Patents by Inventor Andre Bernardus Jeunink
Andre Bernardus Jeunink has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230400783Abstract: An object table including: a holding surface for holding an object; and an actuator arrangement configured to exert a holding force on the object for holding the object to the holding surface, wherein the actuator arrangement is further configured to decrease a strain in the object caused by the holding force by sequentially detaching and re-attaching portions of the object from the holding surface, while the object is held to the holding surface.Type: ApplicationFiled: September 27, 2021Publication date: December 14, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Michael Marinus Anna STEUR, Bas JANSEN, Andre Bernardus JEUNINK, Johannes Adrianus Cornelis Maria PIJNENBURG
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Publication number: 20230260820Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.Type: ApplicationFiled: April 24, 2023Publication date: August 17, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Andre Bernardus JEUNINK, Robby Franciscus Josephus MARTENS, Youssef Karel Maria DE VOS, Ringo Petrus Cornelis VAN DORST, Gerhard Albert TEN BRINKE, Dirk Jerome Andre SENDEN, Coen Hubertus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Jelmer Mattheüs KAMMINGA, Evelyn Wallis PACITTI, Thomas POIESZ, Arie Cornelis SCHEIBERLICH, Bert Dirk SCHOLTEN, André SCHREUDER, Abraham Alexander SOETHOUDT, Siegfried Alexander TROMP, Yuri Johannes Gabriël VAN DE VIJVER
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Publication number: 20230221651Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.Type: ApplicationFiled: March 21, 2023Publication date: July 13, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Catharinus DE SCHIFFART, Michael Jozef Mathijs RENKENS, Gerard VAN SCHOTHORST, Andre Bernardus JEUNINK, Gregor Edward VAN BAARS, Sander Frederik WUISTER, Yvonne Wendela KRUIJT-STEGEMAN, Norbert Erwin Therenzo JANSEN, Toon HARDEMAN, George Arie Jan DE FOCKERT, Johan Frederik DIJKSMAN
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Patent number: 11664264Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.Type: GrantFiled: December 22, 2016Date of Patent: May 30, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Andre Bernardus Jeunink, Robby Franciscus Josephus Martens, Youssef Karel Maria De Vos, Ringo Petrus Cornelis Van Dorst, Gerhard Albert Ten Brinke, Dirk Jerome Andre Senden, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Jelmer Mattheüs Kamminga, Evelyn Wallis Pacitti, Thomas Poiesz, Arie Cornelis Scheiberlich, Bert Dirk Scholten, André Schreuder, Abraham Alexander Soethoudt, Siegfried Alexander Tromp, Yuri Johannes Gabriël Van De Vijver
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Patent number: 11635696Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.Type: GrantFiled: December 14, 2020Date of Patent: April 25, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Catharinus De Schiffart, Michael Jozef Mathijs Renkens, Gerard Van Schothorst, Andre Bernardus Jeunink, Gregor Edward Van Baars, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Norbert Erwin Therenzo Jansen, Toon Hardeman, George Arie Jan De Fockert, Johan Frederik Dijksman
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Publication number: 20220373894Abstract: A method is provided for determining surface parameters of a patterning device, comprising the steps of: positioning the patterning device with respect to a path of an exposure radiation beam using a first measurement system, providing the patterning device at a first focal plane of a chromatic lens arranged in a second measurement system, illuminating a part of a surface of the patterning device with radiation through the chromatic lens, wherein the radiation comprises a plurality of wavelengths, determining a position of the illuminated part of the patterning device in a first and second direction, collecting at least a portion of radiation reflected by the patterning device through the chromatic lens, measuring an intensity of the collected portion of radiation as a function of wavelength, to obtain spectral information of the illuminated area, and determining the surface parameters of the patterning device at the determined position from the spectral information.Type: ApplicationFiled: September 7, 2020Publication date: November 24, 2022Applicant: ASML Netherlands B.V.Inventors: Andre Bernardus JEUNINK, Erik Henricus Egidius Ca EUMMELEN, Bearrach MOEST, Derk ONCK, Johannes Adrianus Cornelis M PIJNENBURG, Hermen Folken PEN
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Publication number: 20210096468Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.Type: ApplicationFiled: December 14, 2020Publication date: April 1, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Catharinus DE SCHIFFART, Michael Jozef Mathijs RENKENS, Gerard VAN SCHOTHORST, Andre Bernardus JEUNINK, Gregor Edward VAN BAARS, Sander Frederik WUISTER, Yvonne Wendela KRUIJT-STEGEMAN, Norbert Erwin Therenzo JANSEN, Toon HARDEMAN, George Arie Jan DE FOCKERT, Johan Frederik DIJKSMAN
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Patent number: 10908510Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.Type: GrantFiled: August 26, 2019Date of Patent: February 2, 2021Assignee: ASML Netherlands B.V.Inventors: Catharinus De Schiffart, Michael Jozef Mathijs Renkens, Gerard Van Schothorst, Andre Bernardus Jeunink, Gregor Edward Van Baars, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Norbert Erwin Therenzo Jansen, Toon Hardeman, George Arie Jan De Fockert, Johan Frederik Dijksman
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Patent number: 10890851Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.Type: GrantFiled: December 1, 2017Date of Patent: January 12, 2021Assignee: ASML Netherlands B.V.Inventors: Catharinus De Schiffart, Michael Jozef Mathijs Renkens, Gerard Van Schothorst, Andre Bernardus Jeunink, Gregor Edward Van Baars, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Norbert Erwin Therenzo Jansen, Toon Hardeman, George Arie Jan De Fockert, Johan Frederik Dijksman
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Patent number: 10768535Abstract: A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.Type: GrantFiled: December 20, 2019Date of Patent: September 8, 2020Assignee: ASML NETHERLANDS B.V.Inventors: Andre Bernardus Jeunink, Robbert De Jong, Martinus Hendrikus Antonius Leenders, Evelyn Wallis Pacitti, Thomas Poiesz, Frank Pieter Albert Van Den Berkmortel
