Abstract: An apparatus is provided configured to manufacture an article using a multi-layer/laminated photoresist comprising a plurality of layers of photoresist material, where at least a first layer of photoresist material has a first sensitivity to radiation, and at least a second layer of photoresist material has a different sensitivity to radiation. The apparatus comprises: a. a housing configured to receive the photoresist and locate the photoresist in at least one operational position in the housing; b. an exposure system configured to emit radiation which is incident on the photoresist when in the operational position; wherein: i. the exposure system is configured to emit radiation having a first radiation characteristic to induce a change in one or more properties of the area(s) of the first layer of photoresist material exposed to the radiation; and wherein ii.

Abstract: An apparatus configured to manufacture an article using a photoresist comprising photoresist material, the apparatus comprising: a. a housing configured to receive the photoresist and locate the photoresist in at least one operational position in the housing; b. an exposure system configured to emit radiation which is incident on the photoresist material when in the operational position, to induce a change in one or more properties of the area(s) of the photoresist material exposed to the radiation; and c. a heater configured to heat the photoresist material to cure the photoresist material to the substrate when the photoresist is in the operational position, or is in a different operational position in the housing; wherein d.