Patents by Inventor André Leycuras

André Leycuras has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reactor and method for chemical vapor deposition
    Patent number: 6709520
    Abstract: The process for chemical vapor deposition of layers of material on a substrate which extend generally in a plane is disclosed. The process for depositing thin film materials on the substrate is made more economical by virtue of a better energy balance than previously disclosed. The substrate is heated by radiation from the heat of a duct but also by the gases passing over the substrate which themselves are heated by the duct. The heating of the gases further improves the coupling between the heating means and the substrate.
    Type: Grant
    Filed: October 16, 2000
    Date of Patent: March 23, 2004
    Assignee: Centre National de la Recherche Scientifique (CNRS)
    Inventor: André Leycuras
  • Method for epitaxial growth on a substrate
    Patent number: 6402836
    Abstract: The invention concerns a method for epitaxial growth of a material on a first solid material from a material melting on the material, characterized in that it comprises: a step of growth of the first material on the substrate, made of a second material; a step whereby crystalline tips of the first material are made to grow from the contact surface between the first material and the melting material; a step which consists in causing crystals to grow laterally from the crystalline tips in a plane parallel to that of the free surface of the melting material.
    Type: Grant
    Filed: October 25, 2000
    Date of Patent: June 11, 2002
    Assignee: CNRS (Centre National de la Recherche Scientifique)
    Inventor: André Leycuras