Abstract: A method and apparatus involve electronically transforming a monochromatic infrared source image of a source scene into a natural daylight color image of the source scene as a function of reference information, the only information derived from the source scene and utilized in the transforming being the monochromatic infrared source image. According to a different aspect, an apparatus includes an infrared image detector that provides a monochromatic infrared source image of a source scene, and includes a transformation section that transforms the monochromatic infrared source image into a natural daylight color image of the source scene as a function of reference information, the only information derived from the source scene and utilized in the transforming being the monochromatic infrared source image.

Abstract: A method and apparatus involve electronically transforming a monochromatic infrared source image of a source scene into a natural daylight color image of the source scene as a function of reference information, the only information derived from the source scene and utilized in the transforming being the monochromatic infrared source image. According to a different aspect, an apparatus includes an infrared image detector that provides a monochromatic infrared source image of a source scene, and includes a transformation section that transforms the monochromatic infrared source image into a natural daylight color image of the source scene as a function of reference information, the only information derived from the source scene and utilized in the transforming being the monochromatic infrared source image.

Abstract: An electron-beam deposition system includes an evaporation source having a source target with a target location at which a deposition material may be positioned, and a controllable electron-beam source disposed to direct an electron beam at the target location. A trailing-indicator monitor measures a past evaporation performance of the evaporation source and has a trailing-indicator output, and a leading-indicator monitor measures a future evaporation performance of the evaporation source and has a leading-indicator output. A controller receives the trailing-indicator output and the leading-indicator output, and controls the electron-beam source responsive to the trailing-indicator output and to the leading-indicator output. Preferably, the trailing-indicator monitor measures a deposition of the deposition material on a monitored substrate, and the leading-indicator monitor measures a brightness of the deposition material in the evaporation source.