Patents by Inventor Andre' Hiess

Andre' Hiess has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma etching of tapered structures
    Publication number: 20070108160
    Abstract: The invention relates to a method of plasma etching substrates, in particular of etching tapered passages through substrates, using a process gas comprising at least one halogenide and oxygen.
    Type: Application
    Filed: November 14, 2006
    Publication date: May 17, 2007
    Applicant: SCHOTT AG
    Inventors: Ha-Duong Ngo, Volker Seidemann, Daniel Studzinski, Martin Lange, Andre' Hiess