Patents by Inventor Andreas Riegler
Andreas Riegler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230075897Abstract: An electronic circuit is disclosed. The electronic circuit includes: a half-bridge with a first transistor device (1) and a second transistor device (1a); a first biasing circuit (3) connected in parallel with a load path of the first transistor device (1) and comprising a first electronic switch (31); a second biasing circuit (3a) connected in parallel with a load path of the second transistor device (1a) and comprising a second electronic switch (31a); and a drive circuit arrangement (DRVC). The drive circuit arrangement (DRVC) is configured to receive a first half-bridge input signal (Sin) and a second half-bridge input signal (Sina), drive the first transistor device (1) and the second electronic switch (31a) based on the first half-bridge input signal (Sin), and drive the second transistor device (1a) and the first electronic switch (31) based on the second half-bridge input signal (Sina).Type: ApplicationFiled: March 5, 2021Publication date: March 9, 2023Inventors: Hans Weber, Franz Hirler, Matteo-Alessandro Kutschak, Manfred Pippan, Andreas Riegler
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Patent number: 11545561Abstract: A MOSFET includes a semiconductor body having a first side, a drift region, a body region forming a first pn-junction with the drift region, a source region forming a second pn-junction with the body region, in a vertical cross-section, a dielectric structure on the first side and having an upper side; a first gate electrode, a second gate electrode, a contact trench between the first and second gate electrodes, extending through the dielectric structure to the source region, in a horizontal direction a width of the contact trench has, in a first plane, a first value, and, in a second plane, a second value which is at most about 2.5 times the first value, and a first contact structure arranged on the dielectric structure having a through contact portion arranged in the contact trench, and in Ohmic contact with the source region.Type: GrantFiled: December 28, 2020Date of Patent: January 3, 2023Assignee: Infineon Technologies Austria AGInventors: Andreas Riegler, Wolfgang Jantscher, Manfred Pippan, Maik Stegemann
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Patent number: 11538008Abstract: A method to generate revenue from supplied content is provided. Content is provided to a consumer via a network by providing a content service that allows the consumer to select and retrieve content as a package together with a clearing of the selectable content to an operator used by the consumer to select and retrieve the content via the network. Any content selected by the consumer is supplied directly to the consumer via the operator. The operator is charged for the supplied content.Type: GrantFiled: November 18, 2020Date of Patent: December 27, 2022Assignee: Tahoe Research, Ltd.Inventors: Thomas Nemetz, Andreas Riegler, Andreas Spechtler
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Patent number: 11527468Abstract: A connection body which comprises a base structure at least predominantly made of a semiconductor oxide material or glass material, and an electrically conductive wiring structure on and/or in the base structure, wherein the electrically conductive wiring structure comprises at least one vertical wiring section with a first lateral dimension on and/or in the base structure and at least one lateral wiring section connected with the at least one vertical wiring section, wherein the at least one lateral wiring section has a second lateral dimension on and/or in the base structure, which is different to the first lateral dimension.Type: GrantFiled: September 12, 2019Date of Patent: December 13, 2022Assignee: Infineon Technologies AGInventors: Andreas Riegler, Christian Fachmann, Matteo-Alessandro Kutschak, Carsten von Koblinski, Hans Weber
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Publication number: 20220310838Abstract: A semiconductor device is proposed. An example of the semiconductor device includes a semiconductor body having a first main surface. A trench structure extends into the semiconductor body from the first main surface. The trench structure includes a trench electrode structure and a trench dielectric structure. The trench dielectric structure includes a gate dielectric in an upper part of the trench dielectric structure and a gap in a lower part of the trench dielectric structure. The semiconductor device further includes a body region adjoining the gate dielectric at a sidewall of the trench structure in the upper part of the trench dielectric structure. The gate dielectric extends deeper into the semiconductor body along the sidewall than the body region.Type: ApplicationFiled: March 15, 2022Publication date: September 29, 2022Inventors: Hans Weber, David Kammerlander, Andreas Riegler
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Publication number: 20220231671Abstract: Electronic circuits are disclosed. One electronic circuit includes: a transistor device having a load path and a drive input; a first drive circuit configured to receive a supply voltage and generate a drive signal for the transistor device based on the supply voltage; and a biasing circuit connected in parallel with the load path of the transistor device. The biasing circuit includes a bias voltage circuit configured to receive the supply voltage and generate a bias voltage higher than the supply voltage based on the supply voltage.Type: ApplicationFiled: April 4, 2022Publication date: July 21, 2022Inventors: Hans Weber, Franz Hirler, Matteo-Alessandro Kutschak, Andreas Riegler
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Patent number: 11323099Abstract: Electronic circuits are disclosed. One electronic circuit includes: a transistor device having a load path and a drive input; a first drive circuit configured to receive a supply voltage and generate a drive signal for the transistor device based on the supply voltage; and a biasing circuit connected in parallel with the load path of the transistor device. The biasing circuit includes a bias voltage circuit configured to receive the supply voltage and generate a bias voltage higher than the supply voltage based on the supply voltage.Type: GrantFiled: March 5, 2021Date of Patent: May 3, 2022Assignee: Infineon Technologies Austria AGInventors: Hans Weber, Franz Hirler, Matteo-Alessandro Kutschak, Andreas Riegler
