Patents by Inventor Andreas KOENIGER

Andreas KOENIGER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical apparatus, method for setting a target deformation, and lithography system
    Patent number: 12656690
    Abstract: An optical apparatus for a lithography system has at least one optical element comprising an optical surface. The optical apparatus also has one or more actuators for deforming the optical surface. The optical element comprises a strain gauge device for determining the deformation of the optical surface. The gauge device comprises: a) at least one path length device for generating a measurement spectrum of a measurement radiation, wherein the path length device comprises a grating device for the measurement radiation and/or a resonator device for the measurement radiation; and/or b) at least one waveguide, wherein the at least one waveguide and/or the at least one grating device and/or the at least one resonator device are formed by the substrate element.
    Type: Grant
    Filed: November 17, 2023
    Date of Patent: June 16, 2026
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Klaus Gwosch, Pascal Heller, Matthias Manger, Andreas Koeniger
  • OPTICAL APPARATUS, METHOD FOR SETTING A TARGET DEFORMATION, AND LITHOGRAPHY SYSTEM
    Publication number: 20240103381
    Abstract: An optical apparatus for a lithography system has at least one optical element comprising an optical surface. The optical apparatus also has one or more actuators for deforming the optical surface. The optical element comprises a strain gauge device for determining the deformation of the optical surface. The gauge device comprises: a) at least one path length device for generating a measurement spectrum of a measurement radiation, wherein the path length device comprises a grating device for the measurement radiation and/or a resonator device for the measurement radiation; and/or b) at least one waveguide, wherein the at least one waveguide and/or the at least one grating device and/or the at least one resonator device are formed by the substrate element.
    Type: Application
    Filed: November 17, 2023
    Publication date: March 28, 2024
    Inventors: Klaus Gwosch, Pascal Heller, Matthias Manger, Andreas Koeniger
  • OPTICAL DEVICE, METHOD FOR ADJUSTING A SETPOINT DEFORMATION AND LITHOGRAPHY SYSTEM
    Publication number: 20240085783
    Abstract: An optical apparatus for a lithography system comprises at least one optical element comprising an optical surface. The optical apparatus also comprises one or more actuators for deforming the optical surface. A strain gauge device is provided for determining the deformation of the optical surface. The strain gauge device comprises at least one optical fiber that maintains polarization.
    Type: Application
    Filed: November 17, 2023
    Publication date: March 14, 2024
    Inventors: Markus Raab, Stefan Troeger, Sascha Bleidistel, Thilo Pollak, Alexander Vogler, Klaus Gwosch, Andreas Koeniger, Matthias Manger
  • Measuring assembly for the frequency-based determination of the position of a component
    Patent number: 11274914
    Abstract: A measuring assembly for the frequency-based determination of the position of a component, in particular in an optical system for microlithography, includes at least one optical resonator, which has a stationary first resonator mirror, a movable measurement target assigned to the component, and a stationary second resonator mirror. The second resonator mirror is formed by an inverting mirror (130, 330, 430, 530), which reflects back on itself a measurement beam coming from the measurement target.
    Type: Grant
    Filed: November 24, 2020
    Date of Patent: March 15, 2022
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Matthias Manger, Andreas Koeniger, Alexander Vogler
  • MEASURING ASSEMBLY FOR THE FREQUENCY-BASED DETERMINATION OF THE POSITION OF A COMPONENT
    Publication number: 20210080244
    Abstract: A measuring assembly for the frequency-based determination of the position of a component, in particular in an optical system for microlithography, includes at least one optical resonator, which has a stationary first resonator mirror, a movable measurement target assigned to the component, and a stationary second resonator mirror. The second resonator mirror is formed by an inverting mirror (130, 330, 430, 530), which reflects back on itself a measurement beam coming from the measurement target.
    Type: Application
    Filed: November 24, 2020
    Publication date: March 18, 2021
    Inventors: Matthias MANGER, Andreas KOENIGER, Alexander VOGLER