Patents by Inventor Andras G. Major
Andras G. Major has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220415604Abstract: A particle beam system includes a multiple beam particle source to generate a multiplicity of charged individual particle beams, and a multi-pole lens sequence with first and second multi-pole lens arrays. The particle beam system also includes a controller to control the multi-pole lenses of the multi-pole lens sequence so related groups of multi-pole lenses of the multi-pole lens sequence through which the same individual particle beam passes in each case altogether exert an individually adjustable and focussing effect on the respective individual particle beam passing therethrough.Type: ApplicationFiled: August 30, 2022Publication date: December 29, 2022Inventors: Dirk Preikszas, Hans Fritz, András G. Major
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Publication number: 20220392734Abstract: Certain improvements of multi-beam raster units such as multi-beam generating units and multi-beam deflector units of a multi-beam charged particle microscopes are provided. The improvements include design, fabrication and adjustment of multi-beam raster units including apertures of specific shape and dimensions. The improvements can enable multi-beam generation and multi-beam deflection or stigmation with higher precision. The improvements can be relevant for routine applications of multi-beam charged particle microscopes, for example in semiconductor inspection and review, where high reliability and high reproducibility and low machine-to-machine deviations are desirable.Type: ApplicationFiled: August 18, 2022Publication date: December 8, 2022Inventors: Yanko Sarov, Ulrich Bihr, Hans Fritz, Dirk Zeidler, Georg Kurij, Ralf Lenke, András G. Major, Christof Riedesel
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Publication number: 20220102104Abstract: A particle beam system includes a multi-beam particle source for generating a multiplicity of charged individual particle beams, and a magnetic multi-deflector array for deflecting the individual particle beams in the azimuthal direction. The magnetic multi-deflector array includes a magnetically conductive multi-aperture plate having a multiplicity of openings, which is arranged in the beam path of the particle beams such that the individual particle beams substantially pass through the openings of the multi-aperture plate. The magnetic multi-deflector array also includes a magnetically conductive aperture plate having an individual opening. The aperture plate is arranged in the beam path of the particle beams such that the individual particle beams substantially pass through the first aperture plate. The multi-aperture plate and the first aperture plate are connected to each other such that a cavity is formed between the two plates.Type: ApplicationFiled: December 9, 2021Publication date: March 31, 2022Inventors: Hans Fritz, András G. Major, Dirk Zeidler, Arne Thoma, Joerg Jacobi
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Patent number: 10161808Abstract: The invention concerns a method of and an arrangement for determining the heating condition of a mirror in an optical system, in particular in a microlithographic projection exposure apparatus. In an embodiment the mirror is an EUV mirror and a method according to the invention comprises the following steps: deflecting at least one input measuring beam on to the mirror; ascertaining at least one optical parameter of at least one output measuring beam produced from the input measuring beam after interaction with the mirror; and determining the heating condition of the mirror on the basis of the parameter.Type: GrantFiled: April 16, 2013Date of Patent: December 25, 2018Assignee: Carl Zeiss SMT GmbHInventors: Peter Vogt, Martin Hermann, Oliver Dier, Andras G. Major
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Publication number: 20180246415Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: ApplicationFiled: January 24, 2018Publication date: August 30, 2018Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
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Patent number: 9946161Abstract: An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.Type: GrantFiled: October 25, 2012Date of Patent: April 17, 2018Assignee: Carl Zeiss SMT GmbHInventors: Ingo Saenger, Ralf Scharnweber, Olaf Dittmann, Toralf Gruner, Gundula Weiss, Andras G. Major, Martin Vogt, Markus Deguenther, Johannes Wangler, Thomas Korb, Severin Waldis
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Patent number: 9897925Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: GrantFiled: December 15, 2015Date of Patent: February 20, 2018Assignee: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
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Publication number: 20160266502Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: ApplicationFiled: December 15, 2015Publication date: September 15, 2016Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
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Patent number: 9310701Abstract: A device for guiding electromagnetic radiation into a projection exposure apparatus for semiconductor lithography includes an optical fiber and an actuator for the mechanical manipulation of a section of the fiber as a result of which a temporally averaged homogenization of an intensity profile of electromagnetic radiation emerging at an exit end of the fiber can be achieved. A projection exposure apparatus for semiconductor lithography is equipped with the abovementioned device.Type: GrantFiled: February 8, 2012Date of Patent: April 12, 2016Assignee: Carl Zeiss SMT GmbHInventor: Andras G. Major
