Patents by Inventor Andreas Frommeyer
Andreas Frommeyer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9581813Abstract: The invention relates to a method for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.Type: GrantFiled: June 1, 2015Date of Patent: February 28, 2017Assignee: Carl Zeiss SMT GmbHInventors: Olaf Conradi, Heiko Feldmann, Gerald Richter, Sascha Bleidistel, Andreas Frommeyer, Toralf Gruner, Wolfgang Hummel
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Patent number: 9513452Abstract: A damping device of an optical element of a projection exposure machine includes at least two mass dampers arranged spaced apart from one another, the vibration absorbers each having at least one damper mass and at least one damping element and the damper masses of the at least two mass dampers being interconnected by at least one connecting element. The optical element can be part of a projection exposure machine.Type: GrantFiled: July 18, 2011Date of Patent: December 6, 2016Assignee: Carl Zeiss SMT GmbHInventors: Alexander Vogler, Klaus Rief, Andreas Frommeyer, Alan L. Brydon
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Publication number: 20150293352Abstract: The invention relates to a method for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.Type: ApplicationFiled: June 1, 2015Publication date: October 15, 2015Inventors: Olaf Conradi, Heiko Feldmann, Gerald Richter, Sascha Bleidistel, Andreas Frommeyer, Toralf Gruner, Wolfgang Hummel
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Patent number: 9069263Abstract: The invention relates to a method for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.Type: GrantFiled: July 14, 2010Date of Patent: June 30, 2015Assignee: Carl Zeiss SMT GmbHInventors: Olaf Conradi, Heiko Feldmann, Gerald Richter, Sascha Bleidistel, Andreas Frommeyer, Toralf Gruner, Wolfgang Hummel
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Publication number: 20120138401Abstract: A hexapod system for aligning an optical element in semiconductor clean rooms or in a vacuum, particularly in an illumination device for a microlithographic EUV projection exposure apparatus, comprises six hexapod supporting structures (42, 44, 46, 94; 42?, 44?, 46?, 94?, 106). Using a set of at least two replaceable spacer elements (94; 94?) having a different extent in at least one direction, at least one of the six supporting structures (42, 44, 46, 94; 42?, 44?, 46?, 94?, 106) can be adjusted. The latter is adapted so that a spacer element (94; 94?) can be removed or a spacer element (94; 94?) can be added while the coupling of the first coupling end (46; 46?) to the carrying structure (38; 38?) and the coupling of the second coupling end (54a; 54?) to the optical element (34; 34?) are maintained.Type: ApplicationFiled: July 18, 2011Publication date: June 7, 2012Applicant: CARL ZEISS SMT GMBHInventors: Alexander Vogler, Klaus Rief, Andreas Frommeyer, Alan L. Brydon
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Publication number: 20100290024Abstract: The invention relates to a method-for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.Type: ApplicationFiled: July 14, 2010Publication date: November 18, 2010Applicant: CARL ZEISS SMT AGInventors: Olaf Conradi, Heiko Feldmann, Gerald Richter, Sascha Bleidistel, Andreas Frommeyer, Toralf Gruner, Wolfgang Hummel
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Patent number: 7777963Abstract: The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50), wherein the projection objective has a plurality of lenses (L1, L2, L3, L4, L5, L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.Type: GrantFiled: May 24, 2006Date of Patent: August 17, 2010Assignee: Carl Zeiss SMT AGInventors: Olaf Conradi, Heiko Feldmann, Gerald Richter, Sascha Bleidistel, Andreas Frommeyer, Toralf Gruner, Wolfgang Hummel
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Patent number: 7760327Abstract: There is provided an optical element comprising an optical element body, a reflecting area and an optical passageway. The optical element body defines an axis of rotational symmetry. The reflecting area is disposed on the optical element body and adapted to be optically used in an exposure process. The optical passageway is arranged within the optical element body and allows light to pass the optical element body, the optical passageway being arranged eccentrically with respect to the axis of rotational symmetry.Type: GrantFiled: March 31, 2006Date of Patent: July 20, 2010Assignee: Carl Zeiss SMT AGInventors: Hans-Jürgen Scherle, Yim-Bun Patrick Kwan, Stefan Xalter, Johannes Lippert, Ulrich Weber, Bernhard Geuppert, Bernhard Gellrich, Jens Kugler, Franz Sorg, Willi Heintel, Harald Kirchner, Wolfgang Keller, Andreas Frommeyer, Fraser G. Morrison
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Publication number: 20100128367Abstract: A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided.Type: ApplicationFiled: March 13, 2009Publication date: May 27, 2010Applicant: CARL ZEISS SMT AGInventors: Mariella Beckenbach, Klaus Rief, Andreas Bertele, Benjamin Sigel, Sascha Bleidistel, Wolfgang Hummel, Andreas Frommeyer, Toralf Gruner, Jochen Schwaer, Baerbel Schwaer, Thomas Schletterer, Artur Hoegele, Armin Schoeppach
