Abstract: An apparatus for the plasma coating of a substrate, in particular a press platen, is provided and is used to perform a method to plasma coat the press platen. The apparatus includes a vacuum chamber and, arranged therein, an electrode, which is segmented. Each of the electrode segments has a dedicated connection for an electrical source. Also provided is the method for operating the apparatus. According to the method, a substrate to be coated is positioned opposite the electrode and at least one energy source that is assigned to an electrode segment is activated. Moreover, a gas is introduced, with the effect of bringing about plasma-enhanced chemical vapor deposition on the substrate.

Abstract: An apparatus (100 . . . 103) for the plasma coating of a substrate (2), in particular a press platen, is provided, comprising a vacuum chamber (3) and, arranged therein, an electrode (400 . . . 409), which is segmented, wherein each of the electrode segments (500 . . . 512) has a dedicated connection (6) for an electrical source (700 . . . 702). Also provided is a method for operating said apparatus (100 . . . 103), in which a substrate (2) to be coated is positioned opposite said electrode (400 . . . 409) and at least one energy source (700 . . . 706) that is assigned to an electrode segment (500 . . . 512) is activated. Moreover, a gas is introduced, with the effect of bringing about plasma-enhanced chemical vapor deposition on the substrate (2).