Patents by Inventor Anaya Kumar Vardya

Anaya Kumar Vardya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist develop and strip solvent compositions and method for their use
    Patent number: 6127097
    Abstract: Simple, environmentally friendly developers and strippers are disclosed for free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and photoresists. Both the developers and the strippers include benzyl alcohol, optionally also including a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water.
    Type: Grant
    Filed: March 18, 1997
    Date of Patent: October 3, 2000
    Assignee: International Business Machines Corporation
    Inventors: Nageshwer Rao Bantu, Anilkumar Chinuprasad Bhatt, Ashwinkumar Chinuprasad Bhatt, Joseph Alphonse Kotylo, Gerald Walter Jones, Robert John Owen, Kostas Papathomas, Anaya Kumar Vardya