Patents by Inventor Andreas W. Dreher
Andreas W. Dreher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8002407Abstract: A system for manufacturing an optical lens that is configured to correct optical aberrations, including, e.g., high order aberrations such as described by Zernike polynomials. The system can include a measurement system configured to measure optical aberrations in a patient's eye and to create measured optical aberration data. A calculation system is configured to receive the measured optical aberration data and to determine a lens definition based on the measured optical aberration data. A fabrication system is configured to produce a correcting lens based on the lens definition.Type: GrantFiled: February 26, 2009Date of Patent: August 23, 2011Assignee: Ophthonix, Inc.Inventors: Laurence Warden, Andreas W. Dreher, John Ferro, Jagdish M. Jethmalani, Shui T. Lai
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Publication number: 20110199572Abstract: The subject invention provides lenses, and methods for designing and manufacturing these lenses, with reduced chromatic aberration. Advantageously, these lenses are specifically designed to correct chromatic aberration that results as multichromatic light passes through the lenses.Type: ApplicationFiled: February 28, 2011Publication date: August 18, 2011Applicant: Ophthonix, Inc.Inventors: Lawrence H. Sverdrup, Sean Sigarlaki, Jagdish M. Jethmalani, Andreas W. Dreher, Jeffrey S. Chomyn
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Patent number: 7988284Abstract: An eyeglass lens and manufacturing method using epoxy aberrator includes two lenses with a variable index material, such as epoxy, sandwiched in between. The epoxy is then cured to different indexes of refraction that provide precise corrections for the patient's wavefront aberrations. The present invention further provides a method to produce an eyeglass that corrects higher order aberrations, such as those that occur when retinal tissue is damaged due to glaucoma or macular degeneration. The manufacturing method allows for many different applications including, but not limited to, supervision and transition lenses.Type: GrantFiled: May 21, 2009Date of Patent: August 2, 2011Assignee: Ophthonix, Inc.Inventor: Andreas W. Dreher
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Publication number: 20110157547Abstract: Embodiments of the invention pertain to a method for producing a spectacle lens with optimal correction across the entire lens taking into account the patient's complete measured wavefront. Specific embodiments can also take into account one or more additional factors such as vertex distance, segmental fitting height, pantoscopic tilt, and use conditions. The lens wavefront can be achieved by optimizing a corrected wavefront, where the corrected wavefront is the combined effect of the patient's measured wavefront and the lens wavefront. The optimization of the corrected wavefront can involve representing the measured wavefront and the lens wavefront on a grid. In an embodiment, the grid can lie in a plane. During the optimization, a subset of the grid can be used for the representation of the measured wavefront at a point on the grid so as to take into account the portions of the measured wavefront that contribute to the corrected wavefront at that point on the grid.Type: ApplicationFiled: April 30, 2009Publication date: June 30, 2011Inventors: Keith Dillon, Jeffrey S. Chomyn, Kris Kusumoto, Laurence Warden, Jagdish M. Jethmalani, Andreas W. Dreher
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Patent number: 7969660Abstract: The subject invention provides methods for creating wavefront aberrators with a desired refractive index profile that is stable against thermal and/or solar exposure. The invention further provides wavefront aberrators produced according to the methods described herein.Type: GrantFiled: April 16, 2010Date of Patent: June 28, 2011Assignee: Opthonix, Inc.Inventors: Jeffrey S. Chomyn, Lawrence H. Sverdrup, Jagdish M. Jethmalani, Andreas W. Dreher
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Publication number: 20110134389Abstract: A binocular wavefront measurement system for performing wavefront analysis on the eyes of a patient, the system comprising an optics system for providing an image to a first eye along a first optical path and an image to a second eye along a second optical path and a sensor system, said sensor system configurable in a first mode for performing a wavefront measurement of a first eye through a portion of the first optical path and configurable in a second mode for performing a wavefront measurement of a second eye through a portion of the second optical path.Type: ApplicationFiled: February 15, 2011Publication date: June 9, 2011Applicant: Ophthonix, Inc.Inventors: Laurence WARDEN, Andreas W. DREHER, Gary D. MILLS, Shui T. LAI, William G. FOOTE, David G. SANDLER, Keith J. DILLON
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Patent number: 7954950Abstract: A system and method for specifying a vision correction prescription for a patient's eye, wherein in one embodiment, the method includes obtaining a wavefront aberration measurement of the patient's eye, applying at least one value from the wavefront aberration measurement to a statistical model trained using a plurality of objectively measured aberration values and a plurality subjectively measured visual acuity values as training data; and predicting a vision correction prescription for the patient's eye based on the at least one value and the statistical model.Type: GrantFiled: April 6, 2010Date of Patent: June 7, 2011Assignee: Ophthonix, Inc.Inventors: Andreas W. Dreher, Shui T. Lai
