Patents by Inventor Andrew Constant
Andrew Constant has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11047039Abstract: Substrate carrier apparatus having a hard mask are disclosed herein. In some embodiments, a substrate carrier apparatus includes a carrier body having a support surface to support a substrate; and a mask assembly disposed above the support surface. The mask assembly includes an annular frame disposed atop the support surface; and a hard mask coupled to and disposed within the annular frame above the support surface, wherein the hard mask includes one or more openings arranged in a predetermined pattern and disposed through the hard mask, and wherein the hard mask includes a plurality of spacer elements extending from a bottom surface of the hard mask.Type: GrantFiled: December 26, 2018Date of Patent: June 29, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Alexander Lerner, Kim Vellore, Ami Sade, Steven Sansoni, Andrew Constant, Kevin Moraes, Roey Shaviv, Niranjan Kumar, Jeffrey Brodine, Michael Karazim
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Patent number: 10818525Abstract: Methods and apparatus for processing a substrate are provided herein. In one implementation, the apparatus includes a load lock chamber coupled to a transfer chamber. The transfer chamber is coupled to a thermal process chamber and a substrate is transferred between each of the load lock chamber, the transfer chamber, and the thermal process chamber. In other implementations, a process platform having a load lock chamber, a transfer chamber, and a thermal process chamber is disclosed. Methods of measuring oxygen concentration in a load lock chamber via evacuation of a transfer chamber are also described herein.Type: GrantFiled: June 4, 2019Date of Patent: October 27, 2020Assignee: Applied Materials, Inc.Inventors: Shay Assaf, Andrew Constant, Jacob Newman, Charles Carlson, William Tyler Weaver, Stephen Hickerson
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Publication number: 20190295872Abstract: Methods and apparatus for processing a substrate are provided herein. In one implementation, the apparatus includes a load lock chamber coupled to a transfer chamber. The transfer chamber is coupled to a thermal process chamber and a substrate is transferred between each of the load lock chamber, the transfer chamber, and the thermal process chamber. In other implementations, a process platform having a load lock chamber, a transfer chamber, and a thermal process chamber is disclosed. Methods of measuring oxygen concentration in a load lock chamber via evacuation of a transfer chamber are also described herein.Type: ApplicationFiled: June 4, 2019Publication date: September 26, 2019Inventors: Shay ASSAF, Andrew CONSTANT, Jacob NEWMAN, Charles CARLSON, William Tyler WEAVER, Stephen HICKERSON
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Patent number: 10361104Abstract: Methods and apparatus for processing a substrate are provided herein. In one implementation, the apparatus includes a load lock chamber coupled to a transfer chamber. The transfer chamber is coupled to a thermal process chamber and a substrate is transferred between each of the load lock chamber, the transfer chamber, and the thermal process chamber. In other implementations, a process platform having a load lock chamber, a transfer chamber, and a thermal process chamber is disclosed. Methods of measuring oxygen concentration in a load lock chamber via evacuation of a transfer chamber are also described herein.Type: GrantFiled: July 26, 2017Date of Patent: July 23, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Shay Assaf, Andrew Constant, Jacob Newman, Charles Carlson, William Tyler Weaver, Stephen Hickerson
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Publication number: 20190211442Abstract: Substrate carrier apparatus having a hard mask are disclosed herein. In some embodiments, a substrate carrier apparatus includes a carrier body having a support surface to support a substrate; and a mask assembly disposed above the support surface. The mask assembly includes an annular frame disposed atop the support surface; and a hard mask coupled to and disposed within the annular frame above the support surface, wherein the hard mask includes one or more openings arranged in a predetermined pattern and disposed through the hard mask, and wherein the hard mask includes a plurality of spacer elements extending from a bottom surface of the hard mask.Type: ApplicationFiled: December 26, 2018Publication date: July 11, 2019Inventors: ALEXANDER LERNER, KIM VELLORE, AMI SADE, STEVEN SANSONI, ANDREW CONSTANT, KEVIN MORAES, ROEY SHAVIV, NIRANJAN KUMAR, JEFFREY BRODINE, MICHAEL KARAZIM
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Publication number: 20180254207Abstract: Methods and apparatus for processing a substrate are provided herein. In one implementation, the apparatus includes a load lock chamber coupled to a transfer chamber. The transfer chamber is coupled to a thermal process chamber and a substrate is transferred between each of the load lock chamber, the transfer chamber, and the thermal process chamber. In other implementations, a process platform having a load lock chamber, a transfer chamber, and a thermal process chamber is disclosed. Methods of measuring oxygen concentration in a load lock chamber via evacuation of a transfer chamber are also described herein.Type: ApplicationFiled: July 26, 2017Publication date: September 6, 2018Inventors: Shay ASSAF, Andrew CONSTANT, Jacob NEWMAN, Charles CARLSON, William Tyler WEAVER, Stephen HICKERSON
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Patent number: 9696097Abstract: Embodiments of multi-substrate thermal management apparatus are provided herein. In some embodiments, a multi-substrate thermal management apparatus includes a plurality of plates vertically arranged above one another; a plurality of channels extending through each of the plurality of plates; a supply manifold including a supply channel coupled to the plurality of plates at first locations; and a return manifold including a return channel coupled to the plurality of plates via a plurality of legs at second locations, wherein the supply and return channels are fluidly coupled to the plurality of channels to flow a heat transfer fluid through the plurality of plates.Type: GrantFiled: October 1, 2014Date of Patent: July 4, 2017Assignee: APPLIED MATERIALS, INC.Inventors: Kallol Bera, Kim Vellore, Andrew Constant, Jacob Newman, Jeffrey Blahnik, Jason Schaller, William Weaver, Robert Vopat, Benjamin Riordon
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Publication number: 20160033205Abstract: Embodiments of multi-substrate thermal management apparatus are provided herein. In some embodiments, a multi-substrate thermal management apparatus includes a plurality of plates vertically arranged above one another; a plurality of channels extending through each of the plurality of plates; a supply manifold including a supply channel coupled to the plurality of plates at first locations; and a return manifold including a return channel coupled to the plurality of plates via a plurality of legs at second locations, wherein the supply and return channels are fluidly coupled to the plurality of channels to flow a heat transfer fluid through the plurality of plates.Type: ApplicationFiled: October 1, 2014Publication date: February 4, 2016Inventors: KALLOL BERA, KIM VELLORE, ANDREW CONSTANT, JACOB NEWMAN, JEFFREY BLAHNIK, JASON SCHALLER, WILLIAM WEAVER, ROBERT VOPAT, BENJAMIN RIORDON
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Publication number: 20110041764Abstract: A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.Type: ApplicationFiled: November 3, 2010Publication date: February 24, 2011Inventors: Aaron Webb, Adam Brailove, Joseph Yudovsky, Nir Merry, Andrew Constant, Efrain Quiles, Michael R. Rice, Gary J. Rosen, Vinay K. Shah
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Patent number: 7833351Abstract: A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.Type: GrantFiled: June 26, 2006Date of Patent: November 16, 2010Assignee: Applied Materials, Inc.Inventors: Aaron Webb, Adam Brailove, Joseph Yudovsky, Nir Merry, Andrew Constant, Efrain Quiles, Michael R. Rice, Gary J. Rosen, Vinay K. Shah
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Publication number: 20070295274Abstract: A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.Type: ApplicationFiled: June 26, 2006Publication date: December 27, 2007Inventors: Aaron Webb, Adam Brailove, Joseph Yudovsky, Nir Merry, Andrew Constant, Efrain Quiles, Michael R. Rice, Gary J. Rosen, Vinay K. Shah