Patents by Inventor Andong SUN

Andong SUN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sputtering method
    Patent number: 11710624
    Abstract: A sputtering method includes one or more sputtering processes. Each sputtering process includes in a first pre-sputtering phase, sputtering a target material on a baffle plate configured to shield a substrate; in a second pre-sputtering phase, sputtering a target material compound on the baffle plate; and in a main sputtering phase, sputtering the target material compound on the substrate. The first pre-sputtering phase is used to adjust a sputtering voltage for the main sputtering phase.
    Type: Grant
    Filed: October 20, 2020
    Date of Patent: July 25, 2023
    Assignee: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
    Inventors: Bingliang Guo, Huaichao Ma, Andong Sun, Henan Zhang, Boyu Dong, Lu Zhang, Yujing Chen
  • SPUTTERING METHOD
    Publication number: 20210040605
    Abstract: A sputtering method includes one or more sputtering processes. Each sputtering process includes in a first pre-sputtering phase, sputtering a target material on a baffle plate configured to shield a substrate; in a second pre-sputtering phase, sputtering a target material compound on the baffle plate; and in a main sputtering phase, sputtering the target material compound on the substrate. The first pre-sputtering phase is used to adjust a sputtering voltage for the main sputtering phase.
    Type: Application
    Filed: October 20, 2020
    Publication date: February 11, 2021
    Inventors: Bingliang GUO, Huaichao MA, Andong SUN, Henan ZHANG, Boyu DONG, Lu ZHANG, Yujing CHEN