Abstract: An MMS includes a substrate, an element movable with respect to the substrate and a frame structure. A first pair of springs is arranged between the substrate and the frame structure along a first spring direction. A second pair of springs is arranged between the movable element and the frame structure along a second spring direction. The frame structure is configured to generate tensile stress in the second pair of springs at tensile stress acting in the first pair of springs.

Abstract: An MMS includes a substrate, an element movable with respect to the substrate and a frame structure. A first pair of springs is arranged between the substrate and the frame structure along a first spring direction. A second pair of springs is arranged between the movable element and the frame structure along a second spring direction. The frame structure is configured to generate tensile stress in the second pair of springs at tensile stress acting in the first pair of springs.

Abstract: The invention relates to a method and a device for locally defined machining on surfaces of workpieces. A laser beam (1) emitted by a laser radiation source (2) is aimed onto the reflecting surfaces of a plurality of adjacently arranged micromirrors that may be controlled individually with an electronic control and that are pivotable about at least one axis. Sub-beams (4) reflected by the reflecting surfaces of the micromirrors pivoted in a defined manner are incident and focused on the surface of a workpiece, which surface is arranged in the focal plane (6) of the focusing optics unit (5), at different adjustable positions, so that simultaneously a locally defined change in the workpiece material and/or a locally defined material removal with prespecifiable geometry is attained in a region of the workpiece near its surface.

Abstract: An illumination device used for the direct illumination of light-sensitive ayers comprises a light source and a pattern generator.The pattern generator includes an optical Schlieren system and an active, matrix-addressable surface light generator. The Schlieren system comprises a Schlieren lens and a projection lens as well as a mirror device, which is arranged between these lenses and which directs light coming from the light source onto the surface of the surface light modulator. A filter device is used for filtering out diffracted light and for permitting undiffracted light to pass from the surface light modulator to the projection lens. The structure to be illuminated is secured in position on a displaceable positioning table. The surface light modulator is addressed such that the non-addressed surface areas thereof correspond to the projection areas of said structure which are to be illuminated.

Abstract: An illumination device for producing models used for manufacturing electronic elements, or for direct illumination of wafers or substrates during the photolithographic steps required for their production, or for direct illumination of structures including light-sensitive layers, comprises a pulsed laser light source and a pattern generator.The pattern generator includes an optical Schlieren system and an active, matrix-addressable surface light modulator. The Schlieren system comprises a Schlieren lens arranged on a side of the surface light modulator, a projection lens facing away from the surface light modulator, and a mirror device which is arranged between the lenses for directing light coming from the light source onto the reflective surface on the surface light modulator. The Schlieren lens is arranged from the surface light modulator at a short distance relative to the focal length of the lens.

Abstract: The illumination device (1) proposed is designed to produce models (6), or for the direct illumination of electronic elements, and includes a light source (2) and a pattern generator (3).In order to shorten the necessary writing time or exposure time with a simplified illumination-device structure, the pattern generator (3) includes an optical schlieren system (15, 17) and an active, matrix-addressable surface light generator (13) which has a viscoelastic control layer with a reflective surface (19). Disposed between the schlieren lens (15) and the projection lens (16) in the schlieren system (14) is a mirror device (17) which preferably has two functions, not only deflecting the light from the light source (2) to the surface light modulator (13) but also filtering out undiffracted reflected light. The schlieren lens is located at a distance from the surface light modulator (13) which is short relative to the focal length of the lens.