Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

Abstract: The invention provides a stage apparatus, comprising an object support comprising a ring shaped protrusion having an outer radius in a first plane, and configured to support an object with a radius in the first plane larger than the outer radius of the ring shaped protrusion. The stage apparatus further comprises a sensor module configured to detect the object support, and the object when it is arranged on the object support. The stage apparatus further comprises a processing unit configured to receive one or more signals from the sensor module, and to determine, based on said one or more signals, a position of the object relative to the ring shaped protrusion when the object is arranged on the object support. The processing unit is further configured to determine, based on said position of the object, an offset value representing the position of the object relative to the ring shaped protrusion.

Abstract: A substrate holder for supporting a substrate, a lithographic apparatus having the substrate holder and a method of supporting the substrate. The substrate holder includes a main body, a plurality of supporting pins, and a plate. The plate is positioned between a surface of the main body and a support surface formed by the plurality of supporting pins. The plate is actuatable in a direction along the plurality of supporting pins between the surface of the main body and the support surface. The substrate holder may also include a main body, a flexible member and a fixed member protruding from a surface of the main body. The flexible member defines an enclosed cavity therein and configured to form a seal with the substrate supported on the substrate holder. The substrate holder is configured to reduce pressure in the enclosed cavity of the flexible member.

Abstract: A substrate holder including: a main body having a main body surface; a plurality of burls projecting from the main body surface and configured for supporting the substrate; and an edge seal projecting from the main body surface, wherein: the edge seal is spaced apart from the plurality of burls so as to define a gap therebetween, the gap having a width greater than or equal to about 75% of a pitch of the plurality of burls; the plurality of burls includes a first group of burls and a second group of burls surrounding the first group of burls; and the stiffness in the direction perpendicular to the support plane per unit area of the second group of burls is greater than or equal to about 150% of the stiffness in the direction perpendicular to the support plane per unit area of the first group of burls.

Abstract: The invention provides a stage apparatus, comprising an object support comprising a ring shaped protrusion having an outer radius in a first plane, and configured to support an object with a radius in the first plane larger than the outer radius of the ring shaped protrusion. The stage apparatus further comprises a sensor module configured to detect the object support, and the object when it is arranged on the object support. The stage apparatus further comprises a processing unit configured to receive one or more signals from the sensor module, and to determine, based on said one or more signals, a position of the object relative to the ring shaped protrusion when the object is arranged on the object support. The processing unit is further configured to determine, based on said position of the object, an offset value representing the position of the object relative to the ring shaped protrusion.

Abstract: A system for cleaning a substrate support having a plurality of projections extending in a first direction each with a terminal surface arranged to be in contact with the substrate, the system including: a treatment tool arranged for relative movement in a second direction orthogonal to the first direction and a third direction orthogonal to the first and second directions over the terminal surfaces of the projections to remove matter from the substrate support; and a controller to control the treatment tool dependent upon a position in the second and third directions of the treatment tool relative to the substrate support such that the removal amount from each of the plurality of projections is maintained substantially constant from one projection to another.

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

Abstract: An interferometric displacement measuring system operable to measure displacements of a movable object of the lithographic apparatus in a first direction using a measurement beam of radiation and a reflector. The reflector being substantially planar and substantially perpendicular to the first direction. Calibration is obtained using a first set of measurements of the angular position movable object. A phase offset in the measurement beam is affected. A second set of measurements of the angular position of the movable object is obtained. The interferometric displacement measuring system is calibrated based on the first and second sets of measurements.

Abstract: An interferometric displacement measuring system operable to measure displacements of a movable object of the lithographic apparatus in a first direction using a measurement beam of radiation and a reflector. The reflector being substantially planar and substantially perpendicular to the first direction. Calibration is obtained using a first set of measurements of the angular position movable object. A phase offset in the measurement beam is affected. A second set of measurements of the angular position of the movable object is obtained. The interferometric displacement measuring system is calibrated based on the first and second sets of measurements.

Abstract: A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.

Abstract: A lithographic apparatus includes a position measuring system configured to measure a position of a moveable object with respect to a reference frame of the lithographic apparatus, in at least one direction of an orthogonal x-y-z coordinate system of the moveable object. The position measuring system includes an optical x-z-encoder configured to measure a displacement of a radiation source, a first grating, and a detector with respect to a second grating of the encoder. The first grating includes an alignment marker. A controller is configured to define a zero level of the moveable object with respect to the reference frame in at least one of the x- and z-direction by performing the scanning along the first grating, the alignment marker during the scanning step causing changes in the phase of the response of both the first positive and negative orders.

Abstract: A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.

Abstract: A lithographic apparatus includes a position measuring system configured to measure a position of a moveable object with respect to a reference frame of the lithographic apparatus, in at least one direction of an orthogonal x-y-z coordinate system of the moveable object. The position measuring system includes an optical x-z-encoder configured to measure a displacement of a radiation source, a first grating, and a detector with respect to a second grating of the encoder. The first grating includes an alignment marker. A controller is configured to define a zero level of the moveable object with respect to the reference frame in at least one of the x- and z-direction by performing the scanning along the first grating, the alignment marker during the scanning step causing changes in the phase of the response of both the first positive and negative orders.

Abstract: A lithographic apparatus includes a liquid supply system to supply an immersion liquid between a downstream lens of a projection system of the lithographic apparatus and a substrate. The lithographic apparatus further includes a closing element to close an underside of the liquid supply system thus preventing leaking of the immersion liquid from the liquid supply system when the substrate is removed from the underside of the liquid supply system. According to an aspect of the invention, an inductive sensor may be used to measure a position of the closing element. The inductive sensor may include an eddy current sensor. A metal foil or other conductive layer may be applied to the closing element. According to an aspect of the invention, a fast return of the closing disc into the holder is now made possible making use of the position of the closing disc as established with the inductive sensor.

Abstract: A lithographic apparatus comprises a liquid supply system to supply an immersion liquid between a downstream lens of a projection system of the lithographic apparatus and a substrate. The lithographic apparatus further comprises a closing element to close an underside of the liquid supply system thus preventing a leaking away of the immersion liquid from the liquid supply system when the substrate is removed from the underside of the liquid supply system. According to an aspect of the invention, an inductive sensor may be used to measure a position of the closing element. The inductive sensor may comprise an eddy current sensor, a metal foil or other conductive layer may be applied to the closing element. According to an aspect of the invention, a fast bringing back of the closing disc into the holder is now made possible making use of the position of the closing disc as established with the inductive sensor.