Patents by Inventor Andre Bresan

Andre Bresan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this type
    Patent number: 9541685
    Abstract: A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.
    Type: Grant
    Filed: August 20, 2013
    Date of Patent: January 10, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Holger Kierey, Heiko Siekmann, Andre Bresan
  • METHOD FOR PRODUCING A REFLECTIVE OPTICAL COMPONENT FOR AN EUV PROJECTION EXPOSURE APPARATUS AND COMPONENT OF THIS TYPE
    Publication number: 20130335816
    Abstract: A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.
    Type: Application
    Filed: August 20, 2013
    Publication date: December 19, 2013
    Inventors: Holger Kierey, Heiko Siekmann, Andre Bresan
  • Optical integrator for an illumination system of a microlithographic projection exposure apparatus
    Patent number: 8520307
    Abstract: The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
    Type: Grant
    Filed: December 20, 2010
    Date of Patent: August 27, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Oliver Wolf, Heiko Siekmann, Eva Kalchbrenner, Siegfried Rennon, Johannes Wangler, Andre Bresan, Michael Gerhard, Nils Haverkamp, Axel Scholz, Ralf Scharnweber, Michael Layh, Stefan Burkart
  • OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    Publication number: 20110083542
    Abstract: The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
    Type: Application
    Filed: December 20, 2010
    Publication date: April 14, 2011
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Oliver Wolf, Heiko Siekmann, Eva Kalchbrenner, Siegfried Rennon, Johannes Wangler, Andre Bresan, Michael Gerhard, Nils Haverkamp, Axel Scholz, Ralf Scharnweber, Michael Layh, Stefan Burkart
  • Optical integrator for an illumination system of a microlithographic projection exposure apparatus
    Patent number: 7880969
    Abstract: The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
    Type: Grant
    Filed: August 5, 2008
    Date of Patent: February 1, 2011
    Assignee: Carl Zeiss SMT AG
    Inventors: Oliver Wolf, Heiko Siekmann, Eva Kalchbrenner, Siegfried Rennon, Johannes Wangler, Andre Bresan, Michael Gerhard, Nils Haverkamp, Axel Scholz, Ralf Scharnweber, Michael Layh, Stefan Burkart
  • OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    Publication number: 20090021839
    Abstract: The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
    Type: Application
    Filed: August 5, 2008
    Publication date: January 22, 2009
    Applicant: CARL ZEISS SMT AG
    Inventors: Oliver Wolf, Heiko Siekmann, Eva Kalchbrenner, Siegfried Rennon, Johannes Wangler, Andre Bresan, Michael Gerhard, Nils Haverkamp, Axel Scholz, Ralf Scharnweber, Michael Layh, Stefan Burkart