Abstract: Embodiments described herein relate to camera modules that incorporate an optically absorptive grating that is positioned and designed to reduce the impact of stray light on images captured by the camera modules. Specifically, the optically absorptive grating is configured to absorb light that is incident on the optically absorptive grating. The optically absorptive grating includes an array of protrusions, and in some instances may be part of a grating assembly that is coupled to an optical component.

Abstract: An optoelectronic assembly includes: (i) a substrate having a cavity, (ii) an optoelectronic device, which is disposed over the cavity and includes an array of multiple emitters configured to emit a predefined number of light beams in response to receiving one or more electrical signals, and (iii) an integrated circuit (IC), which is mounted within the cavity, between the substrate and the optoelectronic device, and is configured to drive the one or more electrical signals to the optoelectronic device.

Abstract: Optical coatings for curved or non-planar substrates are disclosed. Optical coatings may include AR (antireflection) coatings or absorbing (“black” optical) coatings. The optical coatings may include a nanostructure layer formed on top of a stack of one or more materials. Both the nanostructure layer and the stack may be deposited on a curved or non-planar substrate using plasma-enhanced atomic layer deposition (PEALD) to provide conformal coating of the substrate. The nanostructure layer may include a mixture of aluminum hydroxide and aluminum oxide hydroxide that is formed by placing a PEALD-deposited aluminum oxide layer in heated deionized water for a predetermined time period. The materials in the stack may be alternated to provide tuning of the optical properties in the optical coating.

Abstract: A deposited amorphous carbon film includes at least 95% carbon. A percentage of sp3 carbon-carbon bonds present in the amorphous carbon film exceeds 30%, and a hydrogen content of the amorphous carbon film is less than 5%. A process of depositing amorphous carbon on a workpiece includes positioning the workpiece within a process chamber and positioning a magnetron assembly adjacent to the process chamber. The magnetron assembly projects a magnetic field into the process chamber. The method further includes providing a carbon target such that the magnetic field extends through the carbon target toward the workpiece. The method further includes providing a source gas to the process chamber, and providing pulses of DC power to a plasma formed from the source gas within the process chamber. The pulses of DC power are supplied in pulses of 40 microseconds or less, that repeat at a frequency of at least 4 kHz.

Abstract: A deposited amorphous carbon film includes at least 95% carbon. A percentage of sp3 carbon-carbon bonds present in the amorphous carbon film exceeds 30%, and a hydrogen content of the amorphous carbon film is less than 5%. A process of depositing amorphous carbon on a workpiece includes positioning the workpiece within a process chamber and positioning a magnetron assembly adjacent to the process chamber. The magnetron assembly projects a magnetic field into the process chamber. The method further includes providing a carbon target such that the magnetic field extends through the carbon target toward the workpiece. The method further includes providing a source gas to the process chamber, and providing pulses of DC power to a plasma formed from the source gas within the process chamber. The pulses of DC power are supplied in pulses of 40 microseconds or less, that repeat at a frequency of at least 4 kHz.