Patents by Inventor Andres Fernadez

Andres Fernadez has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electron beam lithography system having improved electron gun
    Patent number: 7095037
    Abstract: An electron beam lithography system has an electron gun including at least one laser that is operable in a first mode to generate electrons for lithography. The electron beam lithography system is operable in a second mode to regenerate the photocathode of the electron gun by application of the laser. The photocathode includes a layer of cesium telluride.
    Type: Grant
    Filed: March 18, 2004
    Date of Patent: August 22, 2006
    Inventors: Andres Fernadez, Marian Mankos, Jeffrey S. Sullivan, Paul C. Allen
  • Electron beam lithography system having improved electron gun
    Publication number: 20040232357
    Abstract: An electron beam lithography system has an electron gun including at least one laser that is operable in a first mode to generate electrons for lithography. The electron beam lithography system is operable in a second mode to regenerate the photocathode of the electron gun by application of the laser. The photocathode includes a layer of cesium telluride.
    Type: Application
    Filed: March 18, 2004
    Publication date: November 25, 2004
    Inventors: Andres Fernadez, Marian Mankos, Jeffrey S. Sullivan, Paul C. Allen