Abstract: An apparatus according to one embodiment includes a module having a substrate, read and write transducers positioned towards a media facing side of the module, and a closure. The write transducers include write poles having media facing sides with zero or near-zero recession from a plane extending along the media facing side of a substrate of the module. The read transducers each have two shields. Media facing sides of the two shields are recessed a same amount from the plane, and are more recessed from the plane than the write poles.

Abstract: In one general embodiment, an apparatus includes a magnetic sensor structure, a magnetic shield having at least one laminate pair comprising a magnetic layer and an electrically conductive nonmagnetic layer, and a nonmagnetic spacer layer between the sensor structure and the magnetic shield. In another general embodiment, an apparatus includes a magnetic tunnel junction sensor structure, and a magnetic shield having at least two laminate pairs, each pair comprising a magnetic layer and an electrically conductive nonmagnetic layer. A deposition thickness of the nonmagnetic layer in each laminate pair is about 10% or less of a total deposition thickness of the laminate pair.

Abstract: An apparatus according to one embodiment includes a substrate having a media bearing surface, and a first shield above the substrate. The first shield has a media facing side recessed from a plane extending along the media bearing surface of the substrate. A current-perpendicular-to-plane sensor is located above the substrate, the sensor having a media facing side recessed from the plane extending along the media bearing surface of the substrate. An electrically nonconductive first film is positioned on the media facing sides of the first shield and sensor. A second film is positioned on a media facing side of the first film, the second film comprising a refractory metal.

Abstract: A plasma sputtering apparatus according to one embodiment includes a chamber and a reservoir in fluidic communication with the chamber. The reservoir stores a vapor source therein, and is configured to release vapor at a predetermined rate. The vapor released by the reservoir is effective to diminish an etch rate of a first magnetic material, the vapor having a smaller effect on an etch rate of a second magnetic material that is different than the first magnetic material. The apparatus also includes a mount for a substrate and a plasma source.

Abstract: An apparatus according to one embodiment includes a module having a substrate, read and write transducers positioned towards a media facing side of the module, and a closure. The write transducers include write poles having media facing sides with zero or near-zero recession from a plane extending along the media facing side of a substrate of the module. The read transducers each have two shields. Media facing sides of the two shields are recessed a same amount from the plane, and are more recessed from the plane than the write poles.

Abstract: An apparatus according to one embodiment includes a substrate having a media bearing surface, and a first shield above the substrate. The first shield has a media facing side recessed from a plane extending along the media bearing surface of the substrate. A current-perpendicular-to-plane sensor is located above the substrate, the sensor having a media facing side recessed from the plane extending along the media bearing surface of the substrate. An electrically nonconductive first film is positioned on the media facing sides of the first shield and sensor. A second film is positioned on a media facing side of the first film, the second film comprising a refractory metal.

Abstract: An apparatus according to one embodiment includes a module having a substrate, read and write transducers positioned towards a media facing side of the module, and a closure. The write transducers include write poles having media facing sides with negative, zero or near-zero recession from a plane extending along the media facing side of a substrate of the module. The read transducers each have two shields. Media facing sides of the two shields are recessed a same amount from the plane, and are more recessed from the plane than the write poles.

Abstract: An apparatus according to one embodiment includes a magnetic sensor structure, a magnetic shield having at least one laminate pair comprising a magnetic layer and an electrically nonconductive nonmagnetic layer, and a nonmagnetic spacer layer between the sensor structure and the magnetic shield. In one embodiment, a deposition thickness of the nonconductive nonmagnetic layer in each laminate pair is about 10% or less of a total deposition thickness of the laminate pair. In another embodiment, a deposition thickness of the nonconductive nonmagnetic layer in each laminate pair is between about 1 and about 12 nanometers. In yet another embodiment, the magnetic shield has at least one second laminate pair, and a nonlaminated magnetic portion sandwiched between the at least one laminate pair and the at least one second laminate pair.

Abstract: An apparatus according to one embodiment includes a module having a substrate, read and write transducers positioned towards a media facing side of the module, and a closure. The write transducers include write poles having media facing sides with negative, zero or near-zero recession from a plane extending along the media facing side of a substrate of the module. The read transducers each have two shields. Media facing sides of the two shields are recessed a same amount from the plane, and are more recessed from the plane than the write poles.

Abstract: In one general embodiment, an apparatus includes a magnetic sensor structure, a magnetic shield having at least one laminate pair comprising a magnetic layer and an electrically conductive nonmagnetic layer, and a nonmagnetic spacer layer between the sensor structure and the magnetic shield. In another general embodiment, an apparatus includes a magnetic tunnel junction sensor structure, and a magnetic shield having at least two laminate pairs, each pair comprising a magnetic layer and an electrically conductive nonmagnetic layer. A deposition thickness of the nonmagnetic layer in each laminate pair is about 10% or less of a total deposition thickness of the laminate pair.

