Abstract: A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses contaminating substances, is examined with regard to a contamination limit before the wafer (13) is exposed in an EUV projection exposure system (1). The method preferably includes: arranging the wafer (13) and/or a test disc coated with the same resist (13a) as the resist (13a) of the wafer (13) in a vacuum chamber (19), evacuating the vacuum chamber (19), and measuring the contamination potential of the contaminating substances outgassed from the wafer (13) in the evacuated vacuum chamber (19), and also comparing the contamination potential of the wafer (13) with a contamination limit. An EUV projection exposure system (1) for carrying out the method is also disclosed.

Abstract: A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses contaminating substances, is examined with regard to a contamination limit before the wafer (13) is exposed in an EUV projection exposure system (1). The method preferably includes: arranging the wafer (13) and/or a test disc coated with the same resist (13a) as the resist (13a) of the wafer (13) in a vacuum chamber (19), evacuating the vacuum chamber (19), and measuring the contamination potential of the contaminating substances outgassed from the wafer (13) in the evacuated vacuum chamber (19), and also comparing the contamination potential of the wafer (13) with a contamination limit. An EUV projection exposure system (1) for carrying out the method is also disclosed.

Abstract: A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses contaminating substances, is examined with regard to a contamination limit before the wafer (13) is exposed in an EUV projection exposure system (1). The method preferably includes: arranging the wafer (13) and/or a test disc coated with the same resist (13a) as the resist (13a) of the wafer (13) in a vacuum chamber (19), evacuating the vacuum chamber (19), and measuring the contamination potential of the contaminating substances outgassed from the wafer (13) in the evacuated vacuum chamber (19), and also comparing the contamination potential of the wafer (13) with a contamination limit. An EUV projection exposure system (1) for carrying out the method is also disclosed.

Abstract: A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses contaminating substances, is examined with regard to a contamination limit before the wafer (13) is exposed in an EUV projection exposure system (1). The method preferably includes: arranging the wafer (13) and/or a test disc coated with the same resist (13a) as the resist (13a) of the wafer (13) in a vacuum chamber (19), evacuating the vacuum chamber (19), and measuring the contamination potential of the contaminating substances outgassed from the wafer (13) in the evacuated vacuum chamber (19), and also comparing the contamination potential of the wafer (13) with a contamination limit. An EUV projection exposure system (1) for carrying out the method is also disclosed.

Abstract: Imaging system of a microlithographic projection exposure apparatus, with a projection objective (200, 300, 500, 600) that serves to project an image of a mask which can be set into position in an object plane onto a light-sensitive coating layer which can be set into position in an image plane, and with a liquid-delivery device (205) serving to fill immersion liquid (202, 310, 507) into an interstitial space between the image plane and a last optical element (201, 309, 506) on the image-plane side of the projection objective; wherein the last optical element on the image-plane side of the projection objective is arranged so that, seen in the direction of gravity, it follows the image plane; and wherein the projection objective is configured in such a way that when the system is operating with immersion, the immersion liquid has at least in some areas a convex-curved surface facing in the direction away from the image plane.

Abstract: Imaging system of a microlithographic projection exposure apparatus with a projection objective (200, 300, 500, 600) that serves to project an image of a mask which can be set into position in an object plane onto a light-sensitive coating layer which can be set into position in an image plane, and with a liquid-delivery device (205) serving to fill immersion liquid (202, 310, 507) into an interstitial space between the image plane and a last optical element (201, 309, 506) on the image-plane side of the projection objective; wherein the last optical element on the image-plane side of the projection objective is arranged so that, seen in the direction of gravity, it follows the image plane; and wherein the projection objective is configured in such a way that when the system is operating with immersion, the immersion liquid has at least in some areas a convex-curved surface facing in the direction away from the image plane.

Abstract: A method and apparatus of interrogating an addressable array unit, which includes a substrate, a light reflecting layer on a front side of the substrate, and a plurality of features on a front side of the array. The method may include, for each of multiple features, illuminating the feature simultaneously with reflected and non-reflected interrogating light. A light emitted from respective features is detected. Either or both, constructive interference of interrogating light at the features, or constructive interference of light emitted from the features, can be obtained to allow lowering of light power from the source, enhanced signal, or reduced noise, or combinations of the foregoing. High depth discrimination may also be obtained without the need for a confocal detection system with conventional pinhole.

Abstract: Methods for correcting systematic errors in the measured position of deposited features of a nucleic acid array on a substrate. Systematic errors are modeled by an algorithmic model based on measuring the positions (and possibly other properties) of a subset of the features, and a model is constructed for predicting deviations in feature position from an ideal grid. Deviations arising in the deposition process, the scanning process, or both may be corrected.

Abstract: A method of interrogating an addressable array unit having a transparent substrate with a back surface, and an array with a plurality of different chemical features on a front surface. The method may include illuminating the features while the array is dry, with an interrogating light which is directed through the substrate from the back surface and onto the chemical features on the front surface. The light emitted from respective features in response to the interrogating light may be detected, which detected light has passed from the front surface, through the substrate and out the back surface. In one arrangement the light is emitted from locations of the features which are spaced from the front surface a distance of less than one-eighth of the wavelength of the illuminating light in a gas or a vacuum which is in contact with the dry array. Other methods and a package containing an addressable array are also provided.

