Patents by Inventor Andreas Meisel
Andreas Meisel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120068118Abstract: Matrixes doped with semiconductor nanocrystals are provided. In certain embodiments, the semiconductor nanocrystals have a size and composition such that they absorb or emit light at particular wavelengths. The nanocrystals can comprise ligands that allow for mixing with various matrix materials, including polymers, such that a minimal portion of light is scattered by the matrixes. The matrixes can also be utilized in refractive index matching applications. In other embodiments, semiconductor nanocrystals are embedded within matrixes to form a nanocrystal density gradient, thereby creating an effective refractive index gradient. The matrixes can also be used as filters and antireflective coatings on optical devices and as down-converting layers. Processes for producing matrixes comprising semiconductor nanocrystals are also provided.Type: ApplicationFiled: October 20, 2011Publication date: March 22, 2012Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: J. Wallace Parce, Paul Bernatis, Robert Dubrow, William P. Freeman, Joel Gamoras, Shihai Kan, Andreas Meisel, Baixin Qian, Jeffery A. Whiteford, Jonathan Ziebarth
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Publication number: 20120009721Abstract: A device for generating electricity from solar radiation is disclosed. The device includes a wafer doped with a first dopant, the wafer including a front-side and a back-side, wherein the front-side is configured to be exposed to the solar radiation. The device also includes a fused Group IV nanoparticle thin film deposited on the front-side, wherein the nanoparticle thin film includes a second dopant, wherein the second dopant is a counter dopant. The device further includes a first electrode deposited on the nanoparticle thin film, and a second electrode deposited on the back-side, wherein when solar radiation is applied to the front-side, an electrical current is produced.Type: ApplicationFiled: September 22, 2011Publication date: January 12, 2012Inventors: Malcolm Abbott, Maxim Kelman, Francesco Lemmi, Andreas Meisel, Dmitry Poplavskyy, Mason Terry, Karel Vanheusden
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Publication number: 20110300114Abstract: In one aspect the present invention is concerned with a method of cell culture, comprising the steps of (i) obtaining a stem or progenitor cell sample, (ii) culturing the stem or progenitor cell sample in media and under closed conditions appropriate to cause proliferation or differentiation of the stem or progenitor cells, wherein the media comprises a vEPO protein variant, (iii) purifying the stem or progenitor cells ex vivo. The invention relates to a method of increasing the number and survival of stem and progenitor cells in vitro and in vivo using a vEPO protein variant. The invention also relates to improved differentiation of stem and progenitor cells in vitro and in vivo using a vEPO protein variant.Type: ApplicationFiled: November 12, 2007Publication date: December 8, 2011Applicant: VOSSIUS & PARTNERInventors: Josef Priller, Christel Bonnas, Andreas Meisel
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Patent number: 8048814Abstract: A method of aligning a set of patterns on a substrate, the substrate including a substrate surface, is disclosed. The method includes depositing a set of silicon nanoparticles on the substrate surface, the set of nanoparticles including a set of ligand molecules including a set of carbon atoms, wherein a first set of regions is formed where the silicon nanoparticles are deposited and the remaining portions of the substrate surface define a second set of regions. The method also includes densifying the set of silicon nanoparticles into a thin film wherein a set of silicon-organic zones are formed on the substrate surface, wherein the first set of regions has a first reflectivity value and the second set of regions has a second reflectivity value. The method further includes illuminating the substrate surface with an illumination source, wherein the ratio of the second reflectivity value to the first reflectivity value is greater than about 1.1.Type: GrantFiled: May 19, 2009Date of Patent: November 1, 2011Assignee: Innovalight, Inc.Inventors: Andreas Meisel, Michael Burrows, Homer Antoniadis