Abstract: An apparatus according to one embodiment includes a magnetic sensor structure, a magnetic shield having at least one laminate pair comprising a magnetic layer and an electrically nonconductive nonmagnetic layer, and a nonmagnetic spacer layer between the sensor structure and the magnetic shield. In one embodiment, a deposition thickness of the nonconductive nonmagnetic layer in each laminate pair is about 10% or less of a total deposition thickness of the laminate pair. In another embodiment, a deposition thickness of the nonconductive nonmagnetic layer in each laminate pair is between about 1 and about 12 nanometers. In yet another embodiment, the magnetic shield has at least one second laminate pair, and a nonlaminated magnetic portion sandwiched between the at least one laminate pair and the at least one second laminate pair.

Abstract: An apparatus according to one embodiment includes a module having both read and write transducers positioned towards a media facing side of the module, wherein the read and write transducers are selected from a group consisting of piggyback read-write transducers, merged read-write transducers, interleaved read and write transducers, and an array of write transducers. The write transducers include write poles having media facing sides with negative, zero or near-zero recession from a plane extending along the media facing side of a substrate of the module. The read transducers each have at least one shield. A media facing side of the at least one shield is more recessed from the plane than the write poles.

Abstract: A plasma sputtering apparatus according to one embodiment includes a chamber and a reservoir in fluidic communication with the chamber. The reservoir stores a vapor source therein, and is configured to release vapor at a predetermined rate. The vapor released by the reservoir is effective to diminish an etch rate of a first magnetic material, the vapor having a smaller effect on an etch rate of a second magnetic material that is different than the first magnetic material. The apparatus also includes a mount for a substrate and a plasma source.

Abstract: An apparatus according to one embodiment includes a magnetic sensor structure, a magnetic shield having at least one laminate pair comprising a magnetic layer and an electrically nonconductive nonmagnetic layer, and a nonmagnetic spacer layer between the sensor structure and the magnetic shield. An apparatus according to another embodiment includes a sensor structure and a magnetic shield having a conductive portion and a nonconductive portion, the nonconductive portion having at least one laminate pair comprising a magnetic layer and an electrically nonconductive nonmagnetic layer.

Abstract: In one general embodiment, an apparatus includes a magnetic sensor structure, a magnetic shield having at least one laminate pair comprising a magnetic layer and an electrically conductive nonmagnetic layer, and a nonmagnetic spacer layer between the sensor structure and the magnetic shield. In another general embodiment, an apparatus includes a magnetic tunnel junction sensor structure, and a magnetic shield having at least two laminate pairs, each pair comprising a magnetic layer and an electrically conductive nonmagnetic layer. A deposition thickness of the nonmagnetic layer in each laminate pair is about 10% or less of a total deposition thickness of the laminate pair.

Abstract: A method according to one embodiment includes placing a substrate in a chamber; and plasma sputtering the substrate in a presence of a non-zero pressure of a vapor, wherein the vapor at the non-zero pressure is effective to diminish an etch rate of a first material of the substrate. A plasma sputtering apparatus according to one embodiment includes a chamber; a reservoir in the chamber for releasing a vapor at an established rate; a mount for a substrate; and a plasma source.

Abstract: An apparatus according to one embodiment includes a module having both read and write transducers positioned towards a media facing side of the module, wherein the read and write transducers are selected from a group consisting of piggyback read-write transducers, merged read-write transducers, interleaved read and write transducers, and an array of write transducers. The write transducers include write poles having media facing sides with negative, zero or near-zero recession from a plane extending along the media facing side of a substrate of the module. The read transducers each have at least one shield. A media facing side of the at least one shield is more recessed from the plane than the write poles.

Abstract: A magnetic head according to one embodiment includes a module, the module having both read and write transducers positioned towards a media facing side of the module, wherein the read and write transducers are selected from a group consisting of piggyback read-write transducers, merged read-write transducers, interleaved read and write transducers, and an array of write transducers flanked by servo read transducers; wherein the write transducers include write poles having media facing sides with negative, zero or near-zero recession from a plane extending along the media facing side of a substrate of the module; wherein the read transducers each have at least one shield, wherein a media facing side of the at least one shield is more recessed from the plane than the write poles.

Abstract: A magnetic head according to one embodiment includes a module, the module having both read and write transducers positioned towards a media facing side of the module, wherein the read and write transducers are selected from a group consisting of piggyback read-write transducers, merged read-write transducers, interleaved read and write transducers, and an array of write transducers flanked by servo read transducers; wherein the write transducers include write poles having media facing sides with negative, zero or near-zero recession from a plane extending along the media facing side of a substrate of the module; wherein the read transducers each have at least one shield, wherein a media facing side of the at least one shield is more recessed from the plane than the write poles.

Abstract: A method according to one embodiment includes placing a substrate in a chamber; and plasma sputtering the substrate in a presence of a non-zero pressure of a vapor, wherein the vapor at the non-zero pressure is effective to diminish an etch rate of a first material of the substrate. A plasma sputtering apparatus according to one embodiment includes a chamber; a reservoir in the chamber for releasing a vapor at an established rate; a mount for a substrate; and a plasma source.