Abstract: A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.

Abstract: A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.

Abstract: In a low-deformation support device of an optical element (8, 24), in particular an end plate (14) of a projection objective (7) of a projection exposure machine (3) for microlithography for the purpose of producing semiconductor components, in a mount (13), the optical element (8, 14) is connected to the mount (13) at least partly via a bonded connection. The bonded connection is located between the adjacent circumferential wails of mount (13) and optical element (14). The mount (13) is provided with at least three bearing elements (20) which are distributed over the circumference and by means of which the optical element (8, 14) is laterally and axially supported. The mount (13) has spring elements (15) which are constructed monolithically with the bearing elements (20) and are soft in axial and radial directions.

Abstract: The invention relates to a device for the low-deformation replaceable mounting of an optical element, in particular a closure plate of an objective of a projection exposure system for microlithography for the production of semiconductor components, in a mount (12). The optical element is connected to the mount (12) at least partly via an adhesive connection. This is located between the adjacent circumferential walls of mount (12) and optical element. The mount (12) is provided with at least three support feet (14) distributed over the circumference, by means of which the optical element is mounted laterally and axially. The mount (12) is connected to the housing of the objective in an at least approximately deformation-decoupled manner via three mount bearing points (15).

Abstract: A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.

Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.

Abstract: In a low-deformation support device of an optical element (8, 14), in particular an end plate (14) of a projection objective (7) of a projection exposure machine (3) for microlithography for the purpose of producing semiconductor components, in a mount (13), the optical element (8, 14) is connected to the mount (13) at least partly via a bonded connection. The bonded connection is located between the adjacent circumferential walls of mount (13) and optical element (14). The mount (13) is provided with at least three bearing elements (20) which are distributed over the circumference and by means of which the optical element (8, 14) is laterally and axially supported. The mount (13) has spring elements (15) which are constructed monolithically with the bearing elements (20) and are soft in axial and radial directions.