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Patent number: 7910393Abstract: A Group IV based nanoparticle fluid is disclosed. The nanoparticle fluid includes a set of nanoparticles—comprising a set of Group IV atoms, wherein the set of nanoparticles is present in an amount of between about 1 wt % and about 20 wt % of the nanoparticle fluid. The nanoparticle fluid also includes a set of HMW molecules, wherein the set of HMW molecules is present in an amount of between about 0 wt % and about 5 wt % of the nanoparticle fluid. The nanoparticle fluid further includes a set of capping agent molecules, wherein at least some capping agent molecules of the set of capping agent molecules are attached to the set of nanoparticles.Type: GrantFiled: June 29, 2009Date of Patent: March 22, 2011Assignee: Innovalight, Inc.Inventors: Hyungrak Kim, Malcolm Abbott, Andreas Meisel, Elizabeth Tai, Augustus Jones, Dmitry Poplavskyy, Karel Vanheusden
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Publication number: 20110012066Abstract: A Group IV based nanoparticle fluid is disclosed. The nanoparticle fluid includes a set of nanoparticles-comprising a set of Group IV atoms, wherein the set of nanoparticles is present in an amount of between about 1 wt % and about 20 wt % of the nanoparticle fluid. The nanoparticle fluid also includes a set of HMW molecules, wherein the set of HMW molecules is present in an amount of between about 0 wt % and about 5 wt % of the nanoparticle fluid. The nanoparticle fluid further includes a set of capping agent molecules, wherein at least some capping agent molecules of the set of capping agent molecules are attached to the set of nanoparticles.Type: ApplicationFiled: September 24, 2010Publication date: January 20, 2011Inventors: Hyungrak Kim, Malcolm Abbott, Andreas Meisel, Elizabeth Tai, Augustus Jones, Dmitry Poplavskyy, Karel Vanheusden
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Publication number: 20110008363Abstract: The present invention relates to novel endogenous variants of erythropoietin (EPO) and their use for treatment or prevention of a condition associated with tissue damage due to cell death (apoptosis, necrosis) and inflammation, in particular for neuroprotection, e.g. treatment of acute (for example stroke) and chronic disease (for example ALS) of the nervous system.Type: ApplicationFiled: December 15, 2008Publication date: January 13, 2011Inventors: Andreas Meisel, Josef Priller, Christel Bonnas, Ulrich Dirnagl
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Publication number: 20100275982Abstract: A device for generating electricity from solar radiation is disclosed. The device includes a wafer doped with a first dopant, the wafer including a front-side and a back-side, wherein the front-side is configured to be exposed to the solar radiation. The device also includes a fused Group IV nanoparticle thin film deposited on the front-side, wherein the nanoparticle thin film includes a second dopant, wherein the second dopant is a counter dopant. The device further includes a first electrode deposited on the nanoparticle thin film, and a second electrode deposited on the back-side, wherein when solar radiation is applied to the front-side, an electrical current is produced.Type: ApplicationFiled: February 12, 2008Publication date: November 4, 2010Inventors: Malcolm Abbott, Maxim Kelman, Francesco Lemmi, Andreas Meisel, Dmitry Poplavskyy, Mason Terry, Karel Vanheusden
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Publication number: 20100140551Abstract: Matrixes doped with semiconductor nanocrystals are provided. In certain embodiments, the semiconductor nanocrystals have a size and composition such that they absorb or emit light at particular wavelengths. The nanocrystals can comprise ligands that allow for mixing with various matrix materials, including polymers, such that a minimal portion of light is scattered by the matrixes. The matrixes of the present invention can also be utilized in refractive index matching applications. In other embodiments, semiconductor nanocrystals are embedded within matrixes to form a nanocrystal density gradient, thereby creating an effective refractive index gradient. The matrixes of the present invention can also be used as filters and antireflective coatings on optical devices and as down-converting layers. Processes for producing matrixes comprising semiconductor nanocrystals are also provided.Type: ApplicationFiled: November 9, 2009Publication date: June 10, 2010Applicant: NANOSYS, Inc.Inventors: J. Wallace Parce, Paul Bernatis, Robert Dubrow, William P. Freeman, Joel Gamoras, Shihai Kan, Andreas Meisel, Baixin Qian, Jeffery A. Whiteford, Jonathan Ziebarth
