Patents by Inventor Andreas Hieke

Andreas Hieke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8471201
    Abstract: Disclosed are methods, apparatus, systems, processes and other inventions relating to: ion sources with controlled electro-pneumatic superposition, ion source synchronized to RF multipole, ion source with charge injection, optimized control in active feedback system, radiation supported charge-injection liquid spray, ion source with controlled liquid injection as well as various embodiments and combinations of each of the foregoing.
    Type: Grant
    Filed: May 30, 2011
    Date of Patent: June 25, 2013
    Inventor: Andreas Hieke
  • Publication number: 20120305795
    Abstract: Disclosed are methods, apparatus, systems, processes and other inventions relating to: ion sources with controlled electro-pneumatic superposition, ion source synchronized to RF multipole, ion source with charge injection, optimized control in active feedback system, radiation supported charge-injection liquid spray, ion source with controlled liquid injection as well as various embodiments and combinations of each of the foregoing.
    Type: Application
    Filed: May 30, 2011
    Publication date: December 6, 2012
    Inventor: Andreas Hieke
  • Publication number: 20120241642
    Abstract: An innovative ion source is disclosed that in some embodiments provides an injected independent ion beam to increase the ionization efficiency of the ion source.
    Type: Application
    Filed: May 30, 2011
    Publication date: September 27, 2012
    Inventor: Andreas Hieke
  • Publication number: 20120236994
    Abstract: A method of determining the deviation of measured pattern vs. computed pattern is disclosed. Other methods are also disclosed herein.
    Type: Application
    Filed: June 27, 2011
    Publication date: September 20, 2012
    Inventor: Andreas Hieke
  • Patent number: 8003934
    Abstract: Disclosed are methods, apparatus, systems, processes and other inventions relating to: ion sources with controlled electro-pneumatic superposition, ion source synchronized to RF multipole, ion source with charge injection, optimized control in active feedback system, radiation supported charge-injection liquid spray, ion source with controlled liquid injection as well as various embodiments and combinations of each of the foregoing.
    Type: Grant
    Filed: September 8, 2006
    Date of Patent: August 23, 2011
    Inventor: Andreas Hieke
  • Patent number: 7994474
    Abstract: An innovative ion source is disclosed that in some embodiments provides an injected independent ion beam to increase the ionization efficiency of the ion source.
    Type: Grant
    Filed: May 4, 2007
    Date of Patent: August 9, 2011
    Assignee: Andreas Hieke
    Inventor: Andreas Hieke
  • Publication number: 20080121798
    Abstract: An innovative ion source is disclosed that in some embodiments provides an injected independent ion beam to increase the ionization efficiency of the ion source.
    Type: Application
    Filed: May 4, 2007
    Publication date: May 29, 2008
    Inventor: Andreas Hieke
  • Publication number: 20080078944
    Abstract: This invention relates to systems and methods of optimizing the control and performance of Laser Desorption and Ionization (LDI) ion sources or Electro Spray (ES) ion sources employing electro-pneumatic superposition, the ion sources being operably connected to a mass spectrometer. Methods and systems of control include analyzing data from the mass spectrometer during its operation, generating signals from the data analysis, and providing the signals as feedback to control the operation of the ion source. Data from which informative feedback signals are generated may include the mass spectrum data from a sample being analyzed, and may also include data from sensors providing conditions of the ion source during operation.
    Type: Application
    Filed: September 7, 2007
    Publication date: April 3, 2008
    Inventor: Andreas Hieke
  • Publication number: 20070075240
    Abstract: Disclosed are methods, apparatus, systems, processes and other inventions relating to: ion sources with controlled electro-pneumatic superposition, ion source synchronized to RF multipole, ion source with charge injection, optimized control in active feedback system, radiation supported charge-injection liquid spray, ion source with controlled liquid injection as well as various embodiments and combinations of each of the foregoing.
    Type: Application
    Filed: September 8, 2006
    Publication date: April 5, 2007
    Applicant: GEMIO TECHNOLOGIES, INC.
    Inventor: Andreas Hieke
  • Patent number: 7138642
    Abstract: Ion source devices with controlled superposition of electrostatic and gas flow fields to effect rapid collisional cooling with improved ion collection and collimation, analytical apparatus comprising such ion source devices, and methods for use are presented.
    Type: Grant
    Filed: February 22, 2005
    Date of Patent: November 21, 2006
    Assignee: Gemio Technologies, Inc.
    Inventor: Andreas Hieke
  • Publication number: 20050194543
    Abstract: The invention provides apparatus and methods for controlling ion current in an ion transmission device. An apparatus of the present invention comprises an ion source, an ion transmission device, and a controller. The ion source and the ion transmission device are in ion communication therebetween, and the controller is in signal communication with both the ion source and the ion transmission device. The ion current of the ion transmission device may be controlled by coordinating at least one of the operating parameter values of the ion source with at least one of the operating parameter values of the ion transmission device. Such coordination may result in, for example, improved ion current in the ion transmission device. Also embraced by the present invention are mass spectrometer embodiments that include or use the apparatus or methods of the present invention for controlling ion current.
    Type: Application
    Filed: February 22, 2005
    Publication date: September 8, 2005
    Applicant: Ciphergen Biosystems, Inc.
    Inventor: Andreas Hieke
  • Publication number: 20050194542
    Abstract: Ion source devices with controlled superposition of electrostatic and gas flow fields to effect rapid collisional cooling with improved ion collection and collimation, analytical apparatus comprising such ion source devices, and methods for use are presented.
    Type: Application
    Filed: February 22, 2005
    Publication date: September 8, 2005
    Applicant: Ciphergen Biosystems, Inc.
    Inventor: Andreas Hieke
  • Patent number: 6188095
    Abstract: A cell-quadropole cell structure is disclosed which extends the principle of sharing the bitline-stud between two different cells (arranged in a one-dimensional line, e.g. w-direction) further to the maximal possible degree of a sharing in a two-dimensional area (x- and y-direction) consequently forming a cross of four cells around one bitline-stud with each drain region and buried strap extended to the side and the trench attached forming a hook like structure.
    Type: Grant
    Filed: September 30, 1998
    Date of Patent: February 13, 2001
    Assignee: Siemens Aktiengesellschaft
    Inventor: Andreas Hieke