Patents by Inventor Andrei Evgenuevich Iakchine Yakshin

Andrei Evgenuevich Iakchine Yakshin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 6954257
    Abstract: An optical element of a lithographic projection apparatus includes a Si/Mo multilayer structure, an outer capping layer and an interlayer positioned between the multilayer structure and the outer capping layer. The interlayer has a thickness of between 0.3 and 0.7 times the wavelength of the incident radiation. The interlayer may be C or Mo and has a thickness of between 6.0 and 9.0 nm. The interlayer may include an inner interlayer including Mo next to the multilayer structure and an outer interlayer including C next to the capping layer. The outer interlayer is at least 3.4 nm thick and the capping layer is Ru and at least 2.0 nm thick.
    Type: Grant
    Filed: August 26, 2003
    Date of Patent: October 11, 2005
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Ralph Kurt, Andrei Evgenuevich Iakchine Yakshin
  • Lithographic apparatus and device manufacturing method
    Publication number: 20040105083
    Abstract: An optical element of a lithographic projection apparatus includes a Si/Mo multilayer structure, an outer capping layer and an interlayer positioned between the multilayer structure and the outer capping layer. The interlayer has a thickness of between 0.3 and 0.7 times the wavelength of the incident radiation. The interlayer may be C or Mo and has a thickness of between 6.0 and 9.0 nm. The interlayer may include an inner interlayer including Mo next to the multilayer structure and an outer interlayer including C next to the capping layer. The outer interlayer is at least 3.4 nm thick and the capping layer is Ru and at least 2.0 nm thick.
    Type: Application
    Filed: August 26, 2003
    Publication date: June 3, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Ralph Kurt, Andrei Evgenuevich Iakchine Yakshin