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Publication number: 20100139770Abstract: Nanocomposite photovoltaic devices are provided that generally include semiconductor nanocrystals as at least a portion of a photoactive layer. Photovoltaic devices and other layered devices that comprise core-shell nanostructures and/or two populations of nanostructures, where the nanostructures are not necessarily part of a nanocomposite, are also features of the invention. Varied architectures for such devices are also provided including flexible and rigid architectures, planar and non-planar architectures and the like, as are systems incorporating such devices, and methods and systems for fabricating such devices. Compositions comprising two populations of nanostructures of different materials are also a feature of the invention.Type: ApplicationFiled: August 4, 2006Publication date: June 10, 2010Applicant: Nanosys, Inc.Inventors: Erik Scher, Mihai A. Buretea, Calvin Chow, Stephen Empedocles, Andreas Meisel, J. Wallace Parce
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Publication number: 20100136771Abstract: A Group IV based nanoparticle fluid is disclosed. The nanoparticle fluid includes a set of nanoparticles—comprising a set of Group IV atoms, wherein the set of nanoparticles is present in an amount of between about 1 wt % and about 20 wt % of the nanoparticle fluid. The nanoparticle fluid also includes a set of HMW molecules, wherein the set of HMW molecules is present in an amount of between about 0 wt % and about 5 wt % of the nanoparticle fluid. The nanoparticle fluid further includes a set of capping agent molecules, wherein at least some capping agent molecules of the set of capping agent molecules are attached to the set of nanoparticles.Type: ApplicationFiled: June 29, 2009Publication date: June 3, 2010Inventors: Hyungrak Kim, Malcolm Abbott, Andreas Meisel, Elizabeth Tai, Augustus Jones, Dmitry Poplavskyy, Karel Vanheusden
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Publication number: 20100136718Abstract: A method of aligning a set of patterns on a substrate, the substrate including a substrate surface, is disclosed. The method includes depositing a set of silicon nanoparticles on the substrate surface, the set of nanoparticles including a set of ligand molecules including a set of carbon atoms, wherein a first set of regions is formed where the silicon nanoparticles are deposited and the remaining portions of the substrate surface define a second set of regions. The method also includes densifying the set of silicon nanoparticles into a thin film wherein a set of silicon-organic zones are formed on the substrate surface, wherein the first set of regions has a first reflectivity value and the second set of regions has a second reflectivity value. The method further includes illuminating the substrate surface with an illumination source, wherein the ratio of the second reflectivity value to the first reflectivity value is greater than about 1.1.Type: ApplicationFiled: May 19, 2009Publication date: June 3, 2010Inventors: Andreas Meisel, Michael Burrows, Homer Antoniadis
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Patent number: 7662313Abstract: This invention provides compositions and devices having structurally ordered nanostructures, as well as methods for producing structurally ordered nanostructures.Type: GrantFiled: September 4, 2003Date of Patent: February 16, 2010Assignee: NANOSYS, Inc.Inventors: Jeffery A. Whiteford, Mihai Buretea, Erik Scher, Steve Empedocles, Andreas Meisel
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Patent number: 7645397Abstract: Matrixes doped with semiconductor nanocrystals are provided. In certain embodiments, the semiconductor nanocrystals have a size and composition such that they absorb or emit light at particular wavelengths. The nanocrystals can comprise ligands that allow for mixing with various matrix materials, including polymers, such that a minimal portion of light is scattered by the matrixes. The matrixes of the present invention can also be utilized in refractive index matching applications. In other embodiments, semiconductor nanocrystals are embedded within matrixes to form a nanocrystal density gradient, thereby creating an effective refractive index gradient. The matrixes of the present invention can also be used as filters and antireflective coatings on optical devices and as down-converting layers. Processes for producing matrixes comprising semiconductor nanocrystals are also provided.Type: GrantFiled: July 24, 2006Date of Patent: January 12, 2010Assignee: Nanosys, Inc.Inventors: J. Wallace Parce, Paul Bernatis, Robert Dubrow, William P. Freeman, Joel Gamoras, Shihai Kan, Andreas Meisel, Baixin Qian, Jeffery A. Whiteford, Jonathan Ziebarth
