Patents by Inventor Andreas Naumann

Andreas Naumann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160010144
    Abstract: The invention relates to an affinity material, comprising a carrier and an affinity protein bonded thereto, and a kit that comprises such an affinity material. The invention further relates to a method for separating and/or enriching prokaryotic DNA and the use of the affinity material to detect pathogenic bacteria or to detect a bacterial contamination.
    Type: Application
    Filed: October 24, 2013
    Publication date: January 14, 2016
    Inventors: Dirk Kuhlmeier, Natalia Sandetskaya, Andreas Naumann, Katharina Hennig
  • Patent number: 8361858
    Abstract: The growth rate in a selective epitaxial growth process for depositing a threshold adjusting semiconductor alloy, such as a silicon/germanium alloy, may be enhanced by performing a plasma-assisted etch process prior to performing the selective epitaxial growth process. For example, a mask layer may be patterned on the basis of the plasma-assisted etch process, thereby simultaneously providing superior device topography during the subsequent growth process. Hence, the threshold adjusting material may be deposited with enhanced thickness uniformity, thereby reducing overall threshold variability.
    Type: Grant
    Filed: January 25, 2010
    Date of Patent: January 29, 2013
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Stephan Kronholz, Andreas Naumann, Gunda Beernink
  • Publication number: 20100193881
    Abstract: The growth rate in a selective epitaxial growth process for depositing a threshold adjusting semiconductor alloy, such as a silicon/germanium alloy, may be enhanced by performing a plasma-assisted etch process prior to performing the selective epitaxial growth process. For example, a mask layer may be patterned on the basis of the plasma-assisted etch process, thereby simultaneously providing superior device topography during the subsequent growth process. Hence, the threshold adjusting material may be deposited with enhanced thickness uniformity, thereby reducing overall threshold variability.
    Type: Application
    Filed: January 25, 2010
    Publication date: August 5, 2010
    Inventors: Stephan Kronholz, Andreas Naumann, Gunda Beernink
  • Patent number: 4950362
    Abstract: Elastic, heat-insulating shapes of ceramic, refractory or fireproof fibers and, where needed, further refractory or fireproof substances, and temporary or inorganic binders, as well as a process for the preparation thereof. The heat-insulating shapes are characterized by the fact that they contain 5 to 40 weight % of fibrids comprised of organic polymers, as a result of which they have elastic properties and can be formed with ease at moderate temperatures. In preparing these shapes, a customary aqueous dispersion containing the fibers and binder is mixed with the fibrids of the organic polymer, and water is removed therefrom and the shapes are otherwise produced in a known manner.
    Type: Grant
    Filed: July 11, 1989
    Date of Patent: August 21, 1990
    Assignee: Didier-Werke Ag
    Inventors: Peter Steinau, Ludwig Wirth, Ingo Elstner, Andreas Naumann