Patents by Inventor Andreas Elsaesser

Andreas Elsaesser has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5436106
    Abstract: The invention relates to a positive-working colored photosensitive recording material for the production of a color test image, composed of a temporary layer carrier, a photosensitive layer containing dyestuff or pigment, binder and quinonediazide compound and an adhesive layer which can be activated by means of heat, wherein a release layer based on polyvinyl alcohol is present on the surface of the temporary layer carrier, the photosensitive layer comprises, as the quinonediazide compound, an esterification product of a compound containing one or more phenolic hydroxyl groups and o-quinonediazide-sulfonyl chloride, and, as the binder, a novolak-free phenolic polymer resin and/or a reaction product of the phenolic polymer resin with a monoisocyanate, and the adhesive layer comprises a alkali-insoluble organic polymer and an alkali-soluble polyester. The invention also relates to a process for the production of a color test image using the recording material described.
    Type: Grant
    Filed: July 11, 1994
    Date of Patent: July 25, 1995
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Dieter Mohr, Martin Benzing, Juergen Mertes, Guenter Hultzsch, Ine Gramm, Manfred Michel, Andreas Elsaesser, Shane Hsieh, David L. Siegfried
  • Patent number: 5413899
    Abstract: A light-sensitive mixture which contains a resinous binder which is insoluble in water but soluble or at least swellable in aqueous-alkaline solutions, and an o-naphthoquinonediazide-sulfonic acid ester, the o-naphthoquinonediazide-sulfonic acid ester being of the formula I ##STR1## in which R is hydrogen or an alkyl or aryl radical andR.sub.1 is hydrogen or a 1,2-naphthoquinone-2-diazide-4-sulfonyl, 1,2-naphthoquinone-2-diazide-5-sulfonyl or 7-methoxy-1,2-naphthoquinone-2-diazide-4-sulfonyl radical,and the number of the identical or different naphthoquinonediazide-sulfonyl radicals, defined as R.sub.1, in the molecule being 1 to 5; is useful in the preparation of light-sensitive resist materials. The resist material produced using the light-sensitive mixture has a high light sensitivity and very good developer resistance to alkaline developers and can be developed without any problems with aqueous, weakly alkaline solutions.
    Type: Grant
    Filed: June 6, 1994
    Date of Patent: May 9, 1995
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Siegfried Scheler, Andreas Elsaesser, Gerhard Buhr, Klaus Bergmann, Wolfgang Zahn
  • Patent number: 5378584
    Abstract: A radiation-sensitive recording material, in particular for producing planographic printing plates, is disclosed. The material is composed of a layer support and a positive-working, radiation-sensitive layer having a rough surface containing at least one 1,2-quinonediazide as a radiation-sensitive compound, a polycondensate or polymer as a binder insoluble in water and soluble or swellable in aqueous-alkaline solutions, a dye and a filler. At a layer weight of 3 g/m.sup.2 or less, the radiation-sensitive layer comprises a silicic acid product having a mean grain size in the range from 3 to 5 .mu.m with an exclusion limit of 15 .mu.m as a filler in such a quantity that it exhibits a Bekk smoothness in the range from 20 to 100 seconds (determined according to DIN 53 107, Method A). The layer additionally comprises a surfactant having polysiloxane units.
    Type: Grant
    Filed: August 4, 1992
    Date of Patent: January 3, 1995
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans W. Frass, Ernst-August Hackmann, Klaus Joerg, Dietmar Koenneke, Rudolf Neubauer, Andreas Elsaesser
  • Patent number: 5376496
    Abstract: A radiation-sensitive mixture, a radiation-sensitive recording material produced from themixture, and a process for producing heat-resistant and chemical-resistant relief copies using the recording material are disclosed. The normally positive-working radiation-sensitive mixture contains(1) a water-insoluble polymeric binder which is soluble in aqueous alkaline solutions, and(2) a 1,2-quinone diazide and/or a combination ofa compound which forms strong acid when exposed to actinic radiation anda compound containing at least one acid-cleavable C--O--C bond.The polymeric binder has a molecular weight of between about 5,000 and 100,000 and a content of phenolic hydroxyl groups of about 1 to 15, preferably about 2 to 10, mmol/g of polymer. It has a content of --CH.sub.3-n X.sub.n units of at least 0.1, preferably about 0.5 to 2, mmol/g of polymer, X being halogen such as chlorine, bromine or iodine and n being 1, 2 or 3.
