Patents by Inventor Andreas Schoenle

Andreas Schoenle has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11947097
    Abstract: A bandpass filter for light has variable lower and upper cut-off wavelengths. The bandpass filter comprises an areal long-pass filter defining the variable lower cut-off wavelength and an areal short-pass filter defining the variable upper cut-off wavelength. The long-pass filter has different lower cut-off wavelengths in different first area regions which follow to one another in a first direction, and the short-pass filter has different upper cut-off wavelengths in different second area regions which follow to one another in a second direction. The long-pass filter and the short-pass filter are connected in series and spatially fixed relative to one another. The first direction and the second direction are oriented crosswise to one another.
    Type: Grant
    Filed: April 6, 2021
    Date of Patent: April 2, 2024
    Assignee: ABBERIOR INSTRUMENTS GMBH
    Inventors: Joachim Fischer, Matthias Henrich, Andreas Schoenle, Lars Kastrup
  • Publication number: 20240094128
    Abstract: Embodiments of the invention relates to a method for localizing or tracking emitters in a sample, wherein the sample is illuminated with an intensity distribution of an illumination light having a local minimum, wherein the illumination light induces or modulates light emissions of the emitters, and wherein the local minimum is positioned in a region around a presumed position of an emitter in the sample, detecting light emissions (L) of the emitter, and determining the position of the emitter in the sample, wherein light emanating from the sample is detected with a plurality of detector elements having respective active areas whose projections into a focal plane in the sample are not congruent, wherein a background is estimated based on the light detected by the plurality of detector elements, and wherein a background correction is performed, a light microscope and a computer program for performing the method.
    Type: Application
    Filed: August 30, 2023
    Publication date: March 21, 2024
    Inventors: Roman SCHMIDT, Andreas Schoenle
  • Publication number: 20210223528
    Abstract: A bandpass filter for light has variable lower and upper cut-off wavelengths. The bandpass filter comprises an areal long-pass filter defining the variable lower cut-off wavelength and an areal short-pass filter defining the variable upper cut-off wavelength. The long-pass filter has different lower cut-off wavelengths in different first area regions which follow to one another in a first direction, and the short-pass filter has different upper cut-off wavelengths in different second area regions which follow to one another in a second direction. The long-pass filter and the short-pass filter are connected in series and spatially fixed relative to one another. The first direction and the second direction are oriented crosswise to one another.
    Type: Application
    Filed: April 6, 2021
    Publication date: July 22, 2021
    Inventors: Joachim Fischer, Matthias Henrich, Andreas Schoenle, Lars Kastrup
  • Patent number: 10795140
    Abstract: In order to generate rasterized images of a sample, a pixel size of image points of a rasterized image is set and photons emitted out of the sample which were detected, and for each of which a position of an effective local excitation of the sample for emitting the respective detected photon has been recorded are assigned to that image point of the rasterized image into which the position of the effective local excitation recorded for the respective detected photon falls. To set the pixel size of the image points to an optimized pixel size, the positions of the effective local excitation of the sample for emitting the detected photons are evaluated.
    Type: Grant
    Filed: February 21, 2017
    Date of Patent: October 6, 2020
    Assignee: ABBERIOR INSTRUMENTS GMBH
    Inventors: Andreas Schoenle, Lars Kastrup
  • Patent number: 10488342
    Abstract: In methods of high-resolution imaging a structure of a sample, the structure being marked with fluorescence markers, the sample is subjected to a light intensity distribution including an intensity maximum of focused fluorescence excitation light to selectively scan partial areas of interest of the sample. Fluorescence light emitted out of the sample is registered and allocated to a respective location of the light intensity distribution in the sample. The subjection of the sample to at least one part of the light intensity distribution is terminated at each location of the light intensity distribution, if at least one criterion of the following criteria is met: (a) a predetermined maximum light amount of the fluorescence light emitted out of the sample has been registered, and (b) a predetermined minimum light amount of the fluorescence light emitted out of the sample has not been registered within a predetermined period of time.
    Type: Grant
    Filed: October 23, 2018
    Date of Patent: November 26, 2019
    Assignee: ABBERIOR INSTRUMENTS GMBH
    Inventors: Andreas Schoenle, Christian Wurm, Benjamin Harke, Gerald Donnert
  • Patent number: 10429305
    Abstract: In methods of high-resolution imaging a structure of a sample, the structure being marked with fluorescence markers, the sample is subjected to a light intensity distribution including an intensity maximum of focused fluorescence excitation light to selectively scan partial areas of interest of the sample. Fluorescence light emitted out of the sample is registered and allocated to a respective location of the light intensity distribution in the sample. The subjection of the sample to at least one part of the light intensity distribution is terminated at each location of the light intensity distribution, if at least one criterion of the following criteria is met: (a) a predetermined maximum light amount of the fluorescence light emitted out of the sample has been registered, and (b) a predetermined minimum light amount of the fluorescence light emitted out of the sample has not been registered within a predetermined period of time.
