Patents by Inventor Andrew Blakeney

Andrew Blakeney has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist compositions
    Patent number: 6911297
    Abstract: Radiation sensitive compositions for use in producing a patterned image on a substrate comprise: a) a first photoacid generator compound which comprises one or more compounds of the structure (A); b) a second photoacid generator compound which comprises one or more compounds of the structure (B); c) a polymer component comprising an alkali soluble resin component whose alkali solubility is suppressed by the presence of acid sensitive moieties and whose alkali solubility is returned by treatment with an acid and, optionally, heat; wherein said polymer comprises one or more polymers comprising the monomer unit (C); ?and d) a solvent.
    Type: Grant
    Filed: June 19, 2003
    Date of Patent: June 28, 2005
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: David Brzozowy, J. Thomas Kocab, John P. Hatfield, Lawerence Ferreira, Andrew Blakeney
  • Photoresist compositions
    Publication number: 20040072095
    Abstract: Radiation sensitive compositions for use in producing a patterned image on a substrate comprise:
    Type: Application
    Filed: June 19, 2003
    Publication date: April 15, 2004
    Applicant: Arch Speciality Chemical, Inc.
    Inventors: David Brzozowy, Kocab J. Thomas, John P. Hatfield, Lawrence Ferreira, Andrew Blakeney