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Patent number: 7934831Abstract: A very low inventory method of making eyeglasses. Two lens elements having special complementary surfaces are provided. These lens elements can be positioned relative to each other to provide wide ranges of focus correction and astigmatism correction. Various preferred embodiments of the invention are described. In one embodiment the required inventory is only identical sets of two complementary lenses for providing correction for almost all needed eye correction for a typical population. In this embodiment, the lens units are first adjusted relative to each other to provide a desired focusing power. Astigmatism may be corrected by a small adjustment in a second direction perpendicular to the first direction followed by a rotation of the two lenses about the axis of the two lenses. When the adjustments have been made the two lenses are fixed with respect to each other and installed in eyeglass frames. Cutting to the shape of the eyeglass frames can occur either before or after the fixing.Type: GrantFiled: February 4, 2008Date of Patent: May 3, 2011Assignee: Quexta Inc.Inventors: Brett Spivey, Andreas W. Dreher
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Patent number: 7931368Abstract: An eyeglass lens and manufacturing method using epoxy aberrator includes two lenses with a variable index material, such as epoxy, sandwiched in between. The epoxy is then cured to different indexes of refraction that provide precise corrections for the patient's wavefront aberrations. The present invention further provides a method to produce an eyeglass that corrects higher order aberrations, such as those that occur when retinal tissue is damaged due to glaucoma or macular degeneration. The manufacturing method allows for many different applications including, but not limited to, supervision and transition lenses.Type: GrantFiled: July 30, 2007Date of Patent: April 26, 2011Assignee: Opthonix, Inc.Inventor: Andreas W. Dreher
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Patent number: 7918555Abstract: The subject invention provides lenses, and methods for designing and manufacturing these lenses, with reduced chromatic aberration. Advantageously, these lenses are specifically designed to correct chromatic aberration that results as multichromatic light passes through the lenses.Type: GrantFiled: September 25, 2007Date of Patent: April 5, 2011Assignee: Ophthonix, Inc.Inventors: Lawrence H. Sverdrup, Sean Sigarlaki, Jagdish M. Jethmalani, Andreas W. Dreher, Jeffrey S. Chomyn
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Patent number: 7909461Abstract: Diagnostic instruments, systems and methods for performing measurements on eyes are disclosed. In one embodiment of the instrument, a left ocular is disposed in a portion of a left visual path for the left eye, the left ocular positioned to permit the left eye to view a target, a right ocular is disposed in a portion of a right visual path for the right eye, the right ocular positioned to permit the right eye to view a target. The instrument can also include a wavefront sensor disposed on a translation stage, the wavefront sensor having an optical path to an imaging sensor, the translation stage being movable to position the optical path of the wavefront sensor in alignment with the portion of the left visual path in a first state and in alignment with the portion of the right visual path in a second state. One or more light sources are optionally provided for propagating light along a least part of the left and right visual paths to illuminate the left and right eyes.Type: GrantFiled: September 16, 2008Date of Patent: March 22, 2011Assignee: Opthonix, Inc.Inventors: Laurence Warden, Andreas W. Dreher, Gary D. Mills, Shui T. Lai, William G. Foote, David G. Sandler, Keith J. Dillon
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Patent number: 7857446Abstract: An eyeglass lens and manufacturing method using epoxy aberrator includes two lenses with a variable index material, such as epoxy, sandwiched in between. The epoxy is then cured to different indexes of refraction that provide precise corrections for the patient's wavefront aberrations. The present invention further provides a method to produce an eyeglass that corrects higher order aberrations, such as those that occur when retinal tissue is damaged due to glaucoma or macular degeneration. The manufacturing method allows for many different applications including, but not limited to, supervision and transition lenses.Type: GrantFiled: January 24, 2006Date of Patent: December 28, 2010Assignee: Ophthonix, Inc.Inventor: Andreas W. Dreher
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Patent number: 7845797Abstract: Two or more images captured from digital cameras record an image of spectacle frames on a subject. The image is analyzed using automated image-processing techniques to identify the relation of specific points of interest on the frame to the location of each of the subject's eyes allowing the optical center of the lens to be placed in the correct location in the frames.Type: GrantFiled: September 10, 2008Date of Patent: December 7, 2010Assignee: Ophthonix, Inc.Inventors: Laurence Warden, Andreas W. Dreher, Tro Murphey
