Abstract: A tape-substrate coating line has a vacuum chamber formed by chamber walls and a device, disposed in the vacuum chamber, for surface treatment of a tape substrate. The device includes a process temperature-control roller having a cylindrical lateral face. At least one part-circumference of the lateral face is enclosed by a processing space which has an arrangement of compartments delimited by separation wall elements. At least one coating installation is disposed in at least one compartment, and includes a conveying installation for conveying the tape substrate over the lateral face. The size, number and arrangement of the compartments are variable in that each separation wall element is attachable to one of a plurality of predefined positions within the processing space.