    Type: Grant
    Filed: January 30, 1991
    Date of Patent: December 27, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Andreas Elsaesser, Hans W. Frass, Dieter Mohr
  • Patent number: 5348833
    Abstract: The invention relates to a positive-working colored photosensitive recording material for the production of a color test image, composed of a temporary layer carrier, a photosensitive layer containing dyestuff or pigment, binder and quinonediazide compound and an adhesive layer which can be activated by means of heat, wherein a release layer based on polyvinyl alcohol is present on the surface of the temporary layer carrier, the photosensitive layer comprises, as the quinonediazide compound, an esterification product of a compound containing one or more phenolic hydroxyl groups and o-quinonediazide-sulfonyl chloride, and, as the binder, a novolak-free phenolic polymer resin and/or a reaction product of the phenolic polymer resin with a monoisocyanate, and the adhesive layer compresses a alkali-insoluble organic polymer and an alkali-soluble polyester. The invention also relates to a process for the production of a color test image using the recording material described.
    Type: Grant
    Filed: September 4, 1992
    Date of Patent: September 20, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Dieter Mohr, Martin Benzing, Juergen Mertes, Guenter Hultzsch, Ine Gramm, Manfred Michel, Andreas Elsaesser, Shane Hsieh, David L. Siegfried
  • Patent number: 5314787
    Abstract: Grained, anodized and hydrophilized lithographic printing plates which have a negative or positive working radiation-sensitive coating, are exposed and are developed in an aqueous alkaline solution, are subjected, after hydrophilization, to a treatment with a salt solution containing divalent or polyvalent cations in a concentration of not less than 0.02 mol/l, thereby minimizing degradation of the plate and contamination of the printing forms and the development apparatus.
    Type: Grant
    Filed: September 28, 1992
    Date of Patent: May 24, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Andreas Elsaesser, Michael Brenk
  • Patent number: 5292626
    Abstract: The present invention relates to a developer composition for radiation-sensitive positive-working and negative-working and reversible reprographic layers which apart from a radiation-sensitive compound or radiation-sensitive combination of compounds contain, as an essential constituent, a binder which is insoluble in water but soluble in aqueous-alkaline solutions, said developer composition being characterized in that it contains, as essential constituents,(a) O- carboxymethyl- or O,O'-biscarboxymethylethylene glycol or an appropriately substituted polyethylene glycol comprising 2 to about 500 ethylene glycol units,(b) at least one compound showing an alkaline reaction in water, selected from the group including alkali metal hydroxides, alkali metal silicates, alkali metal phosphates, alkali metal borates, ammonium hydroxides, ammonium silicates, ammonium phosphates and ammonium borates, and(c) water.
    Type: Grant
    Filed: August 27, 1991
    Date of Patent: March 8, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Gerhard Buhr, Andreas Elsaesser, Hans W. Frass, Ernst I. Leupold
  • Patent number: 5275908
    Abstract: A positive-working radiation-sensitive mixture and recording material are disclosed. The mixture contains, as essential constituents, a 1,2-quinone diazide and/or a combination of a compound which forms strong acid on exposure to actinic radiation and a compound containing at least one cleavable C--O--C bond and a polymeric binder containing repeating units of formula I ##STR1## in which R.sub.1 is a hydrogen or halogen atom, or a cyanide or an alkyl group, R.sub.2, R.sub.3 are identical or different and are hydrogen, or alkyl or aryl groups, R.sub.4, R.sub.5 are identical or different and are and R.sub.6 hydrogen or halogen atoms, or alkyl, alkoxy or aryl groups, X represents the atoms necessary to complete a monocyclic or polycyclic carbocyclic aromatic ring system, and is 1, 2 or 3. The mixture yields lithographic plates having high print runs which can be thermally post-cured and which have good resistance to chemicals. The mixture also produces photoresists having good heat resistance.
