Abstract: A method and a system for persisting a human-machine conversation across multiple communication channels so as to facilitate continuity of the conversation regardless of which mode of communication is being utilized at any particular moment are provided. The method includes: receiving, from a user via a first channel, a first communication; transmitting, to the user via the first channel, a second communication that is responsive to the first communication; receiving, from a user via a second channel that is different from the first channel, a third communication; determining that the third communication is responsive to the second communication based on a content of the third communication, and that each of the first, second, and third communications are part of the same conversation; and generating a fourth communication that is a continuation of the first conversation, and transmitting the fourth communication to the user via the second channel.

Abstract: A method and a system for persisting a human-machine conversation across multiple communication channels so as to facilitate continuity of the conversation regardless of which mode of communication is being utilized at any particular moment are provided. The method includes: receiving, from a user via a first channel, a first communication; transmitting, to the user via the first channel, a second communication that is responsive to the first communication; receiving, from a user via a second channel that is different from the first channel, a third communication; determining that the third communication is responsive to the second communication based on a content of the third communication, and that each of the first, second, and third communications are part of the same conversation; and generating a fourth communication that is a continuation of the first conversation, and transmitting the fourth communication to the user via the second channel.

Abstract: A method and a system for providing event information to targeted parties based on a determination that the targeted parties are likely to have a high level of interest in the respective events are provided. The method includes: receiving information that relates to an event; retrieving, from a memory, information that relates to a user; analyzing the event-related information and the user-related information; determining, based on a result of the analysis, an interest level of the user with respect to the event and whether to recommend that the user attend the event; and generating and transmitting a message to the user that includes at least part of the event-related information. The analysis may be performed by applying an artificial intelligence (AI) algorithm that is trained by using the user-related information and uses a natural language processing (NLP) technique to analyze the event-related information and the user-related information.

Abstract: A method and a system for providing event information to targeted parties based on a determination that the targeted parties are likely to have a high level of interest in the respective events are provided. The method includes: receiving information that relates to an event; retrieving, from a memory, information that relates to a user; analyzing the event-related information and the user-related information; determining, based on a result of the analysis, an interest level of the user with respect to the event and whether to recommend that the user attend the event; and generating and transmitting a message to the user that includes at least part of the event-related information. The analysis may be performed by applying an artificial intelligence (AI) algorithm that is trained by using the user-related information and uses a natural language processing (NLP) technique to analyze the event-related information and the user-related information.

Abstract: A electromagnet array structure including multiple electromagnetic coils captured in a rigid encapsulant, for example, of cured epoxy resin, to form a unitary free-standing structure which can be placed around the walls of a plasma processing chamber. A liquid cooling coil may also be captured in the encapsulant between the electromagnetic coils. The structure may additionally include water fittings, locating pins, through tubes for chamber bolts, and lifting brackets.

Abstract: A quadruple electromagnetic coil array coaxially arranged in a rectangular array about a chamber axis outside the sidewalls of a plasma sputter reactor, preferably in back of an RF coil within the chamber. The coil currents can be separately controlled to produce different magnetic field distributions, for example, between a sputter deposition mode in which the sputter target is powered to sputter target material onto a wafer and a sputter etch mode in which the RF coil supports the gas sputtering the wafer. The coil array may include a tubular magnetic core, particularly useful for suppressing stray fields. A water cooling coil may be wrapped around the coil array to cool all the coils. The electromagnets can be powered in different relative polarities in a multi-step process.

Abstract: A electromagnet array structure including multiple electromagnetic coils captured in a rigid encapsulant, for example, of cured epoxy resin, to form a unitary free-standing structure which can be placed around the walls of a plasma processing chamber. A liquid cooling coil may also be captured in the encapsulant between the electromagnetic coils. The structure may additionally include water fittings, locating pins, through tubes for chamber bolts, and lifting brackets.

Abstract: A quadruple electromagnetic coil array coaxially arranged in a rectangular array about a chamber axis outside the sidewalls of a plasma sputter reactor, preferably in back of an RF coil within the chamber. The coil currents can be separately controlled to produce different magnetic field distributions, for example, between a sputter deposition mode in which the sputter target is powered to sputter target material onto a wafer and a sputter etch mode in which the RF coil supports the gas sputtering the wafer. The coil array may include a tubular magnetic core, particularly useful for suppressing stray fields. A water cooling coil may be wrapped around the coil array to cool all the coils. The electromagnets can be powered in different relative polarities in a multi-step process.

Abstract: A multi-step process performed in a plasma sputter chamber including sputter deposition from the target and argon sputter etching of the substrate. The chamber includes a quadruple electromagnetic coil array coaxially arranged in a rectangular array about a chamber axis outside the sidewalls of a plasma sputter reactor in back of an RF coil within the chamber. The coil currents can be separately controlled to produce different magnetic field distributions, for example, between a sputter deposition mode in which the sputter target is powered to sputter target material onto a wafer and a sputter etch mode in which the RF coil supports the argon sputtering plasma. A TaN/Ta barrier is first sputter deposited with high target power and wafer bias. Argon etching is performed with even higher wafer bias. A flash step is applied with reduced target power and wafer bias.