Abstract: A method and system for calibrating molecular arrays to a reference molecular array, and for subsequently calibrating the molecular arrays to maintain a constant signal-intensity-to-label-concentration ratio. In the first step of the two-step calibration method, a reference array coated with the fluorophore or chromophore used to label probe molecules is employed, while in the second step of the two-step method, a reference array coated with a stable dye is employed.

Abstract: A method of interrogating an addressable array having a plurality of different chemical features. The method may include simultaneously illuminating different regions of the array with light of different intensities (which, for example, can, but need not be, also of a same waveband). Light emitted from the different regions in response to the illuminating (which light, for example, can, but need not be, of a same waveband) may be simultaneously detected with different detectors. An apparatus, addressable array unit, and related methods are further provided.

Abstract: A maximum sensitivity optical scanning system is disclosed. It finds use in a variety of applications, including the reading of biopolymeric arrays. It operates by scanning sample at a setting selected to result in signal saturation for some, but not all available data. Subsequent scans of the same area are taken at lower sensitivity settings (in terms of detector gain and/or excitation light source gain or attenuation) and data from at least the previously saturated regions is obtained. If system sensitivity is set too low to produce useful results, optional features may adjust sensitivity upward and follow with an increased sensitivity scan as a remedial measure. Full signal sensitivity is better preserved as most needed in taking data for the weakest signals first with the high-level scan. Data for sample producing stronger signals that can better tolerate photobleaching is then taken in one way or another.

Abstract: A method, apparatus, and computer program product for reading fluorescence signals from an array of chemical moieties (such as different sequence peptides or polynucleotides, for example different DNA sequences). In the method the spatial sequence of scanned locations need not be the same as the temporal sequence. For example, a later illuminated line may be spatially closer to an earlier illuminated line than is a temporally intervening illuminated line.

Abstract: Array units and methods are provided which have constructions to reduce or take advantage of Fresnel reflection. The array units may have a substantially unreflective substrate. In one arrangement a transparent spacer layer is provided while in another an anti-reflective layer is present.

Abstract: A projection surface includes scattering microparticles that are in constant motion in relation to each other and to a source of laser radiation in a laser projection system. The microparticles reduce the formation of spots that normally occur when viewing the contents of images which are uniformly illuminated by means of laser projection and which are reflected off a projection surface. The microparticles are reflective in a suspension fluid and move due to Brownian molecular motion. A mirror is placed on the back wall of the screen so that the viewer sees both the backscattered light from the incident beam as well as the forward scattered light from the reflected beam. A cellular structure is located in the suspension fluid to laterally confine the scattered light increasing the sharpness of the laser light seen by the viewer.

Abstract: A projection surface includes scattering microparticles that are in constant motion in relation to each other and to a source of laser radiation in a laser projection system. The microparticles reduce the formation of spots that normally occur when viewing the contents of images which are uniformly illuminated by means of laser projection and which are reflected off a projection surface. The microparticles are reflective in a suspension fluid and move due to Brownian molecular motion. A mirror is placed on the back wall of the screen so that the viewer sees both the backscattered light from the incident beam as well as the forward scattered light from the reflected beam. A cellular structure is located in the suspension fluid to laterally confine the scattered light increasing the sharpness of the laser light seen by the viewer.

Abstract: A technique for analyzing analytes in a chemical array having a plurality of pixels is provided. The apparatus of the technique contains a light source for irradiating a light beam at the pixels individually, a controller for controlling the relative position of the light source to the array, and a detector for detecting fluorescence resulting from irradiation. The controller controls the light beam generated by the light source to irradiate a first number of pixels sequentially in the array and repeating one or more times the sequential irradiation before irradiating a second number of pixels, the pixels of which are different from those of the first number of pixels. The first number of pixels includes more than one pixel but less than the total number of pixels in the array.

Abstract: A technique for analyzing analytes in a chemical array having a plurality of pixels is provided. The apparatus of the technique contains a light source for irradiating a light beam at the pixels individually, a controller for controlling the relative position of the light source to the array, and a detector for detecting fluorescence resulting from irradiation. The controller controls the light beam generated by the light source to irradiate a first number of pixels sequentially in the array and repeating one or more times the sequential irradiation before irradiating a second number of pixels, the pixels of which are different from those of the first number of pixels. The first number of pixels includes more than one pixel but less than the total number of pixels in the array.

Abstract: An interferometer arrangement has an adjustable optical path length difference in at least one interferometer arm and a photoelectric receiver for detecting the interference signals generated by the interferometer. An incremental grating transmitter is coupled to the arrangement with a device for changing the optical path length difference and for generating a reference signal which changes its frequency like that of the interference signal depending on the rate of change of the optical path difference.

Abstract: A system for imaging through a tilted plane parallel plate, in which image quality is improved by inserting additional transparent plates between an object that is imaged and the imaging lens, includes at least two plates of preferably identical thickness and material to that of the plate through which the object is imaged. The plates are tilted by appropriate angles around tilt axes that are orthogonal to the optical axis of the lens. The tilt axes themselves are rotated around the optical axis with respect to each other. The invention greatly improves the image quality when imaging through a tilted plane parallel plate. The preexisting optical system remains rotationally symmetric except for the plates inserted therein. Such plane plates are readily manufacturable at reasonable cost, and they require only noncritical alignment within the system.