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Patent number: 10712678Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.Type: GrantFiled: February 17, 2016Date of Patent: July 14, 2020Assignee: ASML Netherlands B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Andre Bernardus Jeunink, Arie Jeffrey Den Boef, Vadim Yevgenyevich Banine, Michael Jozef Mathijs Renkens, Gerard Van Schothorst, Johan Frederik Dijksman, Carolus Johannes Catharina Schoormans, Adrianus Hendrik Koevoets, Catharinus De Schiffart, Sander Frederik Wuister
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Patent number: 10705438Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.Type: GrantFiled: December 17, 2019Date of Patent: July 7, 2020Assignee: ASML Netherlands B.V.Inventors: Andre Bernardus Jeunink, Laurentius Johannes Adrianus Van Bokhoven, Stan Henricus Van Der Meulen, Yang-Shan Huang, Federico La Torre, Bearrach Moest, Stefan Carolus Jacobus Antonius Keij, Enno Van Den Brink, Christine Henriette Schouten, Hoite Pieter Theodoor Tolsma
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Publication number: 20200183288Abstract: A clear-out tool is described, the clear-out tool being configured to at least partially remove a masking layer from a target area of an object using a laser beam. The clear-out tool includes a barrier member configured to be arranged above a surface of the object containing the target area and configured to contain a liquid in a space next to the target area or surrounding the target area.Type: ApplicationFiled: July 19, 2018Publication date: June 11, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Yang-Shan HUANG, Andre Bernardus JEUNINK, Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Victoria VORONINA
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Publication number: 20200152527Abstract: A method for revealing sensor targets on a substrate covered with a layer, the method including: obtaining locations of first areas on the substrate with yielding target portions and of second areas on the substrate with non-yielding target portions; at least partially removing feature regions of the layer covering sensor targets in the second areas to reveal sensor targets in the second areas; measuring a location of the revealed sensor targets in the second areas; determining a location of sensor targets in the first areas based on the measured location of the revealed sensor targets in the second areas; and at least partially removing sensor target regions of the layer covering the sensor targets in the first areas using the determined location of the sensor targets in the first areas.Type: ApplicationFiled: May 28, 2018Publication date: May 14, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Andre Bernardus JEUNINK, Victoria VORONINA, Tamara DRUZHININA, Brennan PETERSON, Johannes Adrianus Cornelis Maria PIJNENBURG
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Publication number: 20200142317Abstract: A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.Type: ApplicationFiled: December 20, 2019Publication date: May 7, 2020Applicant: ASML Netherlands B.V.Inventors: Andre Bernardus JEUNINK, Robert De Jong, Martinus Hendrikus Antonius Leenders, Evelyn Wallis Pacitti, Thomas Poiesz, Frank Pieter Albert Van Den Berkmortel
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Publication number: 20200117097Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.Type: ApplicationFiled: December 17, 2019Publication date: April 16, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Andre Bernardus JEUNINK, Laurentius Johannes Adrianus Van Bokhoven, Stan Henricus Van Der Meulen, Yang-Shan Huang, Federico La Torre, Bearrach Moest, Stefan Carolus Jacobus Antonius Keij, Enno Van Den Brink, Christine Henriette Schouten, Hoite Pieter Theodoor Tolsma
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Patent number: 10571814Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.Type: GrantFiled: June 29, 2017Date of Patent: February 25, 2020Assignee: ASML Netherlands B.V.Inventors: Andre Bernardus Jeunink, Laurentius Johannes Adrianus Van Bokhoven, Stan Henricus Van Der Meulen, Yang-Shan Huang, Federico La Torre, Bearrach Moest, Stefan Carolus Jacobus Antonius Keij, Enno Van Den Brink, Christine Henriette Schouten, Hoite Pieter Theodoor Tolsma
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Patent number: 10514615Abstract: A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.Type: GrantFiled: June 21, 2016Date of Patent: December 24, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Andre Bernardus Jeunink, Robbert De Jong, Martinus Hendrikus Antonius Leenders, Evelyn Wallis Pacitti, Thomas Poiesz, Frank Pieter Albert Van Den Berkmortel
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Publication number: 20190377265Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.Type: ApplicationFiled: August 26, 2019Publication date: December 12, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Catharinus DE SCHIFFART, Michael Jozef Mathijs RENKENS, Gerard VAN SCHOTHORST, Andre Bernardus JEUNINK, Gregor Edward VAN BAARS, Sander Frederik WUISTER, Yvonne Wendela KRUIJT-STEGEMAN, Norbert Erwin Therenzo JANSEN, Toon HARDEMAN, George Arie Jan DE FOCKERT, Johan Frederik DIJKSMAN
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Patent number: 10410914Abstract: A method of forming at least one lithography feature, the method including: providing at least one lithography recess on a substrate, the or each lithography recess having at least one side-wall and a base, with the at least one side-wall having a width between portions thereof; providing a self-assemblable block copolymer having first and second blocks in the or each lithography recess; causing the self-assemblable block copolymer to self-assemble into an ordered layer within the or each lithography recess, the ordered layer including at least a first domain of first blocks and a second domain of second blocks; causing the self-assemblable block copolymer to cross-link in a directional manner; and selectively removing the first domain to form lithography features of the second domain within the or each lithography recess.Type: GrantFiled: May 13, 2015Date of Patent: September 10, 2019Assignee: ASML Netherlands B.V.Inventors: Sander Frederik Wuister, Andre Bernardus Jeunink, Emiel Peeters