Abstract: A method of handling a mask device configured for masked deposition on a substrate is described. The method includes: loading a mask device into a vacuum system; attaching the mask device to a mask carrier in the vacuum system; and transporting the mask carrier that holds the mask device in a non-horizontal orientation along a transport path in the vacuum system. A further mask handling method includes: transporting a mask carrier that holds a mask device in a non-horizontal orientation along a transport path in a vacuum system; detaching the mask device from the mask carrier in the vacuum system; and unloading the mask device from the vacuum system. According to a further aspect, a mask handling assembly for handling a mask device as well as a vacuum system with at least one mask handling assembly are described.

Abstract: The present disclosure provides an apparatus (200) for vacuum processing of a substrate (10). The apparatus (200) includes a vacuum chamber, a first track arrangement (110) configured for transportation of a substrate carrier (120), a second track arrangement (130) configured for transportation of a mask carrier (140), and a holding arrangement configured for positioning the substrate carrier (120) and the mask carrier (140) with respect to each other. The first track arrangement (110) includes a first portion configured to support the substrate carrier (120) at a first end (12) of the substrate (10) and a second portion configured to support the substrate carrier (120) at a second end (14) of the substrate (10) opposite the first end (12) of the substrate (10).

Abstract: A carrier for use in a vacuum system is described. The carrier includes: a magnet arrangement including one or more first permanent magnets; one or more second permanent magnets; and a magnet device configured to change a magnetization of the one or more first permanent magnets. The carrier may be used for carrying a mask device or a substrate in the vacuum system. Further, a vacuum system and a method of operating a vacuum system are described.

Abstract: A supply line guide for guiding a plurality of supply lines in a vacuum chamber of a processing system is described. The supply line guide includes a guiding arrangement including a plurality of connected elements, wherein the connected elements are angle-adjustable relative to each other. Further, the supply line guide includes a flexible tube provided around the guiding arrangement.

Abstract: The present disclosure provides an apparatus (100) for vacuum processing of a substrate (10). The apparatus (100) includes a first vacuum region (110), a second vacuum region (120), an opening (130) between the first vacuum region (100) and the second vacuum region (130), and a closing arrangement (140) for closing the opening (130). The closing arrangement includes one or more first permanent magnets, one or more second permanent magnets, and a magnet device configured to change a magnetization of the one or more first permanent magnets.

Abstract: A positioning arrangement for positioning a substrate carrier and a mask carrier in a vacuum chamber is described. The positioning arrangement comprising a first track extending in a first direction and configured transportation of the substrate carrier configured for holding a substrate having a substrate surface, a second track extending in the first direction and configured for transportation of the mask carrier, wherein the first track and the second track are offset by an offset distance in a plane coplanar with the substrate surface, and a holding arrangement configured for holding the mask carrier, wherein the holding arrangement is arranged between the first track and the second track.

Abstract: An apparatus for processing a thin film on a substrate is described. The apparatus includes a vacuum chamber comprising a housing, a rear wall and a removable closing plate; a processing drum being arranged between the rear wall and the removable closing plate inside the vacuum chamber, the processing drum being at least partially surrounded by a processing region; a first process separating wall portion attached to the removable closing plate; a second process separating wall portion attached to the housing or the rear wall; wherein in a closed position of the removable closing plate, the first process separating wall portion and the second process separating wall portion jointly provide a process separating wall dividing the processing region into adjacent processing sections.

Abstract: An exhaust system for an internal combustion engine, especially diesel internal combustion engine, includes an exhaust gas flow duct (12). At least one exhaust gas treatment unit (23, 26, 28, 30) is provided in an exhaust gas treatment duct area (16) of the exhaust gas flow duct (12). The exhaust gas treatment duct area (16) of the exhaust gas flow duct (12) extends, in at least some areas, in an insulation volume (20), through which exhaust gas discharged from the exhaust gas treatment duct area (16) can flow.

Abstract: A method welds together two components of an internal combustion engine exhaust system, by resistance welding, to provide greater positioning freedom of two components welded together. A first component is provided with a welding area including an insertion opening edge surrounding an insertion opening. A second component is provided with a welding area including an insertion area to be inserted into the insertion opening. The insertion area is inserted into the insertion opening such that the insertion area is in contact with the first the entire insertion opening edge. An electrical voltage is applied to resistance weld the first component to the second component. The surface (28) of the insertion area is curved about two axes that are not parallel or is curved about an axis that is parallel to the surface of the insertion area, or/and an insertion surface of the insertion opening edge is located in one plane.

Abstract: A vacuum processing system for a flexible substrate is provided. The processing system includes a first chamber adapted for housing one of a supply roll for providing the flexible substrate and a take-up roll for storing the flexible substrate; a second chamber adapted for housing one of a supply roll for providing the flexible substrate and a take-up roll for storing the flexible substrate; a maintenance zone between the first chamber and the second chamber; and a first process chamber for depositing material on the flexible substrate, wherein the second chamber is provided between the maintenance zone and the first process chamber. The maintenance zone allows for maintenance access to at least one of the first chamber and the second chamber.

