Patents by Inventor Andreas Frangen

Andreas Frangen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for dynamically monitoring a reticle
    Patent number: 7304721
    Abstract: The method of dynamically monitoring a reticle includes preventively macro monitoring and defect inspecting with regard to mechanical loading, including particle deposits or electrostatically induced damage, and energy load, including the associated changes to the reticle material and surface characteristics. Different surface distributions of the absorber layer as well as characteristics of the exposure system, such as N2 purging of the projection lens/reticle area in order to reduce contamination and recrystallization on optically active surfaces are considered.
    Type: Grant
    Filed: November 10, 2004
    Date of Patent: December 4, 2007
    Assignee: Infineon Technologies AG
    Inventors: Henning Haffner, Karin Eggers, Norbert Haase, Andreas Frangen, Carmen Jaehnert
  • Device for the storage and use of at least one photomask for lithographic projection and method for using the device in an exposure installation
    Publication number: 20070187272
    Abstract: The invention relates to a device for the storage of at least one photomask for lithographic projection and a method for using the device in an exposure installation. A container is suitable for receiving a photomask. The container has a housing, a closable opening device situated at the container housing and serving for the entry and issuing of the photomask, and one gas inlet opening arranged to purge the photomask. The invention also relates to a method for using the device in an exposure installation.
    Type: Application
    Filed: December 22, 2006
    Publication date: August 16, 2007
    Inventors: Anja Bonness, Marcel Choudhury, Karin Eggers, Andreas Frangen, Norbert Kallis, Wolfgang Keller, Christoph Hocke, Michael Lering, Michael Roesner, Ruediger Hunger, Christoph Noelscher, Gregor Kubart
  • Method for dynamically monitoring a reticle
    Publication number: 20050125164
    Abstract: The method of dynamically monitoring a reticle includes preventively macro monitoring and defect inspecting with regard to mechanical loading, including particle deposits or electrostatically induced damage, and energy load, including the associated changes to the reticle material and surface characteristics. Different surface distributions of the absorber layer as well as characteristics of the exposure system, such as N2 purging of the projection lens/reticle area in order to reduce contamination and recrystallization on optically active surfaces are considered.
    Type: Application
    Filed: November 10, 2004
    Publication date: June 9, 2005
    Inventors: Henning Haffner, Karin Eggers, Norbert Haase, Andreas Frangen, Carmen Jaehnert