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Patent number: 7585564Abstract: Ligand compositions for use in preparing discrete coated nanostructures are provided, as well as the coated nanostructures themselves and devices incorporating same. Methods for post-deposition shell formation on a nanostructure and for reversibly modifying nanostructures are also provided. The ligands and coated nanostructures of the present invention are particularly useful for close packed nanostructure compositions, which can have improved quantum confinement and/or reduced cross-talk between nanostructures.Type: GrantFiled: February 13, 2007Date of Patent: September 8, 2009Assignee: Nanosys, Inc.Inventors: Jeffery A. Whiteford, Mihai Buretea, William P. Freeman, Andreas Meisel, Kyu S. Min, J. Wallace Parce, Erik Scher
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Patent number: 7572740Abstract: A method for producing a Group IV semiconductor thin film in a chamber is disclosed. The method includes positioning a substrate in the chamber, wherein the chamber further has a chamber pressure. The method further includes depositing a nanoparticle ink on the substrate, the nanoparticle ink including set of Group IV semiconductor nanoparticles and a solvent, wherein each nanoparticle of the set of Group IV semiconductor nanoparticles includes a nanoparticle surface, wherein a layer of Group IV semiconductor nanoparticles is formed. The method also includes striking a hydrogen plasma; and heating the layer of Group IV semiconductor nanoparticles to a fabrication temperature of between about 300° C. and about 1350° C., and between about 1 nanosecond and about 10 minutes; wherein the Group IV semiconductor thin film is formed.Type: GrantFiled: April 1, 2008Date of Patent: August 11, 2009Assignee: Innovalight, Inc.Inventors: Mason Terry, Malcolm Abbott, Maxim Kelman, Andreas Meisel, Dmitry Poplavskyy, Eric Schiff
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Publication number: 20080308130Abstract: Methods of processing nanocrystals to remove excess free and bound organic material and particularly surfactants used during the synthesis process, and resulting nanocrystal compositions, devices and systems that are physically, electrically and chemically integratable into an end application.Type: ApplicationFiled: August 4, 2008Publication date: December 18, 2008Applicant: Nanosys, Inc.Inventors: Erik Scher, Mihai Buretea, Jeffery A. Whiteford, Andreas Meisel
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Publication number: 20080305619Abstract: A method forming a Group IV semiconductor junction on a substrate is disclosed. The method includes depositing a first set Group IV semiconductor nanoparticles on the substrate. The method also includes applying a first laser at a first laser wavelength, a first fluence, a first pulse duration, a first number of repetitions, and a first repetition rate to the first set Group IV semiconductor nanoparticles to form a first densified film with a first thickness, wherein the first laser wavelength and the first fluence are selected to limit a first depth profile of the first laser to the first thickness. The method further includes depositing a second set Group IV semiconductor nanoparticles on the first densified film.Type: ApplicationFiled: May 2, 2008Publication date: December 11, 2008Inventors: Francesco Lemmi, Andreas Meisel, Homer Antoniadis
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Publication number: 20080254601Abstract: A method for producing a Group IV semiconductor thin film in a chamber is disclosed. The method includes positioning a substrate in the chamber, wherein the chamber further has a chamber pressure. The method further includes depositing a nanoparticle ink on the substrate, the nanoparticle ink including set of Group IV semiconductor nanoparticles and a solvent, wherein each nanoparticle of the set of Group IV semiconductor nanoparticles includes a nanoparticle surface, wherein a layer of Group IV semiconductor nanoparticles is formed. The method also includes striking a hydrogen plasma; and heating the layer of Group IV semiconductor nanoparticles to a fabrication temperature of between about 300° C. and about 1350° C., and between about 1 nanosecond and about 10 minutes; wherein the Group IV semiconductor thin film is formed.Type: ApplicationFiled: April 1, 2008Publication date: October 16, 2008Inventors: Mason Terry, Malcolm Abbott, Maxim Kelman, Andreas Meisel, Dmitry Poplavskyy, Eric Schiff
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Publication number: 20080241051Abstract: Methods of processing nanocrystals to remove excess free and bound organic material and particularly surfactants used during the synthesis process, and resulting nanocrystal compositions, devices and systems that are physically, electrically and chemically integratable into an end application.Type: ApplicationFiled: September 2, 2004Publication date: October 2, 2008Applicant: NANOSYS, Inc.Inventors: Erik Scher, Mihai Buretea, Jeffery A. Whiteford, Andreas Meisel