Patents by Inventor Andreas Goehring

Andreas Goehring has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive photoresist containing dyes
    Patent number: 5225312
    Abstract: A positive photoresist of the type containing an alkali-soluble novolac resin and a quinone diazide sensitizer contains a dye of the general formula: ##STR1## wherein R' is lower alkyl, R" is H, alkyl or CO.sub.2 -alkyl, alkyl-CO.sub.2 -alkyl or alkyl-CO.sub.2 -(C.sub.1 -C.sub.3 alkyl-O).sub.n -alkyl (n=1-3) and wherein said dye is compatible with the novolac resin/quinone diazide formulation to at least 0.1 phr. The dye reduces reflective notching. Preferably the photoresist also contain a nitro naphthol dye to reduce the effects of I-Line radiation.
    Type: Grant
    Filed: August 2, 1991
    Date of Patent: July 6, 1993
    Assignee: Morton International, Inc.
    Inventors: Sunit S. Dixit, Richard M. Lazarus, Thomas P. Carter, Joseph E. Oberlander, Andreas Goehring, Randall W. Kautz, Grieg Beltramo