Patents by Inventor Andreas Simon Gaab

Andreas Simon Gaab has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240010544
    Abstract: In one embodiment, a method of drilling a feature in a substrate includes directing a pulsed laser beam focal line into the substrate at a plurality of locations, the laser beam focal line generating an induced absorption within the substrate such that the laser beam focal line produces a perforation extending through a thickness of the substrate at the plurality of locations to form a perforation contour. The method further includes directing a focused ablation laser beam into the substrate and ablating at least a portion of the substrate along an ablation track that is offset from the perforation contour by a perforation-ablation offset ?nP-Ablation to remove substrate material within a shape defined by the perforation contour to form the feature. The perforation-ablation offset ?nP-Ablation is such that the feature has a chipping with chips having a size of less than 50 ?m.
    Type: Application
    Filed: June 21, 2023
    Publication date: January 11, 2024
    Inventors: Maximilian Joachim Gustav Breitwieser, Andreas Simon Gaab
  • Patent number: 11577981
    Abstract: A method of separating a transparent mother sheet includes contacting a first surface of the transparent mother sheet with an open ended pressure assembly including a pressure vessel shell, thereby forming a shell cavity defined by the first surface of the transparent mother sheet and the pressure vessel shell, where the transparent mother sheet comprises a damage path. The method also includes removing gas from the shell cavity through a fluid removal outlet extending through the pressure vessel shell to reduce a cavity pressure in the shell cavity, thereby applying stress to the damage path to separate a portion of the transparent mother sheet along the damage path.
    Type: Grant
    Filed: July 15, 2020
    Date of Patent: February 14, 2023
    Assignee: Corning Incorporated
    Inventors: Andreas Simon Gaab, Michael Albert Joseph, II, Albert Roth Nieber, John Charles Speeckaert, Sergio Tsuda, Heather Nicole Vanselous
  • Publication number: 20220193831
    Abstract: A method of forming a plurality of defects within a substrate with a laser beam focal line using a laser beam, each defect of the plurality of defects being a damage track within the substrate with a diameter of about 10 microns or less, the plurality of defects forming a contour line on the substrate. The substrate having a first surface and a second surface that is opposite from the first surface. The method further includes exerting (i) a first force on the first surface of the substrate at a location that is adjacent to the contour line and (ii) a second force on the second surface of the substrate at a location that is on the contour line. Additionally, the method includes breaking the substrate along the contour line and into a first substrate portion and a second substrate portion.
    Type: Application
    Filed: December 17, 2021
    Publication date: June 23, 2022
    Inventors: Andreas Simon Gaab, Richard Anthony Gaona, Nicolai Martin Haenel, Dale Humphrey, Ralf Joachim Terbrueggen, John Eric Tyler
  • Publication number: 20220134475
    Abstract: Embodiments of the present disclosure include a optical assembly comprising: an axicon lens with spherical aberration configured to generate the laser beam focal line, an optical element set spaced part from the optical lens, and a focusing optical element spaced apart from the optical element set, wherein the axicon lens and the optical element set are translatable relative to each other along the laser beam propagation direction and wherein the focusing optical element is in a fixed position along the laser beam propagation direction.
    Type: Application
    Filed: October 26, 2021
    Publication date: May 5, 2022
    Inventors: Andreas Simon Gaab, Anping Liu, Jian-Zhi Jay Zhang
  • Publication number: 20210283713
    Abstract: A method for processing a transparent workpiece includes directing a pulsed laser beam into the transparent workpiece such that a portion of the pulsed laser beam directed into the transparent workpiece generates an induced absorption within the transparent workpiece, thereby forming a damage line within the transparent workpiece, and the portion of the pulsed laser beam directed into the transparent workpiece includes a wavelength ?, a spot size wo, and a Rayleigh range ZR that is greater than F D ? ? ? w 0 , 2 ? , where FD is a dimensionless divergence factor comprising a value of 10 or greater. Further, the method for processing the transparent workpiece includes etching the transparent workpiece with an etching vapor to remove at least a portion of the transparent workpiece along the damage line, thereby forming an aperture extending through the at least a portion of the thickness of the transparent workpiece.
    Type: Application
    Filed: May 21, 2021
    Publication date: September 16, 2021
    Inventors: Heather Debra Boek, Andreas Simon Gaab, Garrett Andrew Piech, Alranzo Boh Ruffin, Daniel Arthur Sternquist, Michael Brian Webb
  • Patent number: 11052481
    Abstract: A method for processing a transparent workpiece includes directing a pulsed laser beam into the transparent workpiece such that a portion of the pulsed laser beam directed into the transparent workpiece generates an induced absorption within the transparent workpiece, thereby forming a damage line within the transparent workpiece, and the portion of the pulsed laser beam directed into the transparent workpiece includes a wavelength ?, a spot size w0, and a Rayleigh range ZR that is greater than F D ? ? ? w 0 2 ? , where FD is a dimensionless divergence factor comprising a value of 10 or greater. Further, the method for processing the transparent workpiece includes etching the transparent workpiece with an etching vapor to remove at least a portion of the transparent workpiece along the damage line, thereby forming an aperture extending through the at least a portion of the thickness of the transparent workpiece.
    Type: Grant
    Filed: January 29, 2020
    Date of Patent: July 6, 2021
    Assignee: Corning Incorporated
    Inventors: Heather Debra Boek, Andreas Simon Gaab, Garrett Andrew Piech, Alranzo Boh Ruffin, Daniel Arthur Sternquist, Michael Brian Webb
  • Publication number: 20210017064
    Abstract: A method of separating a transparent mother sheet includes contacting a first surface of the transparent mother sheet with an open ended pressure assembly including a pressure vessel shell, thereby forming a shell cavity defined by the first surface of the transparent mother sheet and the pressure vessel shell, where the transparent mother sheet comprises a damage path. The method also includes removing gas from the shell cavity through a fluid removal outlet extending through the pressure vessel shell to reduce a cavity pressure in the shell cavity, thereby applying stress to the damage path to separate a portion of the transparent mother sheet along the damage path.
    Type: Application
    Filed: July 15, 2020
    Publication date: January 21, 2021
    Inventors: Andreas Simon Gaab, Michael Albert Joseph, II, Albert Roth Nieber, John Charles Speeckaert, Sergio Tsuda, Heather Nicole Vanselous
  • Publication number: 20200254557
    Abstract: A method for processing a transparent workpiece includes directing a pulsed laser beam into the transparent workpiece such that a portion of the pulsed laser beam directed into the transparent workpiece generates an induced absorption within the transparent workpiece, thereby forming a damage line within the transparent workpiece, and the portion of the pulsed laser beam directed into the transparent workpiece includes a wavelength ?, a spot size w0, and a Rayleigh range ZR that is greater than F D ? ? ? w 0 2 ? , where FD is a dimensionless divergence factor comprising a value of 10 or greater. Further, the method for processing the transparent workpiece includes etching the transparent workpiece with an etching vapor to remove at least a portion of the transparent workpiece along the damage line, thereby forming an aperture extending through the at least a portion of the thickness of the transparent workpiece.
    Type: Application
    Filed: January 29, 2020
    Publication date: August 13, 2020
    Inventors: Heather Debra Boek, Andreas Simon Gaab, Garrett Andrew Piech, Alranzo Boh Ruffin, Daniel Arthur Sternquist, Michael Brian Webb