Abstract: A computer implemented method of predicting a phase stability parameter for a polymer material comprising the steps of providing to a computer processor via a communication interface a digital representation of the polymer material; providing to the processor via the communication interface a data driven model parametrized on a digital representation of historical polymer material, and historical phase stability parameters; determining with the computer processor a phase stability parameter for the polymer material based on the provided data driven model, and the digital representation of the polymer material; providing via the communication interface the determined phase stability parameter.

Abstract: The invention relates to a transparent conductive layer comprising non-conductive areas and conductive areas, wherein the conductive areas comprise an interconnected network of electrically conductive nanoobjects and in the non-conductive areas the nanoobjects are converted into particles and wherein the thickness of the conductive areas and the non-conductive areas differs less than 10 nm. The invention further relates to a process for producing a patterned transparent conductive film, the film comprising a substrate and a transparent conductive layer, and to a process for producing the patterned transparent conductive film.

Abstract: The invention relates to a transparent conductive layer comprising non-conductive areas and conductive areas, wherein the conductive areas comprise an FIG. 1 interconnected network of electrically conductive nanoobjects and in the non-conductive areas the nanoobjects are converted into particles and wherein the thickness of the conductive areas and the non-conductive areas differs less than 10 nm. The invention further relates to a process for producing a patterned transparent conductive film, the film comprising a substrate and a transparent conductive layer, and to a process for producing the patterned transparent conductive film.

Abstract: A method for cleaning structured surfaces of semiconductor components to remove photoresist and etching residues after the etching of the surface, comprising: a) treatment of the surface with an acidic aqueous solution comprising one or more acids and one or more oxidizing agents, b) removal of the photoresist and c) washing with demineralized water in the stated sequence.

Abstract: A method for cleaning structured surfaces of semiconductor components to remove photoresist and etching residues after the etching of the surface, comprising: a) removal of the photoresist, b) treatment of the surface with an acidic aqueous solution comprising one or more acids and one or more oxidizing agents, c) treatment of the surface with an alkaline aqueous solution and d) washing of the surface with demineralized water, the steps a), b) and c) being effected before step d).

Abstract: The present invention relates to tetrakisfluoroalkylborate salts, methods of producing same, and their use in electrolytes, batteries, capacitors, supercapacitors, and galvanic cells.

Abstract: The present invention relates to mixtures of fluoroalkylphosphate salts and polymers, methods of producing same, and their use in electrolytes, batteries, capacitors, supercapacitors and galvanic cells.

Abstract: The present invention relates to mixtures of fluoroalkylphosphate salts and polymers, methods of producing same, and their use in electrolytes, batteries, capacitors, supercapacitors and galvanic cells.

Abstract: The invention relates to a process for the preparation of borate salts, and to their use in electrochemical cells.