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Patent number: 7540983Abstract: In the case of a method of producing aspherical optical surfaces of optical elements (1), in particular for use in microlithography for producing semiconductor elements, the optical element (1) is ground for example in the form of a meniscus. In a first method step, the optical element (1) is introduced into a basic form (2), which has a spherical form bed and is being held at a distance over the form bed (3). After that, an intermediate medium (6) is introduced in the basic form (2) between the optical element (1) and the form bed (3) and, subsequently the optical element (1) being removed together with the intermediate medium (6) from the basic form. Then, the spherical form bed (3) of the basic form (2) or a second basic form is transformed into an aspherical form bed (3?) computationally determined in advance.Type: GrantFiled: July 8, 2004Date of Patent: June 2, 2009Assignee: Carl Zeiss SMT AGInventors: Ernst-Dieter Knohl, Andreas Frommeyer, Hermann Schubert
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Publication number: 20080310029Abstract: The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50), wherein the projection objective has a plurality of lenses (L1, L2, L3, L4, L5, L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.Type: ApplicationFiled: May 24, 2006Publication date: December 18, 2008Applicant: CARL ZEISS SMT AGInventors: Olaf Conradi, Heiko Feldmann, Gerald Richter, Sascha Bleidistel, Andreas Frommeyer, Toralf Gruner, Wolfgang Hummel
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Patent number: 7448763Abstract: An optical subassembly with an optical element, for example a mirror element (7), has an optical surface (9) and bearing points (12) arranged on the circumference. The optical element (7) is connected to a mount (13) at the bearing points (12) via connecting elements (14, 15, 16, 17, 18). Stress-decoupling cutouts, for example curved slots (11), are provided between the optical surface (9) and the bearing points (12).Type: GrantFiled: December 3, 2003Date of Patent: November 11, 2008Assignee: Carl Zeiss SMT AGInventors: Andreas Frommeyer, G Fraser Morrison, Wolfgang Keller, Yim-Bun Patrick Kwan, Harald Kirchner, Willi Heintel
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Publication number: 20070014037Abstract: An optical subassembly with an optical element, for example a mirror element (7), has an optical surface (9) and bearing points (12) arranged on the circumference. The optical element (7) is connected to a mount (13) at the bearing points (12) via connecting elements (14, 15, 16, 17, 18). Stress-decoupling cutouts, for example curved slots (11), are provided between the optical surface (9) and the bearing points (12).Type: ApplicationFiled: December 3, 2003Publication date: January 18, 2007Inventors: Andreas Frommeyer, G. Morrison, Wolfgang Keller, Yim-Bun Kwan, Harald Kirchner, Willi Heintel
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Publication number: 20060262704Abstract: There is provided an optical element comprising an optical element body, a reflecting area and an optical passageway. The optical element body defines an axis of rotational symmetry. The reflecting area is disposed on the optical element body and adapted to be optically used in an exposure process. The optical passageway is arranged within the optical element body and allows light to pass the optical element body, the optical passageway being arranged eccentrically with respect to the axis of rotational symmetry.Type: ApplicationFiled: March 31, 2006Publication date: November 23, 2006Inventors: Hans-Jurgen Scherle, Yim-Bun Kwan, Stefan Xalter, Johannes Lippert, Ulrich Weber, Bernhard Geuppert, Bernhard Gellrich, Jens Kugler, Franz Sorg, Willi Heintel, Harald Kirchner, Wolfgang Keller, Andreas Frommeyer, Fraser Morrison
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Publication number: 20050018311Abstract: In the case of a method of producing aspherical optical surfaces of optical elements (1), in particular for use in microlithography for producing semiconductor elements, the optical element (1) is ground for example in the form of a meniscus. In a first method step, the optical element (1) is introduced into a basic form (2), which has a spherical form bed and is being held at a distance over the form bed (3). After that, an intermediate medium (6) is introduced in the basic form (2) between the optical element (1) and the form bed (3) and, subsequently the optical element (1) being removed together with the intermediate medium (6) from the basic form. Then, the spherical form bed (3) of the basic form (2) or a second basic form is transformed into an aspherical form bed (3?) computationally determined in advance.Type: ApplicationFiled: July 8, 2004Publication date: January 27, 2005Inventors: Ernst-Dieter Knohl, Andreas Frommeyer, Hermann Schubert