Patents by Inventor Andrei Ursache

Andrei Ursache has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • NANOFABRICATION
    Publication number: 20070200477
    Abstract: Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.
    Type: Application
    Filed: December 19, 2006
    Publication date: August 30, 2007
    Applicant: UNIVERSITY OF MASSACHUSETTS
    Inventors: Mark Tuominen, Mustafa Bal, Thomas Russell, Andrei Ursache
  • Nanofabrication
    Patent number: 7189435
    Abstract: Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.
    Type: Grant
    Filed: March 14, 2002
    Date of Patent: March 13, 2007
    Assignee: University of Massachusetts
    Inventors: Mark Tuominen, Mustafa Bal, Thomas P. Russell, Andrei Ursache
  • Nanofabrication
    Publication number: 20020158342
    Abstract: Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.
    Type: Application
    Filed: March 14, 2002
    Publication date: October 31, 2002
    Inventors: Mark Tuominen, Mustafa Bal, Thomas P. Russell, Andrei Ursache