Patents by Inventor André Wisard

André Wisard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110097528
    Abstract: A packaging element formed from a plastic with an inorganic barrier layer with good penetration barrier effect against water vapour and gasses, where the packaging element is fitted with a coating generated in a vacuum with materials with the desired penetration barrier effect. The vacuum coating is over-lacquered to protect against abrasion and corrosion and to improve the mechanical stability.
    Type: Application
    Filed: August 28, 2008
    Publication date: April 28, 2011
    Applicant: ALCAN TECHNOLOGY & MANAGEMENT LTD.
    Inventors: Markus Dippel, Wolfgang Lohwasser, Manfred Hoffmann, André Wisard
  • Patent number: 5885357
    Abstract: In a process for coating a substrate surface with a layer of inorganic material, the inorganic material is vaporised in a vacuum chamber evacuated to at least 10.sup.-3 mbar by bombarding with an electron beam from a high voltage electron-beam gun and deposited on the substrate surface. Gas discharging is created between the point of incidence (A) of the electron beam on the inorganic material to be vaporised and an anode such that the electrostatic charge created by the high voltage electron-beam gun flows off via the anode. This way damage to the substrate, which may arise as a result discharging phenomena, can be effectively avoided.
    Type: Grant
    Filed: October 28, 1997
    Date of Patent: March 23, 1999
    Assignee: Alusuisse Technology & Management Ltd.
    Inventors: Wolfgang Lohwasser, Andre Wisard
  • Patent number: 5804258
    Abstract: In a process for coating a substrate surface with a layer of inorganic material, the inorganic material is vaporised in a vacuum chamber evacuated to at least 10.sup.-3 mbar by bombarding with an electron beam from a high voltage electron-beam gun and deposited on the substrate surface. Gas discharging is created between the point of incidence (A) of the electron beam on the inorganic material to be vaporised and an anode such that the electrostatic charge created by the high voltage electron-beam gun flows off via the anode. This way damage to the substrate, which may arise as a result discharging phenomena, can be effectively avoided.
    Type: Grant
    Filed: December 24, 1996
    Date of Patent: September 8, 1998
    Assignee: Alusuisse Technology & Management Ltd.
    Inventors: Wolfgang Lohwasser, Andre Wisard
  • Patent number: 5795628
    Abstract: Device containing a vacuum chamber 30 and situated therein a substrate 10 and a vaporization crucible 22 filled with inorganic materials 24. Situated in the region of the vacuum chamber 30 is an electron beam or laser gun 26, the electron or laser beam 27 of which is directed at the crucible 22. The device is employed for coating a substrate surface 18 e.g. a plastic film with a thin coating of inorganic materials, such as e.g. silicon oxides, by vapor deposition of the inorganic materials 24.The electron or laser beam 27 of the electron beam or laser gun 26 is directed at the surface of the inorganic materials 24 in the vaporizing crucible 22. The electron or laser beam 27 forms an angle .alpha. of 10.degree. to 80.degree. to the surface of the inorganic materials 24. On vaporizing the inorganic materials 24 an overhang 25 is formed in the inorganic materials 24 and, geometrically, there is no line of sight between the vaporizing inorganic materials and the substrate surface 18.
    Type: Grant
    Filed: February 28, 1997
    Date of Patent: August 18, 1998
    Assignee: Alusuisse Technology & Management Ltd.
    Inventors: Andre Wisard, Wolfgang Lohwasser