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Patent number: 11289597Abstract: A transistor device is enclosed. The transistor device includes: a semiconductor body; a plurality of drift regions of a first doping type; a plurality of compensation regions of a second doping type adjoining the drift regions; and a plurality of transistor cells each including a body region adjoining a respective one of the plurality of drift regions, a source region adjoining the body region, and a gate electrode adjacent the body region and dielectrically insulated from the body region by a gate dielectric. The source regions of the plurality of transistor cells are connected to a source node, the body regions of the plurality of transistor cells are separated from the plurality of compensation regions in the semiconductor body, and the plurality of compensation regions are ohmically connected to the source node.Type: GrantFiled: August 20, 2020Date of Patent: March 29, 2022Assignee: Infineon Technologies Austria AGInventors: Hans Weber, Björn Fischer, Franz Hirler, Matteo-Alessandro Kutschak, Andreas Riegler
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Publication number: 20220077845Abstract: Electronic circuits are disclosed. One electronic circuit includes: a transistor device having a load path and a drive input; a first drive circuit configured to receive a supply voltage and generate a drive signal for the transistor device based on the supply voltage; and a biasing circuit connected in parallel with the load path of the transistor device. The biasing circuit includes a bias voltage circuit configured to receive the supply voltage and generate a bias voltage higher than the supply voltage based on the supply voltage.Type: ApplicationFiled: March 5, 2021Publication date: March 10, 2022Inventors: Hans Weber, Franz Hirler, Matteo-Alessandro Kutschak, Andreas Riegler
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Publication number: 20220037240Abstract: A semiconductor device package includes a printed circuit board including a first central area, a second lateral area, and a third lateral area, a semiconductor die including a first main face and a second main face opposite the first main face, a first contact pad on the first main face and a second contact pad on the second main face, the semiconductor die disposed in the first central area of the printed circuit board, a first metallic side wall of the semiconductor device package disposed in the second lateral area of the printed circuit board, a second metallic side wall of the semiconductor device package disposed in the third lateral area of the printed circuit board, wherein at least one of the first metallic side wall and the second metallic side wall is electrically connected with one of the first contact pad or the second contact pad.Type: ApplicationFiled: July 29, 2021Publication date: February 3, 2022Inventors: Petteri Palm, Ulrich Froehler, Ralf Otremba, Andreas Riegler
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Publication number: 20220028699Abstract: A method of manufacturing a semiconductor device includes forming a plurality of patterns of metal structures in a dielectric inorganic substrate wafer. The metal structures are accommodated in recesses of the dielectric inorganic substrate wafer and at least partly connect through the dielectric inorganic substrate. The method further includes providing a semiconductor wafer comprising a front side and a backside, wherein a plurality of electrodes is disposed on the front side of the semiconductor wafer. The front side of the semiconductor wafer is bonded to the dielectric inorganic substrate wafer to form a composite wafer, wherein the plurality of patterns of metal structures is connected to the plurality of electrodes. The composite wafer is separated into composite chips.Type: ApplicationFiled: July 20, 2021Publication date: January 27, 2022Inventors: Christian Fachmann, Barbara Angela Glanzer, Andreas Riegler
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Publication number: 20210335696Abstract: A method includes providing a processed first wafer having front and back sides and including power semiconductor dies implemented within the wafer by processing its front side, each die having a first load terminal at the front side and a second load terminal at the back side; providing an unprocessed second wafer made of an electrically insulating material and having first and second opposing sides; forming a plurality of recesses within the second wafer; filling the plurality of recesses with a conductive material; forming a stack by attaching, prior or subsequent to filling the recesses, the second wafer to the front side of the first wafer, the conductive material electrically contacting the first load terminals of the power semiconductor dies; and ensuring that the conductive material provides an electrical connection between the first side and the second side of the second wafer.Type: ApplicationFiled: July 6, 2021Publication date: October 28, 2021Inventors: Andreas Riegler, Christian Fachmann
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Publication number: 20210319419Abstract: A method to generate revenue from supplied content is provided. Content is provided to a consumer via a network by providing a content service that allows the consumer to select and retrieve content as a package together with a clearing of the selectable content to an operator used by the consumer to select and retrieve the content via the network. Any content selected by the consumer is supplied directly to the consumer via the operator. The operator is charged for the supplied content.Type: ApplicationFiled: June 25, 2021Publication date: October 14, 2021Inventors: Thomas Nemetz, Andreas Riegler, Andreas Spechtler
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Patent number: 11088275Abstract: A method for operating a superjunction transistor device and a transistor arrangement are disclosed. The method includes operating the superjunction transistor device in a diode state. Operating the superjunction transistor device in the diode state includes applying a bias voltage different from zero between a drift region of at least one transistor cell of the superjunction transistor device and a compensation region of a doping type complementary to a doping type of the drift region. The compensation region adjoins the drift region, and a polarity of the bias voltage is such that a pn-junction between the drift region and the compensation region is reverse biased.Type: GrantFiled: March 6, 2020Date of Patent: August 10, 2021Assignee: Infineon Technologies Austria AGInventors: Hans Weber, Christian Fachmann, Franz Hirler, Matteo-Alessandro Kutschak, Andreas Riegler
