Abstract: A pulse modification apparatus for dispersive stretching or compression of laser pulses includes at least one dispersive optical element for angle separation and combination of spectral components of laser pulses, an actuator for setting a dispersion of the pulse modification device by influencing the spectral components of the laser pulses, at least one passive sensor having an output variable dependent on at least one ambient parameter, and a passive converter for converting a change of the output variable of the at least one passive sensor into a manipulated variable change of the actuator in order to compensate for an alteration of the dispersion of the pulse modification apparatus resulted from an alteration of the at least one ambient parameter.

Abstract: A beam shutter is for a laser beam. The beam shutter includes: a reflecting optical unit configured to deflect the laser beam; a holding arm, which is capable of being brought into a release position and a shut-off position and on which the reflecting optical unit is held; a sensor circuit with at least one sensor component arranged between the reflecting optical unit and the holding arm; and an evaluation device, which is configured to interact with the sensor circuit, at least in the shut-off position of the holding arm.

Abstract: A beam shutter is for a laser beam. The beam shutter includes: a reflecting optical unit configured to deflect the laser beam; a holding arm, which is capable of being brought into a release position and a shut-off position and on which the reflecting optical unit is held; a sensor circuit with at least one sensor component arranged between the reflecting optical unit and the holding arm; and an evaluation device, which is configured to interact with the sensor circuit, at least in the shut-off position of the holding arm.

Abstract: Fiber mounting units for supporting an optical fiber for fiber laser systems are disclosed and include a base body having a fiber end attachment section, a fiber guide section, and a connection section arranged between the fiber end attachment section and the fiber guide section. The fiber end attachment section is adapted to attach a receiving element, which holds a fiber end portion of the optical fiber, the fiber guide section is adapted to guide a fiber central portion of the optical fiber, and the connection section is configured as a flexure bearing between the fiber end attachment section and the fiber guide section.

Abstract: Fiber mounting units for supporting an optical fiber for fiber laser systems are disclosed and include a base body having a fiber end attachment section, a fiber guide section, and a connection section arranged between the fiber end attachment section and the fiber guide section.

Abstract: Methods, devices, and systems for protecting a vacuum environment from leakage are provided. The devices include an optical component for gas-tight closure of the vacuum environment, a retention device configured to retain the optical component and including a cooling region separated from the vacuum environment in a gas-tight manner and configured to receive a cooling medium to cool the optical component, a first part-region of the optical component being arranged in the cooling region, and a reduced-pressure region configured to have a reduced pressure and separated in a gas-tight manner from the vacuum environment and from the cooling region, a second part-region of the optical component being arranged in the reduced-pressure region, and a detector configured to detect a leakage in the optical component when the cooling medium flows from the cooling region into at least one of the reduced-pressure region or the vacuum environment.

Abstract: A beam guiding apparatus includes a vacuum chamber that includes a target region arranged to receive a target material for generating EUV radiation. The vacuum chamber includes a first and second opening for receiving into the vacuum chamber a first and second laser beam, respectively. The first and second laser beam have different wavelengths. The beam guiding apparatus further includes a superposition apparatus arranged to superpose the first and second laser beams entering into the vacuum chamber through the first and second openings, respectively, for common beam guidance in the direction of the target region. The superposition apparatus comprises a first optical element configured to seal the first opening of the vacuum chamber in a gas-tight manner and transmit the first laser beam, or a second optical element configured to seal off the second opening of the vacuum chamber in a gas-tight manner and transmit the second laser beam.

Abstract: This disclosure relates to a device for monitoring the alignment of a laser beam, comprising: a detector having an opening for passage of the laser beam, at least two temperature sensors which are mounted on the detector, and a temperature monitoring device which is connected to the at least two temperature sensors, for monitoring the alignment of the laser beam relative to the opening. The at least two temperature sensors have a temperature-dependent resistance which either increases as the temperature increases or decreases as the temperature increases, and the at least two temperature sensors are connected in series with the temperature monitoring device. This disclosure relates also to an EUV radiation generating apparatus which has at least one device as described above for monitoring the alignment of a laser beam.

Abstract: Methods, devices, and systems for protecting a vacuum environment from leakage are provided. The devices include an optical component for gas-tight closure of the vacuum environment, a retention device configured to retain the optical component and including a cooling region separated from the vacuum environment in a gas-tight manner and configured to receive a cooling medium to cool the optical component, a first part-region of the optical component being arranged in the cooling region, and a reduced-pressure region configured to have a reduced pressure and separated in a gas-tight manner from the vacuum environment and from the cooling region, a second part-region of the optical component being arranged in the reduced-pressure region, and a detector configured to detect a leakage in the optical component when the cooling medium flows from the cooling region into at least one of the reduced-pressure region or the vacuum environment.

Abstract: A beam guiding apparatus includes a vacuum chamber that includes a target region arranged to receive a target material for generating EUV radiation. The vacuum chamber includes a first and second opening for receiving into the vacuum chamber a first and second laser beam, respectively. The first and second laser beam have different wavelengths. The beam guiding apparatus further includes a superposition apparatus arranged to superpose the first and second laser beams entering into the vacuum chamber through the first and second openings, respectively, for common beam guidance in the direction of the target region. The superposition apparatus comprises a first optical element configured to seal the first opening of the vacuum chamber in a gas-tight manner and transmit the first laser beam, or a second optical element configured to seal off the second opening of the vacuum chamber in a gas-tight manner and transmit the second laser beam.

Abstract: The invention relates to extreme ultraviolet “EUV” radiation generating systems that include a vacuum chamber where a target material can be positioned at a target position for generation of EUV radiation, and a beam guiding chamber for guiding a laser beam from a driver laser device towards the target position. The EUV radiation generating apparatus includes an intermediate chamber which is arranged between the vacuum chamber and the beam guiding chamber, a first window which seals the intermediate chamber in a gas-tight manner for entry of the laser beam from the beam guiding chamber and a second window which seals the intermediate chamber in a gas-tight manner for exit of the laser beam into the vacuum chamber. The invention also relates to a method for operating the EUV radiation generating apparatus.

Abstract: An adaptive lens system for laser materials processing, for example, in the high-power range of at least approximately 1 kW, includes two deformable lens surfaces spaced apart from each other in the direction of the optical axis, a chamber formed between the two lens surfaces and filled with a fluid, and a device for changing the distance between the two lens surfaces along the optical axis.

Abstract: An adaptive lens system for laser materials processing, for example, in the high-power range of at least approximately 1 kW, includes two deformable lens surfaces spaced apart from each other in the direction of the optical axis, a chamber formed between the two lens surfaces and filled with a fluid, and a device for changing the distance between the two lens surfaces along the optical axis.