Abstract: The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.

Abstract: The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.

Abstract: The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.

Abstract: Actuator arrangements are disclosed. An actuator arrangement can include a first fluidic-based actuator device designed to exert a first force on a first location of a body associated with the first actuator device. An actuator arrangement can also include a second fluidic-based actuator device designed to exert a second force on a second location of the body associated with the first actuator device. The distance between the first and second locations can be small. The maximum value of the second force can be less than the maximum value of the first force.

Abstract: The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.

Abstract: A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided.

Abstract: Actuator arrangement, serving in particular to effect a deformation of an optical element, with a first, specifically fluidic-based actuator device (110.3), which is designed to exert on a body (108, 109.1) associated with the first actuator device (110.3) a first actuator force in an amount up a first maximum force value, wherein the arrangement includes a second, specifically fluidic-based actuator device (110.4), wherein the second actuator device (110.4) is designed to exert on the body (108, 109.1) associated with the first actuator device (110.3) a second actuator force in an amount up a second maximum force value, wherein further the second actuator device (110.4) is arranged in such a way in relation to the first actuator device (110.3) that the respective lines of action of the first actuator force and the second actuator force have at most a small distance from each other in the area of the their respective points of application on the body (108, 109.

Abstract: This invention relates to a method and system for simultaneously sublimating two or more sublimation dyes on the opposite sides of a single-layer fabric and a single layer, double-side garment produced thereby. The method and system includes the preparation of compatible top and bottom sublimation transfer sheets, as well as the use and selection of varying temperatures for the top and bottom panels of a double-sided sublimation printing machine. The product produced by this method and system is a double-sided, single layer garment which is light weight, extremely versatile, aesthetically appealing and less costly to manufacture than other double-sided garments.