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Patent number: 11081430Abstract: A package and a corresponding method are described. The method includes: providing a processed first wafer having front and back sides and including power semiconductor dies implemented within the wafer by processing its front side, each die having a first load terminal at the front side and a second load terminal at the back side; providing an unprocessed second wafer made of an electrically insulating material and having first and second opposing sides; forming a plurality of recesses within the second wafer; filling the plurality of recesses with a conductive material; forming a stack by attaching, prior or subsequent to filling the recesses, the second wafer to the front side of the first wafer, the conductive material electrically contacting the first load terminals of the power semiconductor dies; and ensuring that the conductive material provides an electrical connection between the first side and the second side of the second wafer.Type: GrantFiled: November 16, 2018Date of Patent: August 3, 2021Assignee: Infineon Technologies Austria AGInventors: Andreas Riegler, Christian Fachmann
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Publication number: 20210174322Abstract: A method to generate revenue from supplied content is provided. Content is provided to a consumer via a network by providing a content service that allows the consumer to select and retrieve content as a package together with a clearing of the selectable content to an operator used by the consumer to select and retrieve the content via the network. Any content selected by the consumer is supplied directly to the consumer via the operator. The operator is charged for the supplied content.Type: ApplicationFiled: November 18, 2020Publication date: June 10, 2021Inventors: Thomas Nemetz, Andreas Riegler, Andreas Spechtler
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Publication number: 20210151584Abstract: A MOSFET includes a semiconductor body having a first side, a drift region, a body region forming a first pn-junction with the drift region, a source region forming a second pn-junction with the body region, in a vertical cross-section, a dielectric structure on the first side and having an upper side; a first gate electrode, a second gate electrode, a contact trench between the first and second gate electrodes, extending through the dielectric structure to the source region, in a horizontal direction a width of the contact trench has, in a first plane, a first value, and, in a second plane, a second value which is at most about 2.5 times the first value, and a first contact structure arranged on the dielectric structure having a through contact portion arranged in the contact trench, and in Ohmic contact with the source region.Type: ApplicationFiled: December 28, 2020Publication date: May 20, 2021Inventors: Andreas Riegler, Wolfgang Jantscher, Manfred Pippan, Maik Stegemann
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Publication number: 20210057576Abstract: A transistor device is enclosed. The transistor device includes: a semiconductor body; a plurality of drift regions of a first doping type; a plurality of compensation regions of a second doping type adjoining the drift regions; and a plurality of transistor cells each including a body region adjoining a respective one of the plurality of drift regions, a source region adjoining the body region, and a gate electrode adjacent the body region and dielectrically insulated from the body region by a gate dielectric. The source regions of the plurality of transistor cells are connected to a source node, the body regions of the plurality of transistor cells are separated from the plurality of compensation regions in the semiconductor body, and the plurality of compensation regions are ohmically connected to the source node.Type: ApplicationFiled: August 20, 2020Publication date: February 25, 2021Inventors: Hans Weber, Björn Fischer, Franz Hirler, Matteo-Alessandro Kutschak, Andreas Riegler
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Patent number: 10903341Abstract: A method for manufacturing a MOSFET semiconductor device includes providing a wafer including a semiconductor body having a first side, a first semiconductor region adjacent to the first side, a second semiconductor region adjacent to the first side and forming a first pn-junction with the first semiconductor region, and a third semiconductor region adjacent to the first side and forming a second pn-junction with the second semiconductor region, a first dielectric layer arranged on the first side, a gate electrode embedded in the first dielectric layer, and a second dielectric layer arranged on the first dielectric layer. Next to the gate electrode, a trench is formed through the first dielectric layer and the second dielectric layer. At a side wall of the trench, a dielectric spacer is formed. The trench is extended into the semiconductor body to form a contact trench.Type: GrantFiled: September 10, 2018Date of Patent: January 26, 2021Assignee: Infineon Technologies Austria AGInventors: Andreas Riegler, Wolfgang Jantscher, Manfred Pippan, Maik Stegemann
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Patent number: 10811529Abstract: A transistor device comprises at least one gate electrode, a gate runner connected to the at least one gate electrode and arranged on top of a semiconductor body, a plurality of gate pads arranged on top of the semiconductor body, and a plurality of resistor arrangements. Each gate pad is electrically connected to the gate runner via a respective one of the plurality of resistor arrangements, and each of the resistor arrangements has an electrical resistance, wherein the resistances of the plurality of resistor arrangements are different.Type: GrantFiled: April 10, 2019Date of Patent: October 20, 2020Assignee: Infineon Technologies Austria AGInventors: Andreas Riegler, Christian Fachmann, Bjoern Fischer, Franz Hirler, Gabor Mezoesi, Hans Weber