Patents by Inventor Andreas WECHSEL

Andreas WECHSEL has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Vacuum angle valve comprising a pressure sensor
    Patent number: 12687243
    Abstract: A vacuum valve includes a valve housing having a first port in the direction of a first axis, a second port in the direction of a second axis and a valve seat. The vacuum valve further includes: a valve disk, a drive unit, wherein a controlled displacement of the valve disk along or orthogonally to the first axis is provided by means of the drive unit, and a control unit for controlling the displacement of the valve disk. The vacuum valve has a pressure sensor to measure a process pressure present in the flow chamber can be measured. The control unit is configured to provide process information, the process pressure present in the flow chamber is measured by the pressure sensor, and the displacement of the valve disk is controlled as a function of the processed process information and the process pressure.
    Type: Grant
    Filed: February 14, 2023
    Date of Patent: July 21, 2026
    Assignee: VAT HOLDING AG
    Inventors: Michael Zickar, Andreas Wechsel, Martin Netzer
  • VACUUM ANGLE VALVE COMPRISING A PRESSURE SENSOR
    Publication number: 20250155030
    Abstract: A vacuum valve includes a valve housing having a first port in the direction of a first axis, a second port in the direction of a second axis and a valve seat. The vacuum valve further includes: a valve disk, a drive unit, wherein a controlled displacement of the valve disk along or orthogonally to the first axis is provided by means of the drive unit, and a control unit for controlling the displacement of the valve disk. The vacuum valve has a pressure sensor to measure a process pressure present in the flow chamber can be measured. The control unit is configured to provide process information, the process pressure present in the flow chamber is measured by the pressure sensor, and the displacement of the valve disk is controlled as a function of the processed process information and the process pressure.
    Type: Application
    Filed: February 14, 2023
    Publication date: May 15, 2025
    Inventors: Michael ZICKAR, Andreas WECHSEL, Martin NETZER