Abstract: The present disclosure relates to an optical device, in particular for microlithography, having an optical module, a supporting structure and a force-generating device. The force-generating device is connected to the optical module and the supporting structure and is designed to exert a clamping force on the optical module. The force-generating device has a fluidic force-generating element having a working chamber to which a working fluid having a working pressure can be applied. The force-generating element takes the form of a muscle element which exerts a first tensile force at a first working pressure and a second tensile force which is increased with respect to the first tensile force at a second working pressure which is increased with respect to the first working pressure.

Abstract: A faceted mirror apparatus includes a support plate having a plurality of stepped reception bores into which are fitted the base portions of respective ones of a plurality of mirror facets having mirrored surfaces. An outer surface of each of the facets bears on an inner wall to provide a stable alignment of the optical axes of the mirrored surfaces such that the apparatus generates a beam of rays from impinging rays.

Abstract: A faceted mirror apparatus includes a support plate having a plurality of stepped reception bores into which are fitted the base portions of respective ones of a plurality of mirror facets having mirrored surfaces. An outer surface of each of the facets bears on an inner wall to provide a stable alignment of the optical axes of the mirrored surfaces such that the apparatus generates a beam of rays from impinging rays.

Abstract: A facet mirror (10) is provided with a number of mirror facets (11), in which the mirror facets (11) respectively have a spherical or conical facet body (17) with a reflecting surface (12). The side of the facet body (17) averted from the reflecting surface (12) is mounted in a bearing device (15).

Abstract: In a method for the production of a facetted mirror 24 having a plurality of mirror facets 12 and 12?, which have mirror surfaces 15 and are fitted into reception bores 22, 22? of a support plate 16, the mirror facets 12, 12? are made in a first method step. At least one of the mirror facets is fitted into the associated reception bore of the support plate in a second method step, after which the ACTUAL position of the optical axis of at least one mirror surface of an associated mirror facet 12, 12? fitted into the support plate is respectively determined in a third step and compared with a SET position of a predetermined optical axis. Knowing the measured values determined for the at least one mirror facet 12, 12? in the third method step, reprocessing of the mirror facet and/or of the reception bore is subsequently carried out in a further method step if there is an angular deviation between the ACTUAL position and the SET position.

Abstract: In a method for the production of a facetted mirror 24 having a plurality of mirror facets 12 and 12?, which have mirror surfaces 15 and are fitted into reception bores 22, 22? of a support plate 16, the mirror facets 12, 12? are made in a first method step. At least one of the mirror facets is fitted into the associated reception bore of the support plate in a second method step, after which the ACTUAL position of the optical axis of at least one mirror surface of an associated mirror facet 12, 12? fitted into the support plate is respectively determined in a third step and compared with a SET position of a predetermined optical axis. Knowing the measured values determined for the at least one mirror facet 12, 12? in the third method step, reprocessing of the mirror facet and/or of the reception bore is subsequently carried out in a further method step if there is an angular deviation between the ACTUAL position and the SET position.

Abstract: In a method for producing mirror facets (1) for facet mirrors in illuminating devices or projection exposure machines in microlithography by using radiation in the extreme ultraviolet range, individual tilting angles are recessed into an optical surface (2) of the mirror facet (1), preferably a surface with tilting angles relative to a reference surface of the mirror facet (1) is machined into or on said optical surface.

Abstract: In a facet mirror with a number of mirror facets, wherein the mirror facets are provided with reflecting surfaces, the mirror facets are mounted jointly in a basic body via bearing devices. The mirror facets comprise mirror bodies contacting at the periphery with the bearing devices via a surface, line or point contact. The preferred field of use of the facet mirrors is a projection objective of a projection exposure machine in microlithography for fabricating semiconductor elements.

Abstract: In a method for the production of a facetted mirror 24 having a plurality of mirror facets 12 and 12?, which have mirror surfaces 15 and are fitted into reception bores 22, 22? of a support plate 16, the mirror facets 12, 12? are made in a first method step. At least one of the mirror facets is fitted into the associated reception bore of the support plate in a second method step, after which the ACTUAL position of the optical axis of at least one mirror surface of an associated mirror facet 12, 12? fitted into the support plate is respectively determined in a third step and compared with a SET position of a predetermined optical axis. Knowing the measured values determined for the at least one mirror facet 12, 12? in the third method step, reprocessing of the mirror facet and/or of the reception bore is subsequently carried out in a further method step if there is an angular deviation between the ACTUAL position and the SET position.

Abstract: Facet mirror having a number of mirror facets A facet mirror (10) is provided with a number of mirror facets (11), in which the mirror facets (11) respectively have a spherical or conical facet body (17) with a reflecting surface (12). The side of the facet body (17) averted from the reflecting surface (12) is mounted in a bearing device (15).

Abstract: There is provided an illumination system for wavelengths of ≦100 nm, having an object plane and a field plane. The illumination system includes a grating element having a plurality of gratings, and a diaphragm. The diaphragm is arranged after the grating element in a beam path from the object plane to the field plane.

Abstract: There is provided an illumination system for wavelengths of ≦100 nm, having an object plane and a field plane. The illumination system includes a grating element having a plurality of gratings, and a diaphragm. The diaphragm is arranged after the grating element in a beam path from the object plane to the field plane.