Abstract: The invention relates to a textile item comprising a receptacle (20) for housing a portable electronic device (10), characterised in that the above also comprises a functional marking (21-24) on an accessible face (20) thereof, which comprises at least one code the distribution of which coincides with the control bodies of the portable electronic device, such that each code may be placed in correspondence with a control body on the portable electronic device (10) when the portable electronic device (10) is placed in the receptacle (20).

Abstract: A method is provided for locally creating an aperture in a metal layer that is formed above a base wafer having at least one lateral mark provided in its peripheral edge and at least one surface mark provided at a point on its surface. Coordinates of a starting position of a tool with respect to the peripheral edge and the lateral mark are found, and coordinates of the position of the surface mark with respect to the starting position of the tool are calculated so as to determine a course to be followed by the tool from the starting position to a working position above the surface mark. The tool is moved to the working position and activated so as to etch the metal layer and create the aperture in the metal layer above the surface mark. Also provided is a device for locally creating an aperture in a metal layer that is formed above a base wafer.

Abstract: The present invention relates to a method for characterizing at least one photorepeater and a same set of patterns implemented on several regions of a wafer, including the steps of making a standard reticle defining at least one first series of at least three identical reference patterns, which are not aligned; successively exposing several regions of a standard wafer by varying the illumination dose from one region to another; measuring the respective dimensions of the reference patterns reproduced on the different regions of the wafer to determine, for each illumination does, the mean dimension of the reference patterns; and performing a linear interpolation of these mean dimensions.