Abstract: A one or two layer coating system has been developed for plastic substrates. The one coating system low reflective layer consists of a fluorinated copolymer having the formula: VF2/TFE/HFP, VF2/HFP or VF2/TFE/PMVE. In the two coating system, the upper coating layer consists of TFE/HFP, VF2/TFE/HFP, or TFE/Perfluorodioxole, and the lower coating layer consists of VF2/TFE/HFP, VF/TFE/HFP, VAc/TFE/HFIB, or TFE graft to PVOH.

Abstract: A compound comprising Formula I, or a mixture thereof, Rf—OCFHCF2O—[CH2CH2O]x—[C3H7O]y-A ??Formula I wherein Rf is CnF2n+1, n is 1 to about 6, x is a mixture of positive integers and is 4 or greater, y is 0 to about 4, provided that the ratio of y to x is equal to or less than 0.25, A is RfOCHFCF2 or CmH2m+1, and m is 0 to about 24 and its use in lowering surface tension and imparting improved surface effects is disclosed.

Abstract: The invention pertains to low polydispersity copolymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity copolymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.

Abstract: A compound comprising Formula I, or a mixture thereof, wherein Y is a bond or CmH2m?p(OA)p wherein m is 0 to 4, and p is 0 or 1, X? is X or H, X is CH2CH2OA, CH(CH2OA)2, C(CH2OA)3, or X and X? combine to form (CH2CH2)2NCH2CH2OA or (CH2CH2)2O, provided that when X and X? combine to form (CH2CH2)2O then Y is CH2CH(OA)CH2, A is CF2CFHO—Rf or H, Rf is CnF2n+1 wherein n is an integer of 1 to about 6, M is a cation having a charge equal to a, and a is a positive integer equal to 1 or 2, provided that at least one of X, X?, or Y contains A equal to CF2CFHO—Rf, and its use in lowering surface tension and imparting improved surface effects.

Abstract: A one-step process for the preparation of fluoroalkoxystyrene by contacting fluorinated olefin with a solution of hydroxystyrene is disclosed.

Abstract: This invention provides a fluorine-containing copolymer having a repeat unit derived from at least one fluorinated olefin and a repeat unit derived from at least one polycyclic ethylenically unsaturated monomer having pendant hydroxyl or esterified hydroxyl groups, and optionally other repeat units, typically derived from an acrylate. These polymers have high transparency at short wavelengths such as 193 nm and 157 nm, and provide good plasma etch resistance and adhesive properties. Also provided are photoresist compositions and substrates coated therewith.

Abstract: A one or two layer coating system has been developed for plastic substrates. The one coating system low reflective layer consists of a fluorinated copolymer having the formula: VF2/TFE/HFP, VF2/HFP or VF2/TFE/PMVE. In the two coating system, the upper coating layer consists of TFE/HFP, VF2/TFE/HFP, or TFE/Perfluorodioxole, and the lower coating layer consists of VF2/TFE/HFP, VF/TFE/HFP, VAc/TFE/HFIB, or TFE graft to PVOH.

Abstract: Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component.

Abstract: The present invention is generally directed to perfluoroalkylated fluorene polymers. It further relates to a process for preparing the polymers and devices that are made with the polymers.

Abstract: Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of a fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.

Abstract: The present invention is generally directed to perfluoroalkylated fluorene polymers. It further relates to a process for preparing the polymers and devices that are made with the polymers.

Abstract: The present invention is generally directed to perfluoroalkylated fluorene polymers. It further relates to a process for preparing the polymers and devices that are made with the polymers.

Abstract: The present invention pertains to photoimaging and the use of photoresists (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The present invention also pertains to novel hydroxy ester-containing polymer compositions that are useful as base resins in resists and potentially in many other applications.

Abstract: Fluorinated copolymers useful in photoresist compositions and associated processes for microlithography are described. These copolymers are comprised of a fluoroalcohol or protected fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in basic media to these materials and a repeat unit derived from an acrylate monomer containing a fluoroalkyl group or a hydroxyl substituted alkyl group. The materials of this invention have high UV transparency, particularly at 193 and 157 nm, which makes them highly useful for lithography at these short wavelengths.

Abstract: There is disclosed a composition comprising a mixture of endo- and exo-2-(bicyclo[2.2.1]hept-5-en-2-yl)-2,2-fluoroalkyl-ethan-2-ol which is rich in the exo isomer, preferably the endo/exo concentration ratio is no greater than 5/95. The composition is useful for forming a repeat unit of a polymer which polymer may further comprise additional repeat units derived-from tert-butyl acrylate, hydroxyadamantyl acrylate, protected or unprotected fluorinated-olefins, 2-methyl-2-adamantyl acrylate, 2-propenoic acid, 2-hydroxy-1,1,2-trimethylpropyl ester. Polymers of this invention are useful as the binder component of a photoresist composition for microlithography.

Abstract: Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of a fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.

Abstract: The present invention is generally directed to perfluoroalkylated fluorene polymers. It further relates to a process for preparing the polymers and devices that are made with the polymers.

Abstract: The present invention is generally directed to perfluoroalkylated fluorene polymers. It further relates to a process for preparing the polymers and devices that are made with the polymers.

Abstract: Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of a fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparecy, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.

Abstract: This invention concerns the application of substantially amorphous fluoropolymer compositions to stone so as to protect the stone from the deleterious effects of water and pollution.