Patents by Inventor Andre Collet

Andre Collet has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for Producing a Multi-Stage Recess in a Layer Structure and a Field Effect Transistor with a Multi-Recessed Gate
    Publication number: 20080064155
    Abstract: The method for forming a multi-stage recess in a layer structure comprises forming a photo-resist film atop a layer structure; a first step (49, 70) of etching the layer structure through an opening of the photo-resist film used as a mask, for forming a first stage of the recess; a step of widening the opening of the photo-resist film after the first etching step, for producing a widened opening of the photo-resist film, and a second step (58, 72) of etching the layer structure through the widened opening of the photo-resist film for forming a second stage of the multi-stage recess.
    Type: Application
    Filed: August 26, 2005
    Publication date: March 13, 2008
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.
    Inventors: Pierre Baudet, Andre Collet, Sylvain Demichel
  • .alpha.-hydrazino acid derivatives and method for making same
    Patent number: 5962722
    Abstract: An .alpha.-hydrazino acid derivative of general formula (I) is described, wherein R.sub.1, R.sub.2, R.sub.3 are hydrogen or a carbon radical, such that when R.sub.2 and R.sub.3 are different, C* is an asymmetric carbon of L, D or DL configuration, and R.sub.4 and R.sub.5 are a protecting group, characterized in that R.sub.4 is a benzyl ArCH.sub.2 radical of formula (a), wherein Ar is a phenyl radical or phenyl substituted by one or more X groups; X being hydrogen, halogen, a nitro or alkyl radical; and in that R.sub.5 is a Y--O--CO group, where Y is a carbon radical different from R.sub.4.
    Type: Grant
    Filed: March 3, 1998
    Date of Patent: October 5, 1999
    Assignee: Centre National de la Recherche Scientifique
    Inventors: Andre Collet, Joelle Vidal, Jean-Christophe Hannachi, Laure Guy
  • Photolithographic method producing sub-micron patterns in the manufacture of electronic microcircuits
    Patent number: 4816377
    Abstract: A high-resolution photosensitive composition which can be plasma-developed, including an acrylic a polymer and a photosensitive compound, of the aromatic azide group, in which the polymer contains, in a side chain, at least one aromatic nucleus where at least one chlorine atom (Cl) has replaced at least one hydrogen atom (H), for example ##STR1##
    Type: Grant
    Filed: January 7, 1988
    Date of Patent: March 28, 1989
    Assignee: U.S. Philips Corporation
    Inventors: Andre Collet, Serge Gourrier, Olivier Maurin
  • High-resolution photosensitive composition which can be developed by plasma and a photolithographic method of using said composition
    Patent number: 4741986
    Abstract: A high-resolution photosensitive composition which can be plasma-developed, including an acrylic polymer and a photosensitive compound, of the aromatic azide group, in which the polymer contains, in a side chain, at least one aromatic nucleus where at least one chlorine atom (Cl) has replaced at least one hydrogen atom (H) for example ##STR1##
    Type: Grant
    Filed: June 16, 1986
    Date of Patent: May 3, 1988
    Assignee: U.S. Philips Corp.
    Inventors: Andre Collet, Serge Gourrier, Olivier Maurin