of substantially parallel slab-like optical paths of different optical path lengths and a plurality of reflecting surfaces, which are totally internally reflecting surface formed, located at an end of the corresponding optical path. Due to the different path lengths, the pulse stretcher can spread out an input pulse into a stretched pulse having a longer pulse duration and proportionally lower intensity than the initial pulse.