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Patent number: 9239229Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: GrantFiled: April 24, 2015Date of Patent: January 19, 2016Assignee: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
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Publication number: 20150300807Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: ApplicationFiled: April 24, 2015Publication date: October 22, 2015Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
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Patent number: 9052606Abstract: A microlithographic projection exposure apparatus includes a projection light source. The apparatus also includes a heating light source for generating heating light which is at least partly absorbed by an optical element. An illumination optical unit directs the heating light onto the optical element such that the heating light has a predefined intensity distribution on an optical surface of the optical element. The illumination optical unit includes a deflection element which is a diffractive optical element or a refractive freeform element. The deflection element simultaneously directs the heating light impinging thereon in different directions.Type: GrantFiled: September 26, 2012Date of Patent: June 9, 2015Assignee: Carl Zeiss SMT GmbHInventors: Andras G. Major, Manfred Maul, Gundula Weiss, Jochen Hetzler
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Patent number: 9019475Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: GrantFiled: April 17, 2014Date of Patent: April 28, 2015Assignee: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
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Patent number: 9013684Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: GrantFiled: July 24, 2012Date of Patent: April 21, 2015Assignee: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
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Patent number: 9013680Abstract: An illumination system of a microlithographic projection exposure apparatus includes a beam deflection array including a number beam deflection elements, for example mirrors. Each beam deflection element is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The light beams reflected from the beam deflection elements produce spots in a system pupil surface. The number of spots illuminated in the system pupil surface during an exposure process, during which a mask is imaged on a light sensitive surface, is greater than the number of beam deflection elements. This may be accomplished with the help of a beam multiplier unit that multiplies the light beams reflected from the beam deflection elements. In another embodiment the beam deflecting elements are controlled such that the irradiance distribution produced in the system pupil surface changes between two consecutive light pulses of an exposure process.Type: GrantFiled: July 14, 2010Date of Patent: April 21, 2015Assignee: Carl Zeiss SMT GmbHInventors: Damian Fiolka, Ralf Mueller, Andras G. Major
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Patent number: 9001309Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: GrantFiled: April 17, 2014Date of Patent: April 7, 2015Assignee: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
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Patent number: 8854604Abstract: A microlithographic projection exposure apparatus includes an optical surface, which may be formed by a plurality of micro-mirrors, and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device includes an illumination unit with a plurality of illumination members, each having a light exit facet. An optical imaging system establishes an imaging relationship between an object plane in which at least two light exit facets are arranged, and an image plane which at least substantially coincides with the optical surface. A detector unit measures the property of measuring light after it has interacted with the optical surface, and an evaluation unit determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit.Type: GrantFiled: August 23, 2011Date of Patent: October 7, 2014Assignee: Carl Zeiss SMT GmbHInventors: Markus Deguenther, Michael Patra, Andras G. Major
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Publication number: 20140233006Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: ApplicationFiled: April 17, 2014Publication date: August 21, 2014Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Manfred Maul, Johannes Eisenmenger, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Damian Fiolka, Andras G. Major, Johannes Wangler, Michael Layh
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Publication number: 20140226141Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: ApplicationFiled: April 17, 2014Publication date: August 14, 2014Applicant: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
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Patent number: 8773639Abstract: An illumination system of a microlithographic projection exposure apparatus comprises a pupil surface and an arrangement of individually drivable beam deviating elements. Each beam deviating element is configured to direct light impinging thereon onto different positions on the pupil surface in response to a control signal applied to the beam deviating element. According to the disclosure an attenuation unit is provided which is configured to reduce the intensity of light, which is directed by any arbitrary beam deviating element (onto the pupil surface, by more than 50%. This makes it possible to reduce the intensity of light in the pupil surface that has been reflected by defective beam deviating elements.Type: GrantFiled: December 7, 2009Date of Patent: July 8, 2014Assignee: Carl Zeiss SMT GmbHInventors: Markus Deguenther, Andras G. Major, Anne Christine Andresen