    Type: Grant
    Filed: January 28, 1991
    Date of Patent: January 4, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Andreas Elsaesser, Dieter Mohr
  • Patent number: 5227281
    Abstract: A process for producing negative copies is disclosed in which a light-sensitive or radiation-sensitive recording material comprising a layer support and a normally positive-working light-sensitive or radiation-sensitive layer applied thereto is irradiated imagewise, thermally treated, irradiated overall and then developed with an alkaline developer. Thermal treatment is carried out with water or with an aqueous solution, at temperatures in the range from about 50.degree. to 100.degree. C., preferably from 60.degree. to 90.degree. C., within a period of time varying between about 1 second and 5 minutes, preferably between 5 seconds and 1 minute, overall irradiation is performed on the optionally still hot recording material and development is thereafter carried out within a period of time varying between about 10 seconds and 2 minutes, preferably between 15 seconds and 1 minute.
    Type: Grant
    Filed: December 11, 1990
    Date of Patent: July 13, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Otfried Gaschler, Andreas Elsaesser, Dieter Mohr, Hans W. Frass
  • Patent number: 5068163
    Abstract: The invention relates to a positive-working radiation-sensitive mixture and a copying material produced therefrom on a layer support. The mixture contains as essential constituents a 1,2-quinone diazide or a combination of:1) a compound forming strong acid when exposed to actinic radiation and2) a compound containing at least one acid-cleavable C--O--C bond,and a binder with repeating units of the general formula I ##STR1## wherein R.sub.1 denotes a hydrogen or halogen atom, or a cyanide or an alkyl group,R.sub.2, R.sub.3, R.sub.4 are identical or different and denote hydrogen, or alkyl or aryl groups,R.sub.5, R.sub.6 and optionally R.sub.7 are identical or different and denote hydrogen or halogen atoms, or alkyl, aryl or alkoxy groups, andX denotes the atoms necessary to complete a mononuclear or polynuclear carbocyclic aromatic ring system, andn is 1, 2 or 3.
    Type: Grant
    Filed: June 7, 1989
    Date of Patent: November 26, 1991
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Andreas Elsaesser, Werner Frass, Dieter Mohr
  • Patent number: 4946760
    Abstract: A radiation-sensitive mixture, in particular photosensitive mixture, is disclosed that contains a compound which forms a strong acid on exposure to actinic radiation and a polymeric reaction product of (i) a polymeric organic compound containing free OH groups, (ii) an organic compound containing at least two isocyanate groups or at least two epoxy groups, and (iii) a compound containing repeating acid-cleavable acetal or ketal groups and at least one free OH group. The mixture yields printing plates or photoresists with a longer storage life.
    Type: Grant
    Filed: November 1, 1988
    Date of Patent: August 7, 1990
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Andreas Elsaesser
  • Patent number: 4840867
    Abstract: A radiation-sensitive recording material comprising a support and first and second radiation-sensitive layers is disclosed. The first radiation-sensitive layer comprises a 1,2-quinone diazide as the radiation-sensitive compound and the second radiation-sensitive layer comprises (a) a compound which forms a strong acid under the action of actinic radiation, (b) a compound which has at least one acid-cleavable C-O-C bond and (c) a polymeric binder. The recording material has an improved storage stability as compared with materials which comprise only radiation-sensitive layers based on acid-cleavable compounds.
    Type: Grant
    Filed: June 17, 1987
    Date of Patent: June 20, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Andreas Elsaesser, Klaus Rode