Abstract: A processing apparatus for processing a flexible substrate in a vacuum chamber is described. The processing apparatus includes a processing drum for processing the flexible substrate while being guided on the processing drum, a roller arrangement having one or more rollers configured to contact the flexible substrate along a portion of one or more circumferences of the one or more rollers before the flexible substrate is guided on the processing drum, wherein the combined length of contact along one or more portions of the one or more circumferences of the one or more rollers is 270 mm or above, and wherein an individual length of contact along each of the one or more portions of the one or more circumferences of the one or more rollers is 500 mm or below, and a temperature adjustment element adjusting the temperature of the one or more rollers.

Abstract: A processing apparatus for processing a flexible substrate, particularly a vacuum processing apparatus for processing a flexible substrate, is described. The processing apparatus includes a vacuum chamber; a processing drum within the vacuum chamber, wherein the processing drum is configured to rotate around an axis extending in a first direction; and a heating device adjacent to the processing drum, wherein the heating device is configured for spreading the substrate in the first direction or for maintaining a spread of the substrate in the first direction, and wherein the heating device has a dimension in a direction parallel to a substrate transport direction of at least 20 mm.

Abstract: A processing apparatus for processing a flexible substrate, particularly a vacuum processing apparatus for processing a flexible substrate, is described. The processing apparatus includes a vacuum chamber; a processing drum within the vacuum chamber, wherein the processing drum is configured to rotate around an axis extending in a first direction; and a heating device adjacent to the processing drum, wherein the heating device is configured for spreading the substrate in the first direction or for maintaining a spread of the substrate in the first direction, and wherein the heating device has a dimension in a direction parallel to a substrate transport direction of at least 20 mm.

Abstract: A deposition arrangement for depositing a material on a substrate is described. The deposition arrangement includes a vacuum chamber; a roller device within the vacuum chamber; and an electrical heating device within the roller device, wherein the heating device comprises a first end and a second end, and wherein the heating device is held at the first end and at the second end. Also, a method for heating a substrate in a vacuum deposition arrangement is described.

Abstract: The present invention relates to an exhaust gas treatment device for an exhaust system of an internal combustion engine, more preferably of a road vehicle with a housing, in which at least one exhaust gas treatment element is arranged and mounted by means of a bearing mat and with an outlet pipe which is fluidically connected to an outlet chamber formed in the housing. The risk of a contamination of the bearing mat with water can be reduced with a separating bottom which is arranged in the housing and separates the outlet chamber from a collecting chamber. The separating bottom includes several passage openings through which the outlet chamber is fluidically connected to the collecting chamber and which are each enclosed by a collar protruding into the outlet chamber.

Abstract: The present invention relates to an exhaust gas treatment unit for an exhaust system of a combustion engine, in particular of a motor vehicle, includes a housing, a plurality of exhaust gas treatment elements, which are arranged in the housing and through which a parallel flow is possible. The unit further includes an outlet nozzle, which penetrates a side face of the housing, and an outlet space disposed in the housing, whereby the outlet of at least one of the exhaust gas treatment elements opens into the outlet space. The rigidity and/or effectiveness of the exhaust gas treatment unit can be improved by means of a funnel body disposed in the outlet space, and comprising a funnel surface which is permeable to exhaust gas. The funnel body connects an outlet end of one of the exhaust gas treatment elements with the outlet nozzle.

Abstract: Pallets suited to accommodate thermal gradients during processing. In one aspect, a pallet includes a pair of elongate members, a fixed elongate lateral cross member fixedly coupled to each of the elongate members, and an elongate floating lateral cross member floatingly coupled to the elongate members. The floating lateral cross member displaced from the fixedly coupled lateral cross member to define a gap therebetween.

Abstract: The present invention relates to an exhaust gas treatment device for an exhaust system of an internal combustion engine, more preferably of a road vehicle with a housing, in which at least one exhaust gas treatment element is arranged and mounted by means of a bearing mat and with an outlet pipe which is fluidically connected to an outlet chamber formed in the housing. The risk of a contamination of the bearing mat with water can be reduced with a separating bottom which is arranged in the housing and separates the outlet chamber from a collecting chamber. The separating bottom includes several passage openings through which the outlet chamber is fluidically connected to the collecting chamber and which are each enclosed by a collar protruding into the outlet chamber.

Abstract: A lock valve is adapted for locking a process chamber. The lock valve includes a valve flap adapted for sealing an aperture of the process chamber where a substrate to be processed may be inserted or ejected. A cooling unit is adapted for cooling the valve flap by means of a cooling fluid. At least one valve flap hinge is adapted for connecting the process chamber with the valve flap. The valve flap hinge furthermore includes at least one pipe in fluid communication with the cooling unit of the valve flap.

Abstract: A substrate transport system adapted for transporting a substrate moving in a substrate transport direction in a processing chamber is provided. The substrate transport system includes a plurality of transport rollers each having a transport shaft and a transport wheel. The transport shaft and the transport wheel are adapted for supporting the moving substrate. A heating means is arranged between the position of the moving substrate and the transport shaft and is adapted for heating the moving substrate.