    Type: Grant
    Filed: April 23, 2018
    Date of Patent: October 1, 2019
    Assignee: ABBERIOR INSTRUMENTS GMBH
    Inventors: Andreas Schoenle, Christian Wurm, Benjamin Harke, Gerald Donnert
  • Publication number: 20190056327
    Abstract: In methods of high-resolution imaging a structure of a sample, the structure being marked with fluorescence markers, the sample is subjected to a light intensity distribution including an intensity maximum of focused fluorescence excitation light to selectively scan partial areas of interest of the sample. Fluorescence light emitted out of the sample is registered and allocated to a respective location of the light intensity distribution in the sample. The subjection of the sample to at least one part of the light intensity distribution is terminated at each location of the light intensity distribution, if at least one criterion of the following criteria is met: (a) a predetermined maximum light amount of the fluorescence light emitted out of the sample has been registered, and (b) a predetermined minimum light amount of the fluorescence light emitted out of the sample has not been registered within a predetermined period of time.
    Type: Application
    Filed: October 23, 2018
    Publication date: February 21, 2019
    Inventors: Andreas Schoenle, Christian Wurm, Benjamin Harke, Gerald Donnert
  • Publication number: 20180238804
    Abstract: In methods of high-resolution imaging a structure of a sample, the structure being marked with fluorescence markers, the sample is subjected to a light intensity distribution including an intensity maximum of focused fluorescence excitation light to selectively scan partial areas of interest of the sample. Fluorescence light emitted out of the sample is registered and allocated to a respective location of the light intensity distribution in the sample. The subjection of the sample to at least one part of the light intensity distribution is terminated at each location of the light intensity distribution, if at least one criterion of the following criteria is met: (a) a predetermined maximum light amount of the fluorescence light emitted out of the sample has been registered, and (b) a predetermined minimum light amount of the fluorescence light emitted out of the sample has not been registered within a predetermined period of time.
    Type: Application
    Filed: April 23, 2018
    Publication date: August 23, 2018
    Inventors: Andreas Schoenle, Christian Wurm, Benjamin Harke, Gerald Donnert
  • Publication number: 20170248778
    Abstract: In order to generate rasterized images of a sample, a pixel size of image points of a rasterized image is set and photons emitted out of the sample which were detected, and for each of which a position of an effective local excitation of the sample for emitting the respective detected photon has been recorded are assigned to that image point of the rasterized image into which the position of the effective local excitation recorded for the respective detected photon falls. To set the pixel size of the image points to an optimized pixel size, the positions of the effective local excitation of the sample for emitting the detected photons are evaluated.
    Type: Application
    Filed: February 21, 2017
    Publication date: August 31, 2017
    Inventors: Andreas Schoenle, Lars Kastrup
  • Publication number: 20170123197
    Abstract: A device comprises two polarization-selective optical elements for separately modulating wave fronts of two components of a collimated light beam, which are transversally polarized in orthogonal directions. The two polarization-selective optical elements are first and second partial areas of one spatial light modulator (SLM) diffracting the light beam in backward direction. A mirror arranged between the first and second partial areas of the SLM reflects the light beam coming from the first partial area towards the second partial area. A wave plate arranged between the first partial area and the second partial area of the SLM rotates the polarization directions of both components of the light beam by 90°. The mirror reflects the first and second components of the light beam as parallel bundles of light rays resulting in a lateral offset between the first and second components of the light beam behind the second partial area of the SLM.
    Type: Application
    Filed: November 4, 2015
    Publication date: May 4, 2017
    Inventors: Matthias Reuss, Andreas Schoenle, Lars Kastrup, Gerald Donnert, Benjamin Harke
  • Patent number: 9632297
    Abstract: A device comprises two polarization-selective optical elements for separately modulating wave fronts of two components of a collimated light beam, which are transversally polarized in orthogonal directions. The two polarization-selective optical elements are first and second partial areas of one spatial light modulator (SLM) diffracting the light beam in backward direction. A mirror arranged between the first and second partial areas of the SLM reflects the light beam coming from the first partial area towards the second partial area. A wave plate arranged between the first partial area and the second partial area of the SLM rotates the polarization directions of both components of the light beam by 90°. The mirror reflects the first and second components of the light beam as parallel bundles of light rays resulting in a lateral offset between the first and second components of the light beam behind the second partial area of the SLM.
    Type: Grant
    Filed: November 4, 2015
    Date of Patent: April 25, 2017
    Assignee: ABBERIOR INSTRUMENTS GMBH
    Inventors: Matthias Reuss, Andreas Schoenle, Lars Kastrup, Gerald Donnert, Benjamin Harke