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Patent number: 7832863Abstract: Embodiments of the invention pertain to a method for producing a spectacle lens with optimal correction across the entire lens taking into account the patient's complete measured wavefront. Specific embodiments can also take into account one or more additional factors such as vertex distance, SEG height, pantoscopic tilt, and use conditions. The lens wavefront can be achieved by optimizing a corrected wavefront, where the corrected wavefront is the combined effect of the patient's measured wavefront and the lens wavefront. The optimization of the corrected wavefront can involve representing the measured wavefront and the lens wavefront on a grid. In an embodiment, the grid can lie in a plane. During the optimization, a subset of the grid can be used for the representation of the measured wavefront at a point on the grid so as to take into account the portions of the measured wavefront that contribute to the corrected wavefront at that point on the grid.Type: GrantFiled: December 21, 2007Date of Patent: November 16, 2010Assignee: Ophthonix, Inc.Inventors: Andreas W. Dreher, Bill Foote, Dave Sandler, Laurence Warden
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Patent number: 7821719Abstract: An optical element includes a first lens; a cover; and a cured matrix polymer sandwiched between the first lens and the cover; the matrix polymer, prior to curing, having a monomer mixture dispersed therein; the matrix polymer being selected from the group consisting of polyester, polystyrene, polyacrylate, thiol-cured epoxy polymer, thiol-cured isocyanate polymer, and mixtures thereof; and the monomer mixture comprising a thiol monomer and at least one second monomer selected from the group consisting of ene monomer and yne monomer.Type: GrantFiled: November 6, 2007Date of Patent: October 26, 2010Assignee: Ophthonix, Inc.Inventors: Jagdish Jethmalani, Andreas W. Dreher, Gomaa Abdel-Sadek, Jeffrey Chomyn, Jieming Li, Maher Qaddoura
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Publication number: 20100265457Abstract: The subject invention provides methods for creating wavefront aberrators with a desired refractive index profile that is stable against thermal and/or solar exposure. The invention further provides wavefront aberrators produced according to the methods described herein.Type: ApplicationFiled: April 16, 2010Publication date: October 21, 2010Inventors: Jeffrey S. CHOMYN, Larry H. Sverdrup, Jagdish M. Jethmalani, Andreas W. Dreher
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Publication number: 20100195212Abstract: The present invention relates to the optimization of human visual function by correcting and/or optimizing high-order optical aberrations in high performance optical devices. The optimization is particularly useful for high performance devices used under low light conditions such as binoculars, rifle scopes, telescopes, microscopes, night vision goggles and laser eye protection devices.Type: ApplicationFiled: April 6, 2010Publication date: August 5, 2010Inventors: Jagdish M. JETHMALANI, Andreas W. Dreher, Lawrence H. Sverdrup
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Publication number: 20100195053Abstract: A system and method for specifying a vision correction prescription for a patient's eye, wherein in one embodiment, the method includes obtaining a wavefront aberration measurement of the patient's eye, applying at least one value from the wavefront aberration measurement to a statistical model trained using a plurality of objectively measured aberration values and a plurality subjectively measured visual acuity values as training data; and predicting a vision correction prescription for the patient's eye based on the at least one value and the statistical model.Type: ApplicationFiled: April 6, 2010Publication date: August 5, 2010Inventors: Andreas W. DREHER, Shui T. Lai
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Publication number: 20100195047Abstract: Embodiments of the invention pertain to a method for producing a spectacle lens with optimal correction across the entire lens taking into account the patient's complete measured wavefront. Specific embodiments can also take into account one or more additional factors such as vertex distance, SEG height, pantoscopic tilt, and use conditions. The lens wavefront can be achieved by optimizing a corrected wavefront, where the corrected wavefront is the combined effect of the patient's measured wavefront and the lens wavefront. The optimization of the corrected wavefront can involve representing the measured wavefront and the lens wavefront on a grid. In an embodiment, the grid can lie in a plane. During the optimization, a subset of the grid can be used for the representation of the measured wavefront at a point on the grid so as to take into account the portions of the measured wavefront that contribute to the corrected wavefront at that point on the grid.Type: ApplicationFiled: April 6, 2010Publication date: August 5, 2010Inventors: Andreas W. DREHER, Bill Foote, Dave Sandler, Laurence Warden
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Patent number: 7701641Abstract: The subject invention provides methods for creating wavefront aberrators with a desired refractive index profile that is stable against thermal and/or solar exposure. The invention further provides wavefront aberrators produced according to the methods described herein.Type: GrantFiled: January 16, 2007Date of Patent: April 20, 2010Assignee: Ophthonix, Inc.Inventors: Andreas W. Dreher, Jagdish M. Jethmalani, Larry H. Sverdrup, Jeffrey S. Chomyn